JPS58161760A - Method for plating on aluminum substrate - Google Patents
Method for plating on aluminum substrateInfo
- Publication number
- JPS58161760A JPS58161760A JP4432882A JP4432882A JPS58161760A JP S58161760 A JPS58161760 A JP S58161760A JP 4432882 A JP4432882 A JP 4432882A JP 4432882 A JP4432882 A JP 4432882A JP S58161760 A JPS58161760 A JP S58161760A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- plating
- component
- heat
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1813—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by radiant energy
- C23C18/1817—Heat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
- C23C18/1827—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment only one step pretreatment
- C23C18/1831—Use of metal, e.g. activation, sensitisation with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
′不発間は密層性が良好で量産性のすぐれたアルミニウ
ム基板のめっき方法、核間するものである。DETAILED DESCRIPTION OF THE INVENTION 'Nuclear plating is a method of plating aluminum substrates with good layer density and excellent mass productivity.
アルミニウム(Ag)は、その表面に均一に薄く強固な
酸化皮膜層を有しているため、はんだ付し難い金属であ
る。Aluminum (Ag) is a metal that is difficult to solder because it has a uniformly thin and strong oxide film layer on its surface.
そのために、従来からAJ衣表面各種の表面処理によっ
てはんだ付可能な状態にする方法が行なわれている。To this end, various methods have been used to make the AJ surface ready for soldering by subjecting it to various surface treatments.
たとえば、Alfe面を亜鉛(Zn)置換による前処理
をした後、ニッケル(Ni)めっき、′@(Cu)めっ
きを施こす方法とか、陽極酸化処理後r4iめっき。For example, after pre-treating the Alfe surface by substituting zinc (Zn), nickel (Ni) plating or '@(Cu) plating can be applied, or R4i plating after anodizing treatment.
Cu めつきを施こす方法のように、湿式めっきにより
はんだ付可能な金属層をへ1表面に形成する方法がある
。しかしながら、この方法には街着性が弱いとか、局部
めっきが困難であるなとの欠点がある。There is a method of forming a solderable metal layer on the surface of the heel by wet plating, such as a method of applying Cu plating. However, this method has drawbacks such as poor adhesion and difficulty in local plating.
また、A1表面に魚倉、スパッターなどによりはんだ付
可能な金属を形成する方法もあるか、この方法には密着
がやや弱いとか、量産性が悪くコストが高いなどの欠点
がある。There is also a method of forming a solderable metal on the A1 surface by sputtering or the like, but this method has disadvantages such as rather weak adhesion, poor mass production, and high cost.
一従来、A4表面にはんだ付を必要とした具体的な例と
して、たとえばAl 基根を用いたン昆成果槓回路があ
る。混成集積回路は、以前にセラミノクなどの絶縁基板
トに抵抗体、コンデンサ、トランジスターなどの素子を
取付けたものであったが、放熱性が悪い/ζめに、発熱
し易い紙力用トランジスターや大電流の流れる抵抗体を
用いた場合には、その熱によって抵抗体やトランジスタ
、くには周辺部品を劣化させる原因となっていた。そこ
で、基板にAtなどを用い、その上に絶縁物層を介して
混成集積回路を形成し熱放散を良好にする方法がとられ
ている。しかしながら、このような構成にした場合には
、絶縁層をプrして、トランジスタや抵抗体の各々の電
悌とjl 基板との間に浮遊容量が発生し、電気回路に
悪影響を及ぼす問題が発生する。A concrete example of conventional circuits requiring soldering on the A4 surface is, for example, an electronic circuit using an Al base. Hybrid integrated circuits used to be made by attaching elements such as resistors, capacitors, and transistors to an insulating substrate such as Ceraminok, but because of their poor heat dissipation, paper transistors that easily generate heat and large When a resistor through which current flows is used, the heat generated causes deterioration of the resistor, transistor, and especially peripheral components. Therefore, a method of improving heat dissipation by using At or the like for the substrate and forming a hybrid integrated circuit thereon with an insulating layer interposed thereon has been adopted. However, when such a configuration is adopted, there is a problem that the insulating layer is pulled out and stray capacitance is generated between the voltage of each transistor or resistor and the substrate, which adversely affects the electric circuit. Occur.
