JPS58122726A - レジスト寸法の精密制御による半導体素子の製造方法 - Google Patents

レジスト寸法の精密制御による半導体素子の製造方法

Info

Publication number
JPS58122726A
JPS58122726A JP57004035A JP403582A JPS58122726A JP S58122726 A JPS58122726 A JP S58122726A JP 57004035 A JP57004035 A JP 57004035A JP 403582 A JP403582 A JP 403582A JP S58122726 A JPS58122726 A JP S58122726A
Authority
JP
Japan
Prior art keywords
exposure time
center
resist pattern
width
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57004035A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6219049B2 (enExample
Inventor
Yuzo Shimazaki
島崎　有造
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP57004035A priority Critical patent/JPS58122726A/ja
Publication of JPS58122726A publication Critical patent/JPS58122726A/ja
Publication of JPS6219049B2 publication Critical patent/JPS6219049B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57004035A 1982-01-16 1982-01-16 レジスト寸法の精密制御による半導体素子の製造方法 Granted JPS58122726A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57004035A JPS58122726A (ja) 1982-01-16 1982-01-16 レジスト寸法の精密制御による半導体素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57004035A JPS58122726A (ja) 1982-01-16 1982-01-16 レジスト寸法の精密制御による半導体素子の製造方法

Publications (2)

Publication Number Publication Date
JPS58122726A true JPS58122726A (ja) 1983-07-21
JPS6219049B2 JPS6219049B2 (enExample) 1987-04-25

Family

ID=11573701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57004035A Granted JPS58122726A (ja) 1982-01-16 1982-01-16 レジスト寸法の精密制御による半導体素子の製造方法

Country Status (1)

Country Link
JP (1) JPS58122726A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5943550A (en) * 1996-03-29 1999-08-24 Advanced Micro Devices, Inc. Method of processing a semiconductor wafer for controlling drive current

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01159559U (enExample) * 1988-04-23 1989-11-06

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5943550A (en) * 1996-03-29 1999-08-24 Advanced Micro Devices, Inc. Method of processing a semiconductor wafer for controlling drive current

Also Published As

Publication number Publication date
JPS6219049B2 (enExample) 1987-04-25

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