JPH04125916A - Data conversion processor - Google Patents

Abstract

PURPOSE:To unnecessitate a storage device for format conversion, by supplying format data to a comparing means, while format-changing hierarchical design pattern data at a speed higher than the fetching speeds of aligner and a comparing means of an inspection equipment. CONSTITUTION:Design pattern data are converted into format data for an aligner by a data converting part 11, and supplied to a control part 33 via a data controller 32. The output of the control part 33 is sent to an electron gun control part 34, and an electron beam emitted from an electron gun 35 is subjected to ON/OFF control. On the other hand, the output data from the control part 33 are supplied to a stage controller 36, and a stage 37 is subjected to moving control. By the electron beam from the electron gun 35, a desired pattern 39 is drawn on a specimen 38 which is subjected to the moving control as a unfied body with the stage 37. Thereby, even in the case where a pattern to be drawn or inspected is microminiaturized with high density, exposure and inspection are enabled with high precision.

Description

[Detailed Description of the Invention] [Summary] The present invention relates to a data conversion processing device for converting data into data used in a semiconductor integrated circuit manufacturing process, and is aimed at performing data conversion processing without using a large-capacity storage device. A data conversion section that converts hierarchical design pattern data obtained by design into format data for the exposure device, and a pattern is drawn on the sample based on the format data for the exposure device that is sequentially sent from the data conversion section. an exposure device, the data conversion section performs conversion processing faster than data capture by the exposure device, and the format data for the exposure device is supplied to the exposure device without intervening a storage device. .

[Industrial application field]

The present invention relates to a data conversion processing device, and more particularly to a data conversion processing device for converting data into data used in a semiconductor integrated circuit manufacturing process.

In recent years, the amount of data used in semiconductor processing equipment, especially exposure equipment and inspection equipment that operate based on databases, has become enormous due to the increased density and miniaturization of semiconductor integrated circuits. It is necessary to perform data compression processing, and necessary data processing must be performed in parallel with the operation of devices such as exposure equipment.

[Conventional technology]

When manufacturing large-scale integrated circuits (LSI), conventional data conversion processing equipment for exposure equipment uses design pattern data obtained from layout design using a computer-aided design (CAD) system to be drawn using the exposure equipment. After converting the format of data into a suitable format for the exposure device using a large host computer, all data necessary for exposure is stored in an external storage device of the exposure device. The exposure device sequentially reads out the format data for the exposure device stored in this external storage device, and performs exposure according to the data.

In addition, the data conversion processing device for the inspection device is used to store design pattern data in the external storage device of the inspection device that inspects whether the desired pattern is accurately formed on reticles, masks, wafers, etc. used in LSI manufacturing. It converts the format to generate format data for inspection equipment and stores it. The storage device sequentially reads out this inspection device format data from the external storage device and converts it into image information, and compares and collates it with pattern image information from the optical sensor to obtain inspection results.

[Problem to be solved by the invention]

However, in recent years, as LSIs have become increasingly highly integrated and miniaturized, the amount of format data converted and output from design pattern data by the data conversion processing device described above has increased dramatically. Correspondingly, external storage devices with large storage capacities are now required.

However, there is a limit to increasing the capacity of external storage devices, and it has become difficult to store the entire amount of data in external storage devices such as exposure equipment. Each of the data is stored in a file, and only the amount that can be stored in the external storage device is transferred to the external storage device.

However, in this case, once the exposure or inspection based on the format data stored in the external storage device is completed, the exposure or inspection is interrupted until the start of exposure or inspection based on the format data transferred from the next file to the external storage device. However, during the interruption period, the stage picks up surrounding vibrations and undergoes minute displacements, resulting in joints between exposure patterns, etc. between files, resulting in the problem that exposure can only be performed with rough accuracy near the joints. ing.

The present invention has been made in view of the above points, and an object of the present invention is to provide a data conversion processing device that can perform data conversion processing without using a large-capacity storage device.

[Means to solve the problem]

FIGS. 1A and 1B are block diagrams of the principles of each invention described in claim 1.3 in the claims section, respectively.

As shown in FIG. 1(A), the invention according to claim 1 includes a data converter 11 that converts hierarchical design pattern data 10 obtained by layout design into format data for an exposure apparatus; It has an exposure device 12 that draws a pattern on the sample based on the image data.

Further, the invention according to claim 3, as shown in FIG. 1(B),
A data conversion unit 1 that converts hierarchical design pattern data 13 of an object to be inspected into format data for an inspection device.
4, a conversion means 15 for converting the pattern formed on the object to be inspected into image information, and a successive comparison of the inspection device format data from the data conversion section 14 with the pattern image information from the conversion means 15 to obtain an inspection result. Comparison method 1 to obtain
6.

Each invention shown in FIGS. 1(A) and 1(B) has an exposure device 12.
The data conversion section 11.14 performs conversion processing faster than the data acquisition by the comparison means 16, and the format data is transferred to the exposure device 12.14 without the intervention of a storage device. It is characterized in that it is supplied to comparison means 16.

