JPS58177134A - 外熱型化学気相成長装置の反応管 - Google Patents
外熱型化学気相成長装置の反応管Info
- Publication number
- JPS58177134A JPS58177134A JP5801382A JP5801382A JPS58177134A JP S58177134 A JPS58177134 A JP S58177134A JP 5801382 A JP5801382 A JP 5801382A JP 5801382 A JP5801382 A JP 5801382A JP S58177134 A JPS58177134 A JP S58177134A
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- inert gas
- gas inlet
- inlet
- lid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000006243 chemical reaction Methods 0.000 title claims description 67
- 238000002230 thermal chemical vapour deposition Methods 0.000 title claims 2
- 239000000758 substrate Substances 0.000 claims description 38
- 239000011261 inert gas Substances 0.000 claims description 30
- 238000005229 chemical vapour deposition Methods 0.000 claims description 16
- 239000012495 reaction gas Substances 0.000 claims description 16
- 239000004065 semiconductor Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000005360 phosphosilicate glass Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5801382A JPS58177134A (ja) | 1982-04-09 | 1982-04-09 | 外熱型化学気相成長装置の反応管 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5801382A JPS58177134A (ja) | 1982-04-09 | 1982-04-09 | 外熱型化学気相成長装置の反応管 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58177134A true JPS58177134A (ja) | 1983-10-17 |
| JPS6148583B2 JPS6148583B2 (enrdf_load_stackoverflow) | 1986-10-24 |
Family
ID=13072079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5801382A Granted JPS58177134A (ja) | 1982-04-09 | 1982-04-09 | 外熱型化学気相成長装置の反応管 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58177134A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI395254B (zh) * | 2006-01-25 | 2013-05-01 | Air Water Inc | Film forming device |
-
1982
- 1982-04-09 JP JP5801382A patent/JPS58177134A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI395254B (zh) * | 2006-01-25 | 2013-05-01 | Air Water Inc | Film forming device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6148583B2 (enrdf_load_stackoverflow) | 1986-10-24 |
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