JPS58127324A - Preparing device for drawing data of electron beam exposure device - Google Patents

Abstract

PURPOSE:To shorten a time required for data conversion by dividing a drawing pattern into a plurality of partitions, by performing a data conversion processing for each partition in parallel, and by specifying the position whereat each partition is arranged. CONSTITUTION:Data on drawing patterns are inputted in an operation processing unit 4 from a drawing pattern data input apparatus 1, while a partitioning information and an arrangement position informtation are inputted in the operation processing unit 4 from a partitioning specifying apparatus 2. A controller 47 delivers these data and informations to operation processing devices 41-45 independently for each partition. The operation processing devices 41-45 perform data conversion processings in parallel, and the converted data are stored temporarily a storage device 46 for working and then delivered to a converted data output apparatus 3 through the controller 47. In the output apparatus 3, the converted data are stored in storages 31 and 32, or a drawing pattern is prepared by an electron beam exposure unit 33. As for a memory array MA, the number of converted pattern data decreases to 1/30, since partitioning is repeated in 30 times. As for a sense amplifier SA, said number is reduced to 1/5, since partitioning 5 is repeated in 5 times.

Description

DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a lithography data creation apparatus for an electron beam exposure apparatus that creates lithography data for the electron beam exposure apparatus.

Technical background of the invention and its problems In the process of creating drawing data required by electron beam exposure equipment, especially in the case of drawing data for integrated circuits, the degree of integration of integrated circuits has increased rapidly in recent years. There is. For example, drawing data for one million figures may be created. Processing to convert such grand prize data into drawing data in a format desired by the electron beam exposure apparatus requires an enormous amount of processing time, lasting several hours.

On the other hand, the writing time in an electron beam exposure apparatus after writing data is prepared has been increasing year by year, and has recently been reduced to several minutes to several tens of minutes.

For this reason, the creation of lithography data for electron beam exposure equipment is becoming a stumbling block in the integrated circuit manufacturing process.

Purpose of the Invention The present invention has been made in view of the above-mentioned circumstances, and can significantly improve efficiency by significantly shortening the data conversion time required to create drawing data to be supplied to an electron beam exposure device. An object of the present invention is to provide a drawing data creation device for an electron beam exposure device.

Summary of the Invention The drawing data creation device of the present invention comprises a dance processing device configured with a plurality of arithmetic processing devices, divides a drawn gloss turn into a plurality of sections, and performs data conversion processing of pattern data for each section independently. Reduce processing time by processing in parallel,
Furthermore, in addition to specifying the placement position of each section, for multiple sections with the same data, it is possible to convert only one section and use the converted data in multiple sections, and the number of f-turn data to be processed. This feature dramatically reduces the processing time, thereby realizing faster processing times.

Embodiment of the Invention Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.

FIG. 1 shows a drawing data creation device for an electron beam exposure apparatus according to an embodiment of the present invention.

In the figure, reference numeral 1 indicates an online storage 11 such as a magnetic tape or an offline storage 1 such as a magnetic disk for inputting drawing data. The drawing glosser 77'' data input device 2 specifies a drawing pattern division method for high-speed processing of drawing data creation for an electron beam exposure device, and also specifies a drawing pattern division method to obtain desired drawing data. 3 is a conversion result from an arithmetic processing device 4, which will be described later. Once the data is recorded, the electron beam exposure device 3
Online storage 3, such as a magnetic disk, for supplying the recorded data conversion results to the drawing data creation device 3! Offline storage such as magnetic tape etc.3
This is a conversion result data output device including 1. Further, the electron beam exposure device 33 may be used to directly write a desired lean pattern based on the conversion result data from the arithmetic processing device 4. Then, the arithmetic processing unit 4 receives the input iJ? It is for performing necessary data conversion on turn data, and includes a plurality of arithmetic processors 41.
4s and the working storage device 4, these arithmetic processing units 41 to 411% working storage device 4, the drawing pattern data input device 1, the partitioning designation device 2, and the conversion result data output device 3. It includes four controllers that control data input and output between the two.

FIG. 2 shows an example of partitioning when data is converted to obtain drawing data for a memory integrated circuit in the above apparatus, and the operation of the above apparatus will be explained with reference to this example. In this example, the entire drawing pattern including two memory arrays MA, sense amplifier fsm, and address circuit AC is divided into 24 types of sections as shown in FIG. 2(b), and data conversion is performed. There is. That is, first, the drawing/mother turn data is inputted from the drawing/9-turn data input device 1 to the arithmetic processing device 4, and the section division information of the drawing data and its arrangement position information are subjected to arithmetic processing from the section division specifying device 2. input into the device 4. The controller 47 of the arithmetic processing device 4 receives these drawing/nine-turn data and section division method designation information, sets Kfi for each section, and sends the drawing pattern data to the arithmetic processing devices 41 to 4s. The arithmetic processing devices 41 to 4sa perform data conversion processing on the drawing pattern data for each section independently and in parallel. The converted data is temporarily stored in the working storage device 4 for each section based on the arrangement position information, and is sent to the conversion result data output device 3 via the controller 47 as necessary. At this time, the controller 47 performs sending control based on the placement position information received from the specified device 2 and specifying where each section is placed in the drawing mother turn. Output the desired drawing data. The output device 3 stores these converted data in the storage '1eJ1, or directly creates a desired drawing pattern using the electron beam exposure device 31 based on the conversion result data (drawing data).

