JPS58139471A - Mis電界効果トランジスタ - Google Patents
Mis電界効果トランジスタInfo
- Publication number
- JPS58139471A JPS58139471A JP57022363A JP2236382A JPS58139471A JP S58139471 A JPS58139471 A JP S58139471A JP 57022363 A JP57022363 A JP 57022363A JP 2236382 A JP2236382 A JP 2236382A JP S58139471 A JPS58139471 A JP S58139471A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type
- regions
- source
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
- H10D62/235—Channel regions of field-effect devices of FETs of IGFETs
- H10D62/299—Channel regions of field-effect devices of FETs of IGFETs having lateral doping variations
- H10D62/307—Channel regions of field-effect devices of FETs of IGFETs having lateral doping variations the doping variations being parallel to the channel lengths
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
- H10D62/235—Channel regions of field-effect devices of FETs of IGFETs
- H10D62/314—Channel regions of field-effect devices of FETs of IGFETs having vertical doping variations
Landscapes
- Thin Film Transistor (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57022363A JPS58139471A (ja) | 1982-02-15 | 1982-02-15 | Mis電界効果トランジスタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57022363A JPS58139471A (ja) | 1982-02-15 | 1982-02-15 | Mis電界効果トランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58139471A true JPS58139471A (ja) | 1983-08-18 |
JPH0424877B2 JPH0424877B2 (enrdf_load_stackoverflow) | 1992-04-28 |
Family
ID=12080538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57022363A Granted JPS58139471A (ja) | 1982-02-15 | 1982-02-15 | Mis電界効果トランジスタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58139471A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02306665A (ja) * | 1989-05-20 | 1990-12-20 | Fujitsu Ltd | 半導体装置の製造方法 |
US5238857A (en) * | 1989-05-20 | 1993-08-24 | Fujitsu Limited | Method of fabricating a metal-oxide-semiconductor device having a semiconductor on insulator (SOI) structure |
JP2007214495A (ja) * | 2006-02-13 | 2007-08-23 | Oki Electric Ind Co Ltd | 半導体装置および半導体装置の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51103778A (en) * | 1975-03-10 | 1976-09-13 | Nippon Telegraph & Telephone | Handotaisochito sonoseizohoho |
JPS55130171A (en) * | 1979-03-29 | 1980-10-08 | Fujitsu Ltd | Mos field effect transistor |
-
1982
- 1982-02-15 JP JP57022363A patent/JPS58139471A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51103778A (en) * | 1975-03-10 | 1976-09-13 | Nippon Telegraph & Telephone | Handotaisochito sonoseizohoho |
JPS55130171A (en) * | 1979-03-29 | 1980-10-08 | Fujitsu Ltd | Mos field effect transistor |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02306665A (ja) * | 1989-05-20 | 1990-12-20 | Fujitsu Ltd | 半導体装置の製造方法 |
US5238857A (en) * | 1989-05-20 | 1993-08-24 | Fujitsu Limited | Method of fabricating a metal-oxide-semiconductor device having a semiconductor on insulator (SOI) structure |
JP2007214495A (ja) * | 2006-02-13 | 2007-08-23 | Oki Electric Ind Co Ltd | 半導体装置および半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0424877B2 (enrdf_load_stackoverflow) | 1992-04-28 |
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