[Effect]

Design pattern data lO whose layout was designed by a CAD system and design pattern data 13 of the object to be inspected
is hierarchical data given in the form of line segment information, and is schematically shown at 21 in FIG. On the other hand, the data that can be drawn by the exposure device 12 and the data that can be compared by the comparing means 16 are the design pattern data 10.1.
This data is obtained by converting the format of 3, and is given in the form of graphical information, and is schematically shown at 22 in FIG. Here, while the increase in density and miniaturization of LSIs does not bring about a significant increase in the amount of design pattern data 10 and 13, it brings about a dramatic increase in the amount of format-converted data. The present invention provides a data conversion section 11. which generates the above-mentioned format-converted data.
The conversion processing speed of 14 is determined by the exposure device 12. Since the data acquisition speed is faster than that of the comparison means 16, a storage device for storing format-converted data in advance can be eliminated.

Further, the above-mentioned high-speed data conversion processing is performed by dividing the exposure device format data or the inspection device format data.

〔Example〕

FIG. 3 shows a configuration diagram of a first embodiment of the present invention.

In the figure, the same components as in FIG. 1(A) are given the same reference numerals. In FIG. 3, numeral 31 denotes a design data storage section that stores the hierarchical design pattern data 10. As shown in FIG. This design pattern data is stored in the data conversion unit 1, which will be described later.
After being format-converted in step 1 and converted into format data for an exposure apparatus, the data is input to the data controller 32.

Here, the data conversion unit 11 sends format data for the exposure device necessary for the drawing process of one field (main field) to the exposure device 12 while dividing the data. This division processing means division processing in terms of exposure area and data structure.

The data controller 32 rearranges the input format data for the exposure device in a predetermined order if the exposure area has been divided, or rearranges the data in a predetermined order if the data has been divided due to the structure of the data. The data obtained through processing such as combining is sent to the control unit 33.
supply to

The control unit 33 supplies output data to the electron gun control unit 34,
This controls the on/off of the electron beam emitted from the electron gun 35, while supplying output data to the stage controller 36, thereby controlling the movement of the stage 37.

A sample 38 is placed on the stage 37, and a desired pattern 39 is drawn on the sample 38, whose movement is controlled integrally with the stage 37, by an electron beam from the electron gun 35.

Here, the data conversion section 11 has a configuration as shown in FIG. 4, for example. In the figure, 41 is a control central processing unit (
(hereinafter referred to as a control CPU), 42, to 428 are graphic processing processors, 431 and 432 are large-capacity memories, 4
Reference numeral 4 designates image memories, which are connected to a system bus 45, respectively. Furthermore, graphic processing processors 421 to 428
, large capacity memory 43. ．． 43□ and the image memory 44 are connected to each other via a local bus 46. Also,
A cathode ray tube (CRT) 47 displays image data from the image memory 44.

The control CPU 41 is a processor that controls format conversion processing, and includes eight graphic processing processors 42. ~42
．． Performs the necessary processing to operate in parallel.

Graphics processor 42. ~42. have the same configuration,
Arithmetic central processing unit (hereinafter referred to as arithmetic CPU) 42
i, cache memory 422 and data memory 423
It consists of The arithmetic CPU 421 performs arithmetic processing necessary for format conversion, and if the necessary data is in the cache memory 422, it is stored in the cache memory 4.
22, and if it is not in the cache memory 422, the data memory 423 is accessed and the data memory 42 is loaded.
Import from 3.

The data memory 423 has a capacity capable of storing at least one field area of data, and is composed of, for example, 16 Mbytes. In addition, the cache memory 422 has 12
It is configured to have a capacity of approximately 8 Kbytes.

Large capacity memory 43. and 432 have a capacity to store design pattern data in an amount necessary for format conversion, and are used, for example, of 64 Mbytes. Large capacity memory 4
3. and 432 are layered together with the cache memory 422 and data memory 423 as storage means for format conversion data, and are configured to be accessible from the arithmetic CPU 41. Therefore, large capacity memo IJ 4
3.

The memory contents of 432 are stored in the graphics processor 42. ~428
It can be referenced and updated from.

In addition, a data memory 423 and a large capacity memory 43° and 4
32, it is configured so that data can be transferred in field area units, and large capacity memories 431 and 432
to graphic processing processors 421-42. The design pattern data is transferred to the graphic processing processor 42.
~428 to large capacity memory 43. and 43. Format conversion data for one field area is transferred to.

According to the data conversion unit 11 having such a configuration, the cache memory 422 . Data memory 423 and mass memory 43
．． ．． 4L hierarchization is performed appropriately, and the control CP
Eight graphic processing processors 42 by U41. ~42.
In addition, each of the graphic processing processors 421 to 428 can execute processing for each field in parallel without waste, so data conversion processing efficiency is greatly increased, and data conversion processing time is reduced by the exposure device 12. The time required to import data can be reduced.

