JPS58164781A - 対向タ−ゲツト式スパツタ装置 - Google Patents

対向タ−ゲツト式スパツタ装置

Info

Publication number
JPS58164781A
JPS58164781A JP4469282A JP4469282A JPS58164781A JP S58164781 A JPS58164781 A JP S58164781A JP 4469282 A JP4469282 A JP 4469282A JP 4469282 A JP4469282 A JP 4469282A JP S58164781 A JPS58164781 A JP S58164781A
Authority
JP
Japan
Prior art keywords
target
targets
core
space
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4469282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH032231B2 (enExample
Inventor
Sadao Kadokura
貞夫 門倉
Kazuhiko Honjo
和彦 本庄
Masahiko Naoe
直江　正彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP4469282A priority Critical patent/JPS58164781A/ja
Publication of JPS58164781A publication Critical patent/JPS58164781A/ja
Publication of JPH032231B2 publication Critical patent/JPH032231B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP4469282A 1982-03-23 1982-03-23 対向タ−ゲツト式スパツタ装置 Granted JPS58164781A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4469282A JPS58164781A (ja) 1982-03-23 1982-03-23 対向タ−ゲツト式スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4469282A JPS58164781A (ja) 1982-03-23 1982-03-23 対向タ−ゲツト式スパツタ装置

Publications (2)

Publication Number Publication Date
JPS58164781A true JPS58164781A (ja) 1983-09-29
JPH032231B2 JPH032231B2 (enExample) 1991-01-14

Family

ID=12698466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4469282A Granted JPS58164781A (ja) 1982-03-23 1982-03-23 対向タ−ゲツト式スパツタ装置

Country Status (1)

Country Link
JP (1) JPS58164781A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63468A (ja) * 1986-06-20 1988-01-05 Teijin Ltd 対向タ−ゲツト式スパツタ装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63468A (ja) * 1986-06-20 1988-01-05 Teijin Ltd 対向タ−ゲツト式スパツタ装置

Also Published As

Publication number Publication date
JPH032231B2 (enExample) 1991-01-14

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