この問題を解消するためには、Al基板と各々の電惨と
を接続する必要があり、その接続法の最も簡単で確実な
方法としてはんだ付が好ましい。このようなことからA
g基板へのはんだ付方法が切望されている。、
本発明はこのような点に鑑みて成されたもので、Al基
板の必要個所にZn−成分を含むペーストを塗布乾燥し
、これを熱処理して金属微粒子層を析出形成することに
よって、AJ基板への密着性のよいはんだ付を可能にし
たものである0
すなわち、本発明はAl基板へのめつき形成法として、
従来の湿式によるZn置換法などに代り、Zn成分を含
むペーストを顔面乾燥し、これを熱処理するととにより
金属微粒子を析出させているが、Al基板に析出した金
属微粒子はA1表面でAe−Znの合金を形成している
ため、Ag基板に強く密着している。本発明はこのよう
にして形成した金属微粒子層上に無電解Niめつきを施
こすものであるため、密着性の良好な歯層が得られるも
のである。さらに、本発明は印刷とか吹付などの手法で
所要個所に梢匿よく簡単にペーストラ頭布することがで
きるため、必要なパターン部分にのみ簡単にNi層が形
成できるオリ点を有している。In order to solve this problem, it is necessary to connect the Al substrate to each electrical component, and soldering is preferred as the simplest and most reliable method of connection. Because of this, A
There is a strong need for a method for soldering to g-boards. The present invention has been made in view of the above points, and is made by applying a paste containing a Zn-component to the necessary locations of an Al substrate, drying it, and heat-treating it to precipitate a metal fine particle layer. This invention enables soldering with good adhesion to the substrate. In other words, the present invention is a method for forming plating on an Al substrate.
Instead of the conventional wet Zn replacement method, a paste containing a Zn component is face-dried and then heat treated to precipitate metal particles, but the metal particles deposited on the Al substrate are Ae-Zn on the A1 surface. Since it forms an alloy of , it adheres strongly to the Ag substrate. Since the present invention applies electroless Ni plating on the metal fine particle layer thus formed, a tooth layer with good adhesion can be obtained. Furthermore, the present invention has a starting point that allows the Ni layer to be easily formed only in the necessary pattern portions, since the paste can be easily applied to the required areas using methods such as printing or spraying.
次に図1に従って本発明の詳細な説明する。Next, the present invention will be explained in detail according to FIG.
図面は本発明の方法によりNiめつさを施したAJ基板
の断面を示したものであり、1はAl基板、2は金属微
粒子層で、これはZn成分を含むペーストを所要個所に
頭布、乾燥し、これを熱処理してAe基体表面に金属微
粒子として析出させたものである。The drawing shows a cross section of an AJ substrate that has been coated with Ni according to the method of the present invention. 1 is an Al substrate, 2 is a metal fine particle layer, and this is made by applying a paste containing a Zn component to the required places. , dried, and heat-treated to precipitate fine metal particles on the surface of the Ae substrate.
このペースト中のZn成分としては、粒径2μ以下のZ
n微粒とあるいは塩化亜鉛、硝酸亜鉛などのZn化合物
を用いることができる。Znは熱処理により容易にAe
と合金を形成するとともに、容易にZn粉同志の焼結が
起るだめ、Alとの密着性が良好でINiめっき皮膜の
接着強度も良好となる。べ一誠ト中のZn成分を含む金
属成分は1〜30重電力が適当であり、1重量受未満で
は均一なNiめっさ皮膜形成が得にくく、密着性も悪く
なる0また、30車童襲を超えると基板との接着強度が
弱くなるとともに印刷特性が極端に悲くな、る。The Zn component in this paste is Zn with a particle size of 2μ or less.
Zn fine particles or Zn compounds such as zinc chloride and zinc nitrate can be used. Zn can be easily converted to Ae by heat treatment.
