JPS58129074A - 感熱転写層形成用インキ組成物 - Google Patents

感熱転写層形成用インキ組成物

Info

Publication number
JPS58129074A
JPS58129074A JP57011273A JP1127382A JPS58129074A JP S58129074 A JPS58129074 A JP S58129074A JP 57011273 A JP57011273 A JP 57011273A JP 1127382 A JP1127382 A JP 1127382A JP S58129074 A JPS58129074 A JP S58129074A
Authority
JP
Japan
Prior art keywords
ink composition
transfer
wax
paper
transfer layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57011273A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0131793B2 (enrdf_load_stackoverflow
Inventor
Hideichiro Takeda
竹田　秀一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP57011273A priority Critical patent/JPS58129074A/ja
Publication of JPS58129074A publication Critical patent/JPS58129074A/ja
Publication of JPH0131793B2 publication Critical patent/JPH0131793B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Printing Methods (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP57011273A 1982-01-27 1982-01-27 感熱転写層形成用インキ組成物 Granted JPS58129074A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57011273A JPS58129074A (ja) 1982-01-27 1982-01-27 感熱転写層形成用インキ組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57011273A JPS58129074A (ja) 1982-01-27 1982-01-27 感熱転写層形成用インキ組成物

Publications (2)

Publication Number Publication Date
JPS58129074A true JPS58129074A (ja) 1983-08-01
JPH0131793B2 JPH0131793B2 (enrdf_load_stackoverflow) 1989-06-28

Family

ID=11773365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57011273A Granted JPS58129074A (ja) 1982-01-27 1982-01-27 感熱転写層形成用インキ組成物

Country Status (1)

Country Link
JP (1) JPS58129074A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61146589A (ja) * 1984-12-21 1986-07-04 Nippon Kayaku Co Ltd 証券類の印刷法
JPS61268776A (ja) * 1985-05-23 1986-11-28 Seiko Epson Corp 熱転写用インク
WO1996036673A1 (fr) * 1995-05-19 1996-11-21 Polycol Color Industries Co., Ltd Encre de couleur thermofusible
US6870301B2 (en) * 1999-10-29 2005-03-22 Board Of Regents, The University Of Texas System Method of separating a template from a substrate during imprint lithography
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7105452B2 (en) 2004-08-13 2006-09-12 Molecular Imprints, Inc. Method of planarizing a semiconductor substrate with an etching chemistry
US7244386B2 (en) 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61146589A (ja) * 1984-12-21 1986-07-04 Nippon Kayaku Co Ltd 証券類の印刷法
JPS61268776A (ja) * 1985-05-23 1986-11-28 Seiko Epson Corp 熱転写用インク
WO1996036673A1 (fr) * 1995-05-19 1996-11-21 Polycol Color Industries Co., Ltd Encre de couleur thermofusible
US5906678A (en) * 1995-05-19 1999-05-25 Polycol Color Industries Co., Ltd. Hot melt colored ink
US6870301B2 (en) * 1999-10-29 2005-03-22 Board Of Regents, The University Of Texas System Method of separating a template from a substrate during imprint lithography
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US7105452B2 (en) 2004-08-13 2006-09-12 Molecular Imprints, Inc. Method of planarizing a semiconductor substrate with an etching chemistry
US7244386B2 (en) 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom

Also Published As

Publication number Publication date
JPH0131793B2 (enrdf_load_stackoverflow) 1989-06-28

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