JPS58150948A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS58150948A
JPS58150948A JP3230082A JP3230082A JPS58150948A JP S58150948 A JPS58150948 A JP S58150948A JP 3230082 A JP3230082 A JP 3230082A JP 3230082 A JP3230082 A JP 3230082A JP S58150948 A JPS58150948 A JP S58150948A
Authority
JP
Japan
Prior art keywords
photosensitive
group
photosensitive composition
photoresist
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3230082A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0147774B2 (en, 2012
Inventor
Masanao Ozeki
大関　正直
Shigehiro Tanaka
重弘 田中
Takako Fujimoto
藤本　孝子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Priority to JP3230082A priority Critical patent/JPS58150948A/ja
Publication of JPS58150948A publication Critical patent/JPS58150948A/ja
Publication of JPH0147774B2 publication Critical patent/JPH0147774B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP3230082A 1982-03-03 1982-03-03 感光性組成物 Granted JPS58150948A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3230082A JPS58150948A (ja) 1982-03-03 1982-03-03 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3230082A JPS58150948A (ja) 1982-03-03 1982-03-03 感光性組成物

Publications (2)

Publication Number Publication Date
JPS58150948A true JPS58150948A (ja) 1983-09-07
JPH0147774B2 JPH0147774B2 (en, 2012) 1989-10-16

Family

ID=12355094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3230082A Granted JPS58150948A (ja) 1982-03-03 1982-03-03 感光性組成物

Country Status (1)

Country Link
JP (1) JPS58150948A (en, 2012)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60164740A (ja) * 1984-02-06 1985-08-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS62150245A (ja) * 1985-12-24 1987-07-04 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型レジスト
JPH01177031A (ja) * 1987-12-29 1989-07-13 Mitsubishi Kasei Corp ポジ型フォトレジスト組成物
JPH01281445A (ja) * 1988-05-09 1989-11-13 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0219846A (ja) * 1988-07-07 1990-01-23 Sumitomo Chem Co Ltd 集積回路製作用ポジ型レジスト組成物の製造方法
US5124228A (en) * 1988-07-20 1992-06-23 Sumitomo Chemical Co., Ltd. Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
US5378586A (en) * 1988-10-13 1995-01-03 Sumitomo Chemical Company, Limited Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
EP0710886A1 (en) 1994-10-31 1996-05-08 Fuji Photo Film Co., Ltd. Positive photoresist composition
JPH09114094A (ja) * 1996-10-18 1997-05-02 Sumitomo Chem Co Ltd 集積回路製作用ポジ型レジストパターンの形成方法
EP0840170A1 (en) * 1995-02-01 1998-05-06 Ocg Microelectronic Materials, Inc. Selected O-quinonediazide sulfonic acid esters of phenolic compounds
US6110963A (en) * 1998-05-12 2000-08-29 American Home Products Corporation Aryl-oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6214877B1 (en) 1998-05-12 2001-04-10 John A. Butera 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6221902B1 (en) 1998-05-12 2001-04-24 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6232322B1 (en) 1998-05-12 2001-05-15 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6310081B1 (en) 1999-05-10 2001-10-30 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6451827B2 (en) 1998-05-12 2002-09-17 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6699896B1 (en) 1998-05-12 2004-03-02 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60164740A (ja) * 1984-02-06 1985-08-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
JPS62150245A (ja) * 1985-12-24 1987-07-04 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型レジスト
JPH01177031A (ja) * 1987-12-29 1989-07-13 Mitsubishi Kasei Corp ポジ型フォトレジスト組成物
JPH01281445A (ja) * 1988-05-09 1989-11-13 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0219846A (ja) * 1988-07-07 1990-01-23 Sumitomo Chem Co Ltd 集積回路製作用ポジ型レジスト組成物の製造方法
US5124228A (en) * 1988-07-20 1992-06-23 Sumitomo Chemical Co., Ltd. Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester
US5378586A (en) * 1988-10-13 1995-01-03 Sumitomo Chemical Company, Limited Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0710886A1 (en) 1994-10-31 1996-05-08 Fuji Photo Film Co., Ltd. Positive photoresist composition
EP0840170A1 (en) * 1995-02-01 1998-05-06 Ocg Microelectronic Materials, Inc. Selected O-quinonediazide sulfonic acid esters of phenolic compounds
JPH09114094A (ja) * 1996-10-18 1997-05-02 Sumitomo Chem Co Ltd 集積回路製作用ポジ型レジストパターンの形成方法
US6369072B2 (en) 1998-05-12 2002-04-09 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6221902B1 (en) 1998-05-12 2001-04-24 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6214877B1 (en) 1998-05-12 2001-04-10 John A. Butera 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6232322B1 (en) 1998-05-12 2001-05-15 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6110963A (en) * 1998-05-12 2000-08-29 American Home Products Corporation Aryl-oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6391897B2 (en) 1998-05-12 2002-05-21 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6451827B2 (en) 1998-05-12 2002-09-17 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6699896B1 (en) 1998-05-12 2004-03-02 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6765021B2 (en) 1998-05-12 2004-07-20 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US7008636B2 (en) 1998-05-12 2006-03-07 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US7141672B2 (en) 1998-05-12 2006-11-28 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6310081B1 (en) 1999-05-10 2001-10-30 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia

Also Published As

Publication number Publication date
JPH0147774B2 (en, 2012) 1989-10-16

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