In addition to forming an alloy with Zn powder, sintering of the Zn powders easily occurs, resulting in good adhesion to Al and good adhesive strength of the INi plating film. It is appropriate for the metal component including the Zn component in Beichi Seito to have a power of 1 to 30%; if it is less than 1%, it will be difficult to form a uniform Ni plating film and the adhesion will be poor. If the temperature is exceeded, the adhesive strength with the substrate will weaken and the printing characteristics will become extremely poor.
また、金属成分中にNi成分が含まれると、Nlめっき
皮膜の笛漸強度が同上するが、組成分が。Furthermore, if a Ni component is included in the metal component, the strength of the Nl plating film will be the same as above, but the composition will be...
99車童襲を越えると逆に密着性が劣化する。N1by
、分としては粒径2μ以下のNi微粉末が良好である。If it exceeds 99 degrees, the adhesion will deteriorate. N1by
, fine Ni powder with a particle size of 2 μm or less is good.
更に、ペースト中にPd成分が含まれるとめっきに対す
る活性化が強まり、均一なめつき由;極が形成され易く
、接着9Mkも向−トする。Pd成分が(J、1重量饅
未満ではその効果が充分でなく、6垂菫予を超えると接
着強度の劣化がみられ、かつコストメリットがなくなり
好ましくない0
このペーストに用いるビヒクルは、エチルセルロース、
ポリビニルブチラール、ポリビニルピロリドンなどの樹
脂をアルコール、セロソルブ、タビ坏オールなどの溶剤
に玲解したものである。Furthermore, if the paste contains a Pd component, the activation for plating will be strengthened, and a uniform plating electrode will be easily formed, and the adhesion 9Mk will also be improved. If the Pd component is less than (J, 1 weight), the effect will not be sufficient, and if it exceeds 6 violets, the adhesive strength will deteriorate, and there will be no cost advantage, which is not preferable. The vehicle used in this paste is ethyl cellulose,
It is made by dissolving resins such as polyvinyl butyral and polyvinylpyrrolidone in solvents such as alcohol, cellosolve, and tabiol.
このペーストを壁布、乾燥した後、熱処理を行なってZ
n′f:宮む金pA#粒子を析出させるが、この熱処理
は大気中300〜600 ’Cの温良で熱処理して元全
に樹脂分を燃銑させ、次いで還元2メ囲気中200〜4
10 ’Cの温にで熱処理する0大気中300℃未満の
一度の熱処理では樹脂分が元金て燃焼せずに残るため、
均一な無電解めつきの析出がされなく、接着強震も悲く
なる0また大気中600 ’Cを超える温度の熱処理で
はAg基板の変形の原因になり好ましくない。還元雰囲
気中での熱処理については、熱処理の温度が旨い程、A
e基板とZnを〆0・金属微粒子が合金化し易くなると
ともに、Zn同志の%ggも起り易くなり、接着強度が
良好になる。2しかし、熱処理温度が410℃を超える
とZnの俗解が起り、パターンS度が悪くなるとともに
均一なめっき皮膜の形成が困難になる。Apply this paste to the wall cloth, dry it, then heat treat it to create a Z
n'f: Miyamukin pA# particles are precipitated, but this heat treatment is carried out at a temperature of 300 to 600'C in the air to combust the resin content, and then reduced to 200 to 400°C in an atmosphere for 2 meters.
Heat treatment is carried out at a temperature of 10'C.In a single heat treatment at a temperature of less than 300℃ in the atmosphere, the resin content remains as the base without being burned.
Uniform electroless plating is not deposited and strong adhesion occurs. Also, heat treatment at a temperature exceeding 600'C in the atmosphere is undesirable because it causes deformation of the Ag substrate. Regarding heat treatment in a reducing atmosphere, the better the heat treatment temperature, the better the A.
It becomes easier for the metal particles to form an alloy between the e-substrate and the Zn, and the %gg of Zn also becomes easier to occur, resulting in better adhesive strength. 2. However, if the heat treatment temperature exceeds 410° C., Zn will deteriorate, the pattern S degree will deteriorate, and it will be difficult to form a uniform plating film.
