JPS58178536A - 加工片保持装置 - Google Patents

加工片保持装置

Info

Publication number
JPS58178536A
JPS58178536A JP58050595A JP5059583A JPS58178536A JP S58178536 A JPS58178536 A JP S58178536A JP 58050595 A JP58050595 A JP 58050595A JP 5059583 A JP5059583 A JP 5059583A JP S58178536 A JPS58178536 A JP S58178536A
Authority
JP
Japan
Prior art keywords
holding device
wafer
temperature
support plate
workpiece holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58050595A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0363218B2 (enExample
Inventor
ヘルベルト・エ−・メイエル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Censor Patent und Versuchsanstalt
Original Assignee
Censor Patent und Versuchsanstalt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/363,860 external-priority patent/US4432635A/en
Application filed by Censor Patent und Versuchsanstalt filed Critical Censor Patent und Versuchsanstalt
Publication of JPS58178536A publication Critical patent/JPS58178536A/ja
Publication of JPH0363218B2 publication Critical patent/JPH0363218B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/0432—
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B21/00—Machines, plants or systems, using electric or magnetic effects
    • F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
    • H10P72/78—

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP58050595A 1982-03-31 1983-03-28 加工片保持装置 Granted JPS58178536A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/363,860 US4432635A (en) 1979-12-20 1982-03-31 Temperature-controlled support for semiconductor wafer
US6/363860 1982-03-31

Publications (2)

Publication Number Publication Date
JPS58178536A true JPS58178536A (ja) 1983-10-19
JPH0363218B2 JPH0363218B2 (enExample) 1991-09-30

Family

ID=23432040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58050595A Granted JPS58178536A (ja) 1982-03-31 1983-03-28 加工片保持装置

Country Status (2)

Country Link
JP (1) JPS58178536A (enExample)
DE (1) DE3306999A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3608783A1 (de) * 1986-03-15 1987-09-17 Telefunken Electronic Gmbh Gasphasen-epitaxieverfahren und vorrichtung zu seiner durchfuehrung
US5231291A (en) * 1989-08-01 1993-07-27 Canon Kabushiki Kaisha Wafer table and exposure apparatus with the same
JP2737010B2 (ja) * 1989-08-01 1998-04-08 キヤノン株式会社 露光装置
JP2625310B2 (ja) * 1991-01-08 1997-07-02 シマテク，インコーポレイテッド シリコンウェハーの製造方法および装置
JP2507478Y2 (ja) * 1991-06-26 1996-08-14 株式会社エンヤシステム ウエ―ハ反転貼付装置
US5172949A (en) * 1991-08-02 1992-12-22 Smc Kabushiki Kaisha Suction pad with temperature control mechanism
DE19700839C2 (de) * 1997-01-13 2000-06-08 Siemens Ag Chuckanordnung
US6005226A (en) * 1997-11-24 1999-12-21 Steag-Rtp Systems Rapid thermal processing (RTP) system with gas driven rotating substrate
JP2004505443A (ja) * 2000-07-10 2004-02-19 テンプトロニック　コーポレイション 交互配置された加熱および冷却要素と交換可能な上面アセンブリと硬膜層表面とをもつ熱プレートを有するウェーハチャック
WO2012083978A1 (de) 2010-12-20 2012-06-28 Ev Group E. Thallner Gmbh Aufnahmeeinrichtung zur halterung von wafern

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473578A (en) * 1977-11-24 1979-06-12 Toshiba Corp Pattern exposure method of semiconductor substrate and pattern exposure apparatus
JPS5626437A (en) * 1979-08-13 1981-03-14 Chiyou Lsi Gijutsu Kenkyu Kumiai Wafer supporting base

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD127137B1 (de) * 1976-08-17 1979-11-28 Elektromat Veb Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen
US4139051A (en) * 1976-09-07 1979-02-13 Rockwell International Corporation Method and apparatus for thermally stabilizing workpieces
US4202623A (en) * 1979-01-08 1980-05-13 The Perkin-Elmer Corporation Temperature compensated alignment system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473578A (en) * 1977-11-24 1979-06-12 Toshiba Corp Pattern exposure method of semiconductor substrate and pattern exposure apparatus
JPS5626437A (en) * 1979-08-13 1981-03-14 Chiyou Lsi Gijutsu Kenkyu Kumiai Wafer supporting base

Also Published As

Publication number Publication date
JPH0363218B2 (enExample) 1991-09-30
DE3306999C2 (enExample) 1988-11-17
DE3306999A1 (de) 1983-10-06

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