JPS58178536A - 加工片保持装置 - Google Patents

加工片保持装置

Info

Publication number
JPS58178536A
JPS58178536A JP5059583A JP5059583A JPS58178536A JP S58178536 A JPS58178536 A JP S58178536A JP 5059583 A JP5059583 A JP 5059583A JP 5059583 A JP5059583 A JP 5059583A JP S58178536 A JPS58178536 A JP S58178536A
Authority
JP
Japan
Prior art keywords
holding device
wafer
temperature
support plate
workpiece holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5059583A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0363218B2 (enrdf_load_stackoverflow
Inventor
ヘルベルト・エ−・メイエル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Censor Patent und Versuchsanstalt
Original Assignee
Censor Patent und Versuchsanstalt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/363,860 external-priority patent/US4432635A/en
Application filed by Censor Patent und Versuchsanstalt filed Critical Censor Patent und Versuchsanstalt
Publication of JPS58178536A publication Critical patent/JPS58178536A/ja
Publication of JPH0363218B2 publication Critical patent/JPH0363218B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B21/00—Machines, plants or systems, using electric or magnetic effects
    • F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP5059583A 1982-03-31 1983-03-28 加工片保持装置 Granted JPS58178536A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6/363860 1982-03-31
US06/363,860 US4432635A (en) 1979-12-20 1982-03-31 Temperature-controlled support for semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS58178536A true JPS58178536A (ja) 1983-10-19
JPH0363218B2 JPH0363218B2 (enrdf_load_stackoverflow) 1991-09-30

Family

ID=23432040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5059583A Granted JPS58178536A (ja) 1982-03-31 1983-03-28 加工片保持装置

Country Status (2)

Country Link
JP (1) JPS58178536A (enrdf_load_stackoverflow)
DE (1) DE3306999A1 (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3608783A1 (de) * 1986-03-15 1987-09-17 Telefunken Electronic Gmbh Gasphasen-epitaxieverfahren und vorrichtung zu seiner durchfuehrung
US5231291A (en) * 1989-08-01 1993-07-27 Canon Kabushiki Kaisha Wafer table and exposure apparatus with the same
JP2737010B2 (ja) * 1989-08-01 1998-04-08 キヤノン株式会社 露光装置
JP2625310B2 (ja) * 1991-01-08 1997-07-02 シマテク，インコーポレイテッド シリコンウェハーの製造方法および装置
JP2507478Y2 (ja) * 1991-06-26 1996-08-14 株式会社エンヤシステム ウエ―ハ反転貼付装置
US5172949A (en) * 1991-08-02 1992-12-22 Smc Kabushiki Kaisha Suction pad with temperature control mechanism
DE19700839C2 (de) * 1997-01-13 2000-06-08 Siemens Ag Chuckanordnung
US6005226A (en) * 1997-11-24 1999-12-21 Steag-Rtp Systems Rapid thermal processing (RTP) system with gas driven rotating substrate
WO2002009155A2 (en) * 2000-07-10 2002-01-31 Temptronic Corporation Wafer chuck having with interleaved heating and cooling elements
CN103283000B (zh) 2010-12-20 2016-10-26 Ev集团E·索尔纳有限责任公司 用于保持晶片的容纳装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473578A (en) * 1977-11-24 1979-06-12 Toshiba Corp Pattern exposure method of semiconductor substrate and pattern exposure apparatus
JPS5626437A (en) * 1979-08-13 1981-03-14 Chiyou Lsi Gijutsu Kenkyu Kumiai Wafer supporting base

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD127137B1 (de) * 1976-08-17 1979-11-28 Elektromat Veb Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen
US4139051A (en) * 1976-09-07 1979-02-13 Rockwell International Corporation Method and apparatus for thermally stabilizing workpieces
US4202623A (en) * 1979-01-08 1980-05-13 The Perkin-Elmer Corporation Temperature compensated alignment system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473578A (en) * 1977-11-24 1979-06-12 Toshiba Corp Pattern exposure method of semiconductor substrate and pattern exposure apparatus
JPS5626437A (en) * 1979-08-13 1981-03-14 Chiyou Lsi Gijutsu Kenkyu Kumiai Wafer supporting base

Also Published As

Publication number Publication date
DE3306999A1 (de) 1983-10-06
DE3306999C2 (enrdf_load_stackoverflow) 1988-11-17
JPH0363218B2 (enrdf_load_stackoverflow) 1991-09-30

Similar Documents

Publication Publication Date Title
US4720732A (en) Pattern transfer apparatus
US4615621A (en) Auto-focus alignment and measurement system and method
US6228544B1 (en) Exposure method utilizing pre-exposure reduction of substrate temperature
JP3365571B2 (ja) 光学式計測装置及び露光装置
JPS58178536A (ja) 加工片保持装置
US3744902A (en) Device for producing a photo-varnish mask
JPH043008A (ja) 投影露光方法およびその装置
US4580900A (en) Auto focus alignment and measurement system and method
US11899377B2 (en) System and method for thermal management of reticle in semiconductor manufacturing
JPH0578008B2 (enrdf_load_stackoverflow)
JPH0562450B2 (enrdf_load_stackoverflow)
JPS60120522A (ja) 光学マスク整列装置
JPH04252015A (ja) 磁気偏向体
JP2794587B2 (ja) 投影露光装置
TW201321906A (zh) 控制反應配件的溫度的系統及方法
EP0081233B1 (en) Automatic focusing apparatus
JPH0521308A (ja) ウエハ支持装置
JP2745413B2 (ja) 露光装置
JPS62169330A (ja) 半導体露光装置
JP3214494B2 (ja) 保持装置および露光システム、デバイス
JPH03129720A (ja) 露光装置
JPS6373519A (ja) 投影露光装置
US6617555B1 (en) Imaging stabilization apparatus and method for high-performance optical systems
KR102201891B1 (ko) 기판 처리 장치
JPH02156622A (ja) 半導体製造装置