まだ熱処理温度が200’C未満では密着性が充分でな
い。If the heat treatment temperature is less than 200'C, adhesion is still insufficient.
図面中の3は無電解Niめっき層であり、これは上記の
ペーストを塗布乾燥し、熱処理したAl基板を無電)@
IN iめっき液に浸漬することによって、ペースト
塗布部分にのみ選択的にiNi層が形成されるものであ
る。3 in the drawing is an electroless Ni plating layer, which is an electroless Ni plating layer on which the above paste has been applied, dried, and heat-treated.
By immersing it in an INi plating solution, an iNi layer is selectively formed only on the paste-applied area.
以上のよう(′こ、不発明においては、Al基板の所要
個所に積度よく、簡単に、密着性のよいNi層を形成で
きるため、必要部分にのみはんだ付町1しなバターを勺
゛するA4基板を量産性よく製造することができる。As mentioned above, in the present invention, it is possible to easily form a Ni layer with good adhesion in the required places on the Al substrate, so it is possible to apply a small amount of soldering butter only to the necessary parts. A4 size boards can be manufactured with good mass productivity.
以下、本発明の実施例について説明する。Examples of the present invention will be described below.
(実施y1」)
0.8B厚のAg基板の表面に、6φのパターン0重童
チ、H成分0〜10M献カからなる金楓成分0.1〜5
0M量係を宮み、樹脂分としてポリビニルピロリドン、
F8M’lとしてターピネオールからなるビヒクルを用
いた活性ペーストを塗布し、120℃で10分間乾燥し
た後、大気中250〜650℃の温度で1時間熱処理し
、更にグリーンガス中150〜450 ’Cの温度で2
0分熱処理した。(Execution y1) On the surface of a 0.8B thick Ag substrate, a 6φ pattern of 0 layers and a gold maple component of 0.1 to 5, consisting of a H component of 0 to 10M, was applied.
The amount of 0M is determined, and the resin component is polyvinylpyrrolidone.
An activated paste using a vehicle consisting of terpineol was applied as F8M'l, dried at 120°C for 10 minutes, then heat treated in air at a temperature of 250-650'C for 1 hour, and further heated at 150-450'C in green gas. 2 at temperature
Heat treated for 0 minutes.
次に、この基板を硫酸ニッケル、クエン除ンーダ9次亜
すン酸ノータからなる無冠屓ニッケルめっき液中に30
分間浸漬し、A11′基板のパターン上にNiめっき皮
膜を約7μ析出した。なお、Pd成分としては2μ以下
のPd微粉末もしくは塩化パラジウム粉末を用いた。ま
だ、Zn成分には2p以下のZn粉末およびlnCl
2粉木を用い、Ni成分には2μ以下のΔi粉禾を用い
た。Next, this substrate was placed in an uncrowned nickel plating solution consisting of nickel sulfate, citric acid removed, and hyposulfuric acid for 30 minutes.
After dipping for a minute, a Ni plating film of approximately 7μ was deposited on the pattern of the A11' substrate. As the Pd component, fine Pd powder or palladium chloride powder of 2 μm or less was used. The Zn component still contains Zn powder of 2p or less and lnCl.
2 powder wood was used, and a Δi powder of 2μ or less was used for the Ni component.
従来例としては、Ag基板の所安部分以外にしシストを
塗布硬化したi、Znで置換処理し、次いで無電解Ni
めっき、電気Niめっきにより約7メlのN1皮膜を形
成した。As a conventional example, cysts are applied to other than the safe parts of the Ag substrate and replaced with hardened i, Zn, and then electroless Ni is applied.
Approximately 7 mel of N1 film was formed by electroplating and Ni electroplating.
得られた各試料について、めっきの析出状態、はんだ付
性、めっきの接着強度を調べ、その結果を次表に示した
。表中、めっきの接着強度は上記Niめっき層上に導線
をはんだ付して引張強度を測定した。For each sample obtained, the plating precipitation state, solderability, and plating adhesive strength were examined, and the results are shown in the table below. In the table, the adhesive strength of the plating was determined by soldering a conducting wire onto the Ni plating layer and measuring the tensile strength.
