JPS58168047A - 感光性材料 - Google Patents

感光性材料

Info

Publication number
JPS58168047A
JPS58168047A JP5015382A JP5015382A JPS58168047A JP S58168047 A JPS58168047 A JP S58168047A JP 5015382 A JP5015382 A JP 5015382A JP 5015382 A JP5015382 A JP 5015382A JP S58168047 A JPS58168047 A JP S58168047A
Authority
JP
Japan
Prior art keywords
group
photosensitive
photosensitive material
acid residue
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5015382A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0334057B2 (enExample
Inventor
Hideo Ochi
英夫 越智
Haruo Hatakeyama
畠山　晴夫
Tomoyuki Kitaori
北折　智之
Ichiro Sugawara
一郎 菅原
Kotaro Nagasawa
長澤　孝太郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP5015382A priority Critical patent/JPS58168047A/ja
Publication of JPS58168047A publication Critical patent/JPS58168047A/ja
Publication of JPH0334057B2 publication Critical patent/JPH0334057B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5015382A 1982-03-30 1982-03-30 感光性材料 Granted JPS58168047A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5015382A JPS58168047A (ja) 1982-03-30 1982-03-30 感光性材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5015382A JPS58168047A (ja) 1982-03-30 1982-03-30 感光性材料

Publications (2)

Publication Number Publication Date
JPS58168047A true JPS58168047A (ja) 1983-10-04
JPH0334057B2 JPH0334057B2 (enExample) 1991-05-21

Family

ID=12851233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5015382A Granted JPS58168047A (ja) 1982-03-30 1982-03-30 感光性材料

Country Status (1)

Country Link
JP (1) JPS58168047A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60129741A (ja) * 1983-12-16 1985-07-11 Japan Synthetic Rubber Co Ltd Ｘ線レジスト組成物
US5015558A (en) * 1988-08-11 1991-05-14 Somar Corporation High energy beam-sensitive copolymer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320771A (en) * 1976-08-06 1978-02-25 Western Electric Co Method of manufacturing semiconductor element
JPS565984A (en) * 1979-04-16 1981-01-22 Lubrizol Corp Corrosion inhibiting agent * aqueous composition and corrosion inhibiting method
JPS57124731A (en) * 1981-01-28 1982-08-03 Nippon Telegr & Teleph Corp <Ntt> Negative type resist with dry etching resistance

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320771A (en) * 1976-08-06 1978-02-25 Western Electric Co Method of manufacturing semiconductor element
JPS565984A (en) * 1979-04-16 1981-01-22 Lubrizol Corp Corrosion inhibiting agent * aqueous composition and corrosion inhibiting method
JPS57124731A (en) * 1981-01-28 1982-08-03 Nippon Telegr & Teleph Corp <Ntt> Negative type resist with dry etching resistance

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60129741A (ja) * 1983-12-16 1985-07-11 Japan Synthetic Rubber Co Ltd Ｘ線レジスト組成物
US5015558A (en) * 1988-08-11 1991-05-14 Somar Corporation High energy beam-sensitive copolymer

Also Published As

Publication number Publication date
JPH0334057B2 (enExample) 1991-05-21

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