JPS58143530A - 化合物半導体装置の製造方法 - Google Patents
化合物半導体装置の製造方法Info
- Publication number
- JPS58143530A JPS58143530A JP57027011A JP2701182A JPS58143530A JP S58143530 A JPS58143530 A JP S58143530A JP 57027011 A JP57027011 A JP 57027011A JP 2701182 A JP2701182 A JP 2701182A JP S58143530 A JPS58143530 A JP S58143530A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- compound semiconductor
- crystal
- semiconductor device
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P50/246—
Landscapes
- Drying Of Semiconductors (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57027011A JPS58143530A (ja) | 1982-02-22 | 1982-02-22 | 化合物半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57027011A JPS58143530A (ja) | 1982-02-22 | 1982-02-22 | 化合物半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58143530A true JPS58143530A (ja) | 1983-08-26 |
| JPH0214773B2 JPH0214773B2 (OSRAM) | 1990-04-10 |
Family
ID=12209159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57027011A Granted JPS58143530A (ja) | 1982-02-22 | 1982-02-22 | 化合物半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58143530A (OSRAM) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58147174A (ja) * | 1982-02-26 | 1983-09-01 | Fujitsu Ltd | 半導体装置の製造方法 |
| US4640737A (en) * | 1983-11-30 | 1987-02-03 | Kabushiki Kaisha Toshiba | Dry etching method of compound semiconductor |
| JPH01278025A (ja) * | 1988-04-29 | 1989-11-08 | Toyoda Gosei Co Ltd | 半導体のドライエッチング方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0741986U (ja) * | 1993-12-28 | 1995-07-21 | 株式会社貝野鉄工所 | 溶接機の接地部材 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5518399A (en) * | 1978-07-27 | 1980-02-08 | Eaton Corp | Plasma etching method of aluminium article |
| JPS5629328A (en) * | 1979-08-17 | 1981-03-24 | Toshiba Corp | Plasma etching method |
-
1982
- 1982-02-22 JP JP57027011A patent/JPS58143530A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5518399A (en) * | 1978-07-27 | 1980-02-08 | Eaton Corp | Plasma etching method of aluminium article |
| JPS5629328A (en) * | 1979-08-17 | 1981-03-24 | Toshiba Corp | Plasma etching method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58147174A (ja) * | 1982-02-26 | 1983-09-01 | Fujitsu Ltd | 半導体装置の製造方法 |
| US4640737A (en) * | 1983-11-30 | 1987-02-03 | Kabushiki Kaisha Toshiba | Dry etching method of compound semiconductor |
| JPH01278025A (ja) * | 1988-04-29 | 1989-11-08 | Toyoda Gosei Co Ltd | 半導体のドライエッチング方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0214773B2 (OSRAM) | 1990-04-10 |
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