(以 下 余 白)
以上の説明および表の結果より明らかなように、本発明
により得られるNiめっき層を形成したへ2基板は、は
んた付の良好な接着強度の優れためつき皮膜が形成され
、しかもNiめつき層の形成が必要部分にのみ動産性よ
く形成できるため、その産業−Fの価値は大なるものが
ある。(Margins below) As is clear from the above explanation and the results in the table, the second substrate on which the Ni plating layer obtained by the present invention is formed has a soldering film with excellent adhesive strength and good solderability. Moreover, since the Ni-plated layer can be formed only in the necessary areas with good movable property, it has great value in industry-F.
図面は本発明によりNiめつきを施したAQ基板の断面
図である。
1・・・・・・へ2基板、2・・・・・・金属微粒子層
、3・・・・・・無電解Niめっき層。
代理人の氏名 弁理士 中 尾 敏 男 ほか1名2The drawing is a sectional view of an AQ substrate plated with Ni according to the present invention. 1...2 substrate, 2...metal fine particle layer, 3...electroless Ni plating layer. Name of agent: Patent attorney Toshio Nakao and 1 other person2
Claims (2)
0重量う、ニッケル成分0〜99重量学からなる金属成
分1〜30重量%を含むペーストを塗布して乾燥し、こ
れを大気中300〜600℃のmkで熱処理し、次いで
還元雰囲気中において。200〜410゛Cの温度で熱
処理して金属微粒子層を析出させた後、その上に無電解
ニッケルめっきによりニッケル皮膜層を形成することを
特徴とするアルミニウム基板のめっき方法。(1) Zinc content of 1 to 10% in the necessary places on the aluminum substrate
A paste containing 1 to 30% by weight of a metal component of 0 to 99% by weight and a nickel component of 0 to 99% by weight is coated and dried, heat treated in air at mK of 300 to 600°C, and then placed in a reducing atmosphere. A method for plating an aluminum substrate, which comprises precipitating a metal fine particle layer by heat treatment at a temperature of 200 to 410 degrees Celsius, and then forming a nickel film layer thereon by electroless nickel plating.
襲含ませたことを特徴とする特許請求の範囲第(1)項
言巳載のアルミニウム基板のめつき方法。(2) A method for plating an aluminum substrate according to claim (1), characterized in that a palladium component is included in the metal component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4432882A JPS58161760A (en) | 1982-03-18 | 1982-03-18 | Method for plating on aluminum substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4432882A JPS58161760A (en) | 1982-03-18 | 1982-03-18 | Method for plating on aluminum substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58161760A true JPS58161760A (en) | 1983-09-26 |
Family
ID=12688433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4432882A Pending JPS58161760A (en) | 1982-03-18 | 1982-03-18 | Method for plating on aluminum substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58161760A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60198895A (en) * | 1984-03-23 | 1985-10-08 | 日立化成工業株式会社 | Method of producing multilayer printed circuit board |
JPS60198897A (en) * | 1984-03-23 | 1985-10-08 | 日立化成工業株式会社 | Method of producing multilayer printed circuit board |
JPS60198896A (en) * | 1984-03-23 | 1985-10-08 | 日立化成工業株式会社 | Method of producing multilayer printed circuit board |
JPS60198894A (en) * | 1984-03-23 | 1985-10-08 | 日立化成工業株式会社 | Method of producing multilayer printed circuit board |
-
1982
- 1982-03-18 JP JP4432882A patent/JPS58161760A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60198895A (en) * | 1984-03-23 | 1985-10-08 | 日立化成工業株式会社 | Method of producing multilayer printed circuit board |
JPS60198897A (en) * | 1984-03-23 | 1985-10-08 | 日立化成工業株式会社 | Method of producing multilayer printed circuit board |
JPS60198896A (en) * | 1984-03-23 | 1985-10-08 | 日立化成工業株式会社 | Method of producing multilayer printed circuit board |
JPS60198894A (en) * | 1984-03-23 | 1985-10-08 | 日立化成工業株式会社 | Method of producing multilayer printed circuit board |
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