JPS5814945A - 気相成長装置 - Google Patents

気相成長装置

Info

Publication number
JPS5814945A
JPS5814945A JP11362181A JP11362181A JPS5814945A JP S5814945 A JPS5814945 A JP S5814945A JP 11362181 A JP11362181 A JP 11362181A JP 11362181 A JP11362181 A JP 11362181A JP S5814945 A JPS5814945 A JP S5814945A
Authority
JP
Japan
Prior art keywords
susceptor
vapor phase
phase growth
substrate wafer
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11362181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS625995B2 (enExample
Inventor
Seinosuke Ito
伊藤　誠之助
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPC Electronics Corp
Shimada Rika Kogyo KK
Original Assignee
SPC Electronics Corp
Shimada Rika Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SPC Electronics Corp, Shimada Rika Kogyo KK filed Critical SPC Electronics Corp
Priority to JP11362181A priority Critical patent/JPS5814945A/ja
Publication of JPS5814945A publication Critical patent/JPS5814945A/ja
Publication of JPS625995B2 publication Critical patent/JPS625995B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP11362181A 1981-07-22 1981-07-22 気相成長装置 Granted JPS5814945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11362181A JPS5814945A (ja) 1981-07-22 1981-07-22 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11362181A JPS5814945A (ja) 1981-07-22 1981-07-22 気相成長装置

Publications (2)

Publication Number Publication Date
JPS5814945A true JPS5814945A (ja) 1983-01-28
JPS625995B2 JPS625995B2 (enExample) 1987-02-07

Family

ID=14616850

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11362181A Granted JPS5814945A (ja) 1981-07-22 1981-07-22 気相成長装置

Country Status (1)

Country Link
JP (1) JPS5814945A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61246370A (ja) * 1985-04-23 1986-11-01 Sakaguchi Dennetsu Kk 気相化学反応炉
JPS6347364A (ja) * 1986-08-15 1988-02-29 Nippon Telegr & Teleph Corp <Ntt> 化学的気相成長法およびその装置
JP2004315930A (ja) * 2003-04-18 2004-11-11 Denso Corp Ｃｖｄ装置
JP2005294606A (ja) * 2004-04-01 2005-10-20 Ngk Insulators Ltd ウエハー加熱装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57110665A (en) * 1980-12-26 1982-07-09 Seiko Epson Corp Heating mechanism for vacuum apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57110665A (en) * 1980-12-26 1982-07-09 Seiko Epson Corp Heating mechanism for vacuum apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61246370A (ja) * 1985-04-23 1986-11-01 Sakaguchi Dennetsu Kk 気相化学反応炉
JPS6347364A (ja) * 1986-08-15 1988-02-29 Nippon Telegr & Teleph Corp <Ntt> 化学的気相成長法およびその装置
JP2004315930A (ja) * 2003-04-18 2004-11-11 Denso Corp Ｃｖｄ装置
JP2005294606A (ja) * 2004-04-01 2005-10-20 Ngk Insulators Ltd ウエハー加熱装置

Also Published As

Publication number Publication date
JPS625995B2 (enExample) 1987-02-07

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