JPS58154230A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS58154230A
JPS58154230A JP3763382A JP3763382A JPS58154230A JP S58154230 A JPS58154230 A JP S58154230A JP 3763382 A JP3763382 A JP 3763382A JP 3763382 A JP3763382 A JP 3763382A JP S58154230 A JPS58154230 A JP S58154230A
Authority
JP
Japan
Prior art keywords
small
deflection
deflection system
electron beam
distortion correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3763382A
Other languages
English (en)
Japanese (ja)
Other versions
JPS636140B2 (enrdf_load_html_response
Inventor
Kaoru Nakamura
薫 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP3763382A priority Critical patent/JPS58154230A/ja
Publication of JPS58154230A publication Critical patent/JPS58154230A/ja
Publication of JPS636140B2 publication Critical patent/JPS636140B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP3763382A 1982-03-10 1982-03-10 電子ビ−ム露光方法 Granted JPS58154230A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3763382A JPS58154230A (ja) 1982-03-10 1982-03-10 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3763382A JPS58154230A (ja) 1982-03-10 1982-03-10 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS58154230A true JPS58154230A (ja) 1983-09-13
JPS636140B2 JPS636140B2 (enrdf_load_html_response) 1988-02-08

Family

ID=12503038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3763382A Granted JPS58154230A (ja) 1982-03-10 1982-03-10 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS58154230A (enrdf_load_html_response)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60244024A (ja) * 1984-05-18 1985-12-03 Hitachi Ltd 電子線露光装置
JPS61214342A (ja) * 1985-03-19 1986-09-24 Nippon Kogaku Kk <Nikon> 荷電粒子ビ−ム偏向回路
JPS62277724A (ja) * 1986-05-27 1987-12-02 Fujitsu Ltd 電子ビ−ム露光装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0210434U (enrdf_load_html_response) * 1988-06-23 1990-01-23

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5093571A (enrdf_load_html_response) * 1973-12-19 1975-07-25
JPS5324792A (en) * 1976-08-20 1978-03-07 Canon Inc Semiconductor laser device
JPS5527689A (en) * 1978-08-21 1980-02-27 Jeol Ltd Electro beam exposing method
JPS5577144A (en) * 1978-12-07 1980-06-10 Jeol Ltd Electron beam exposure method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5093571A (enrdf_load_html_response) * 1973-12-19 1975-07-25
JPS5324792A (en) * 1976-08-20 1978-03-07 Canon Inc Semiconductor laser device
JPS5527689A (en) * 1978-08-21 1980-02-27 Jeol Ltd Electro beam exposing method
JPS5577144A (en) * 1978-12-07 1980-06-10 Jeol Ltd Electron beam exposure method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60244024A (ja) * 1984-05-18 1985-12-03 Hitachi Ltd 電子線露光装置
JPS61214342A (ja) * 1985-03-19 1986-09-24 Nippon Kogaku Kk <Nikon> 荷電粒子ビ−ム偏向回路
JPS62277724A (ja) * 1986-05-27 1987-12-02 Fujitsu Ltd 電子ビ−ム露光装置

Also Published As

Publication number Publication date
JPS636140B2 (enrdf_load_html_response) 1988-02-08

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