JPS58115741A - 複合ビ−ム照射装置 - Google Patents

複合ビ−ム照射装置

Info

Publication number
JPS58115741A
JPS58115741A JP56215709A JP21570981A JPS58115741A JP S58115741 A JPS58115741 A JP S58115741A JP 56215709 A JP56215709 A JP 56215709A JP 21570981 A JP21570981 A JP 21570981A JP S58115741 A JPS58115741 A JP S58115741A
Authority
JP
Japan
Prior art keywords
irradiated
laser beam
electron
electron beam
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56215709A
Other languages
English (en)
Japanese (ja)
Other versions
JPH057824B2 (enrdf_load_stackoverflow
Inventor
Seiichiro Kawamura
河村　誠一郎
Junji Sakurai
桜井　潤治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56215709A priority Critical patent/JPS58115741A/ja
Publication of JPS58115741A publication Critical patent/JPS58115741A/ja
Publication of JPH057824B2 publication Critical patent/JPH057824B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
JP56215709A 1981-12-28 1981-12-28 複合ビ−ム照射装置 Granted JPS58115741A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56215709A JPS58115741A (ja) 1981-12-28 1981-12-28 複合ビ−ム照射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56215709A JPS58115741A (ja) 1981-12-28 1981-12-28 複合ビ−ム照射装置

Publications (2)

Publication Number Publication Date
JPS58115741A true JPS58115741A (ja) 1983-07-09
JPH057824B2 JPH057824B2 (enrdf_load_stackoverflow) 1993-01-29

Family

ID=16676857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56215709A Granted JPS58115741A (ja) 1981-12-28 1981-12-28 複合ビ−ム照射装置

Country Status (1)

Country Link
JP (1) JPS58115741A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS625547A (ja) * 1985-07-01 1987-01-12 Ulvac Corp 基板表面上の異物観察装置
JP2017532719A (ja) * 2014-08-22 2017-11-02 ア−カム アーベー 改善された電子ビーム生成

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51113468A (en) * 1975-03-29 1976-10-06 Toshinobu Takagi Solid surface processing system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51113468A (en) * 1975-03-29 1976-10-06 Toshinobu Takagi Solid surface processing system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS625547A (ja) * 1985-07-01 1987-01-12 Ulvac Corp 基板表面上の異物観察装置
JP2017532719A (ja) * 2014-08-22 2017-11-02 ア−カム アーベー 改善された電子ビーム生成

Also Published As

Publication number Publication date
JPH057824B2 (enrdf_load_stackoverflow) 1993-01-29

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