JPS58117405A - パタ−ン測定方法 - Google Patents

パタ−ン測定方法

Info

Publication number
JPS58117405A
JPS58117405A JP70882A JP70882A JPS58117405A JP S58117405 A JPS58117405 A JP S58117405A JP 70882 A JP70882 A JP 70882A JP 70882 A JP70882 A JP 70882A JP S58117405 A JPS58117405 A JP S58117405A
Authority
JP
Japan
Prior art keywords
pattern
positions
scanning
values
specified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP70882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS642201B2 (enrdf_load_stackoverflow
Inventor
Takao Namae
生江　隆男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP70882A priority Critical patent/JPS58117405A/ja
Publication of JPS58117405A publication Critical patent/JPS58117405A/ja
Publication of JPS642201B2 publication Critical patent/JPS642201B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/04—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Electron Beam Exposure (AREA)
JP70882A 1982-01-05 1982-01-05 パタ−ン測定方法 Granted JPS58117405A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP70882A JPS58117405A (ja) 1982-01-05 1982-01-05 パタ−ン測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP70882A JPS58117405A (ja) 1982-01-05 1982-01-05 パタ−ン測定方法

Publications (2)

Publication Number Publication Date
JPS58117405A true JPS58117405A (ja) 1983-07-13
JPS642201B2 JPS642201B2 (enrdf_load_stackoverflow) 1989-01-17

Family

ID=11481264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP70882A Granted JPS58117405A (ja) 1982-01-05 1982-01-05 パタ−ン測定方法

Country Status (1)

Country Link
JP (1) JPS58117405A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63231205A (ja) * 1987-03-19 1988-09-27 Osaka Daiyamondo Kogyo Kk 輪郭形状の測定方法
JP2002202115A (ja) * 2000-11-09 2002-07-19 Samsung Electronics Co Ltd 測定装置の自動測定エラー検出方法
JP2007192594A (ja) * 2006-01-17 2007-08-02 Horon:Kk パターン画像取得方法およびパターン画像取得装置
WO2011145338A1 (ja) * 2010-05-21 2011-11-24 株式会社日立ハイテクノロジーズ パターン寸法計測方法、パターン寸法計測装置、パターン寸法計測方法をコンピュータに実行させるプログラム及びこれを記録した記録媒体

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54138467A (en) * 1978-04-19 1979-10-26 Hitachi Ltd Scanning type electron microscope or resembling apparatus
JPS56164902A (en) * 1980-05-23 1981-12-18 Kawasaki Steel Corp Thickness measuring device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54138467A (en) * 1978-04-19 1979-10-26 Hitachi Ltd Scanning type electron microscope or resembling apparatus
JPS56164902A (en) * 1980-05-23 1981-12-18 Kawasaki Steel Corp Thickness measuring device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63231205A (ja) * 1987-03-19 1988-09-27 Osaka Daiyamondo Kogyo Kk 輪郭形状の測定方法
JP2002202115A (ja) * 2000-11-09 2002-07-19 Samsung Electronics Co Ltd 測定装置の自動測定エラー検出方法
JP2007192594A (ja) * 2006-01-17 2007-08-02 Horon:Kk パターン画像取得方法およびパターン画像取得装置
WO2011145338A1 (ja) * 2010-05-21 2011-11-24 株式会社日立ハイテクノロジーズ パターン寸法計測方法、パターン寸法計測装置、パターン寸法計測方法をコンピュータに実行させるプログラム及びこれを記録した記録媒体
JP2011242352A (ja) * 2010-05-21 2011-12-01 Hitachi High-Technologies Corp パターン寸法計測方法、パターン寸法計測装置、パターン寸法計測方法をコンピュータに実行させるプログラム及びこれを記録した記録媒体
US9191628B2 (en) 2010-05-21 2015-11-17 Hitachi High-Technologies Corporation Pattern dimension measurement method, pattern dimension measurement device, program for causing computer to execute pattern dimension measurement method, and recording medium having same recorded thereon

Also Published As

Publication number Publication date
JPS642201B2 (enrdf_load_stackoverflow) 1989-01-17

Similar Documents

Publication Publication Date Title
US8107685B2 (en) Displacement sensor having a display data output
KR102392338B1 (ko) 패턴 계측 장치 및 패턴 계측 방법
US20160056014A1 (en) Superposition Measuring Apparatus, Superposition Measuring Method, and Superposition Measuring System
US9866747B2 (en) Optical displacement measurement system, imaging condition optimization method, and imaging condition optimization program
US20110233400A1 (en) Pattern measurement apparatus and pattern measurement method
US10977786B2 (en) Wafer observation device
CN101109620A (zh) 一种结构光视觉传感器结构参数标定方法
KR102137454B1 (ko) 오버레이 오차 계측 장치, 및 컴퓨터 프로그램
US8431895B2 (en) Pattern measuring apparatus and pattern measuring method
KR880010457A (ko) 콘버젼스 측정 및 보정 판정 방법과 장치
JP2020027055A (ja) 光学式変位計
JPS58117405A (ja) パタ−ン測定方法
JP3265724B2 (ja) 荷電粒子線装置
JPS58117404A (ja) パタ−ン測定法
US20110304586A1 (en) Infrared type handwriting input apparatus and scanning method
JPS63266747A (ja) 試料像表示装置
US8605985B2 (en) Pattern measurement apparatus and pattern measurement method
JPH06151564A (ja) ウェーハパターン装置
JPH0416707A (ja) 電子ビームによるパターン認識方法
JPS61211935A (ja) カラ−ブラウン管のコンバ−ゼンス量検出方法
JPS63199416A (ja) 位置ずれ測定用マ−クおよびこれを用いた位置ずれ測定方法
JP2539530B2 (ja) 試料像表示装置
JPH0375046B2 (enrdf_load_stackoverflow)
JPH0646543B2 (ja) 受像管のコンバージェンス測定方法
JPH03160306A (ja) 幅測定装置