Furthermore, for the memory array MA and the sense amplifier 8, the data of sections 3 and 5 are repeated, and the arithmetic processing unit 4 repeats the same data in multiple sections as described above based on the arrangement position information. /One section for medium turn data (
- times). Therefore, memory array MA
As for section 3, it is repeated 30 times, so convert it to Yaturn data several companies%. Sense amplifier 8
Regarding A, since the edge of section 5 is turned around five times, the number of nonaturn data to be converted is reduced to A. The division processing of such identical data is controlled by a four-way controller. Therefore, it is preferable to set the partitioning method so that as many partitions as possible having the same data are generated.

In the above-mentioned lithography rotor creation device for an electron beam exposure apparatus, the approximate formula for the time required for data conversion necessary for rounding to create lithography data is as follows. However, it is assumed that the functions that are increased in speed because the arithmetic processing unit 4 holds a plurality of arithmetic processing devices are simply 1/1 in the number of the arithmetic processing devices that are implemented.

The approximate formula for the conversion time is shown by the following formula.

Here, T is the time required to create lithography data for the conventional electron beam exposure system, 7F is the time required for the creation of lithography data for the electron beam exposure system of the present invention, and the overall lithography time that is reduced by the divided sections that are used repeatedly for one time. The ratio of the number of Δ turns to be converted to the number of four turns, M is the number of processing devices installed in the processing device.

Therefore, when converting the .f-turn data of the nine memory integrated circuits shown in FIG. 2 using this apparatus, the conversion time is 17-LxT from the above equation (1).

00 However, if the number of arithmetic processing devices is rleJ, and the ratio of the number of conversion nodes to decrease, then the memory array M is equal to. So, although the sense amplifier is 8%, it is rated as ◎ on average. In other words, if this device converts the Noreen data of the memory integrated circuit shown in Figure 2, the time required for conversion will be shorter than that of the conventional system.
It can be shortened to 0.

According to the lithography data creation device for the electron beam exposure apparatus described above, the time required to create lithography data can be reduced by reducing the number of linear data to be converted from a fraction to several tenths. In addition to being able to shorten the number from a fraction of a fraction to a tenth of a fraction, it is possible to further reduce the data conversion process for the notarnators contained in each division by processing each division independently and in parallel. , simply the operation 461
Arithmetic processing 3 implemented in 1 scissors holder 4! The data conversion process is reduced to one times the number of devices in the device.

DETAILED DESCRIPTION OF THE INVENTION As described in detail, according to the present invention, the time required for the drawing process in an electron beam exposure apparatus, which conventionally required several hours, can be significantly shortened, and the efficiency can be significantly improved. A drawing data creation device for an exposure device can be provided.

[Brief explanation of drawings]

FIG. 1 is a block diagram of a drawing data creation device for an electron beam processing device according to an embodiment of the present invention, and FIGS. 2(a) and (b)
) is a diagram showing an example of a pattern of a memory integrated circuit whose data is converted by the above device and an example of partitioning thereof. DESCRIPTION OF SYMBOLS 1...Drawing/4-tap data input device, 2...Partition division specification device, 3...Conversion result data output device, 4.
...Arithmetic processing unit, 41~4$...Arithmetic processing equipment, 4
a...Working memory device, 47-...Controller, 3
s...Electron beam exposure device.

Claims (1)

[Scope of Claims] (1> A data input device that outputs drawing/4' turn data; and a section division designation device that outputs section division specification information for dividing the drawing/arm turn into a plurality of sections. Based on the division designation information from this designated device, the drawing/turn input from the data input device is divided into a plurality of patterns, and the desired r-turn conversion is performed by an independent arithmetic processing device on each division side. A lithography data creation device for an electron beam exposure apparatus, characterized in that it comprises arithmetic processing means for obtaining desired lithography data necessary for electron beam exposure. Outputting placement position designation information specifying where in the entire desired drawing data each section divided and data-converted by the arithmetic processing device is to be placed, together with the section division specification information, to the arithmetic processing means. 1IiIf- of an electron beam exposure apparatus according to claim 1, wherein the arithmetic processing means determines the arrangement of each section based on the arrangement position designation information and obtains desired drawing data. (3) The partitioning specification device outputs partitioning specification information for specifying to generate a plurality of partitions having the same data, and draws the partitions having the same data as desired. The arithmetic processing means outputs placement position designation information for placing the data in a plurality of sections in the entire data, and the arithmetic processing means performs data conversion processing on only one section for the plurality of sections containing the same data, and converts this conversion r-ta into the A drawing pattern forming apparatus 0 for an electron beam exposure apparatus according to claim 2, characterized in that it is used for a plurality of sections based on arrangement position designation information.