Therefore, the format conversion data for the exposure device from the data conversion section 12 can be supplied to the exposure device 12 as is without being stored in the storage device. When used,
It is possible to eliminate the need to increase the capacity of the storage device attached to the exposure device.

Further, according to this embodiment, format data is not obtained sequentially from a plurality of files as in the conventional method, and there is no interruption of exposure, so that exposure can be performed with higher precision than in the conventional method.

Next, a second embodiment of the present invention will be described with reference to the configuration diagram of FIG. 5. In the figure, the same components as in FIG. 1(B) are given the same reference numerals. In FIG. 5, a design data storage unit 51 stores hierarchical design pattern data of an object to be inspected, and this design pattern data is input to a data conversion unit 14 and converted into format data for an inspection device. be done. The data converter 14 has the same configuration as the data converter 11 described above, as shown in FIG. The data is sent to 52.

The data controller 52 performs signal processing similar to that of the data controller 32 described above, and supplies the data obtained thereby to the control section 53. The control section 53 supplies output data to the stage controller 54, thereby controlling the movement of the stage 55. An object to be inspected 56 such as a reticle on which a pattern is formed is placed on the stage 55.
It is configured to move integrally with the stage 55.

The stage 55 has an outer frame, and the center part is hollow, and light from a light source 57 arranged below the stage 55 passes through the hollow part and is irradiated onto the back surface of the object to be inspected 56. It is configured to transmit to the surface of the object 56.

After the pattern image formed on the object to be inspected 56 is captured by the optical sensor 58, it is transferred to the image signal converter 5 having a memory.
9, where the pattern image information of the object to be inspected 56 is converted into existing digital data.

On the other hand, the format conversion data for the inspection device taken out from the control section 53 is the original correct data of the pattern formed on the object to be inspected 56, and this data is input to the image signal conversion section 60 to provide the original correct data. It is converted into digital data representing the pattern image.

The comparison circuit 61 compares and collates both digital data taken out from the image signal converters 59 and 60, respectively, and outputs a test result depending on whether or not they match.

As described above, according to the present embodiment, the data converter 14 has the same configuration as that shown in FIG. Since the data conversion unit 14 can convert the pattern image information into the format data for the inspection device at a higher speed than the speed at which the pattern image information is captured, a storage device for storing the format data for the inspection device in advance becomes unnecessary.

It should be noted that the present invention is not limited to the above-described embodiments, and for example, the exposure apparatus 12 may be another exposure apparatus that uses X-rays, ion beams, etc. in addition to electron beams.

〔Effect of the invention〕

As described above, according to the present invention, hierarchical design pattern data is converted into a format faster than the import speed of the comparison means of the exposure apparatus or inspection apparatus, and the format data is supplied to the comparison means of the exposure apparatus or inspection apparatus. This eliminates the need for a storage device for storing format conversions, making it possible to perform exposure and inspection even when the pattern to be drawn or inspected is particularly dense and minute. It has features such as being able to perform exposure and inspection with higher precision than conventional methods because there is no interruption between exposure and inspection using data stored in one file, and exposure and inspection using data stored in the next file. It is.

4,

[Brief explanation of drawings]

FIG. 1 is a block diagram of the principle of the present invention, FIG. 2 is an explanatory diagram of the operation of FIG. 1, FIG. 3 is a block diagram of the first embodiment of the present invention, and FIG. 4 is an embodiment of the data converter FIG. 5 is a block diagram of a second embodiment of the present invention. In the figure, 10.13 indicates pattern design data, 11.14 indicates a data conversion section, 12 indicates an exposure device, 15 indicates conversion means, and 16 indicates comparison means.

Claims (1)

[Claims] (1) A data conversion unit (11) that converts hierarchical design pattern data obtained by layout design into format data for exposure equipment;
an exposure device (12) that draws a pattern on the sample based on format data for the exposure device sequentially sent from
The data conversion unit (11) performs conversion processing faster than data acquisition by the exposure device (12), and converts format data for the exposure device to the exposure device (12) without intervening a storage device. ). (2) The data conversion unit (11) supplies the exposure device format data necessary for the drawing process of one field to the exposure device (12) while dividing the data. Data conversion processing device. (3) a data converter (14) that converts hierarchical design pattern data of the object to be inspected into format data for an inspection device; and a converter (15) that converts the pattern formed on the object to be inspected into image information. ), and a comparison means (16) for obtaining an inspection result by successively comparing the inspection device format data sequentially sent from the data conversion section (14) with the pattern image information from the conversion means (15). The data conversion section (14) performs conversion processing faster than the data acquisition by the comparison means (16), and supplies the inspection device format data to the comparison means (16) without intervening a storage device. A data conversion processing device characterized by: (4) The data according to claim 3, wherein the data conversion unit (14) supplies the inspection device format data necessary for one inspection process to the comparison unit (16) while dividing the data. Conversion processing device.