GB1011173A - Improvements in and relating to the making and testing of thin film articles - Google Patents
Improvements in and relating to the making and testing of thin film articlesInfo
- Publication number
- GB1011173A GB1011173A GB34741/63D GB3474163D GB1011173A GB 1011173 A GB1011173 A GB 1011173A GB 34741/63 D GB34741/63 D GB 34741/63D GB 3474163 D GB3474163 D GB 3474163D GB 1011173 A GB1011173 A GB 1011173A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrates
- substrate
- thin film
- article
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 title abstract 7
- 239000000758 substrate Substances 0.000 abstract 20
- 239000011248 coating agent Substances 0.000 abstract 6
- 238000000576 coating method Methods 0.000 abstract 6
- 239000010408 film Substances 0.000 abstract 6
- 238000010894 electron beam technology Methods 0.000 abstract 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 2
- 229910052782 aluminium Inorganic materials 0.000 abstract 2
- 239000004411 aluminium Substances 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 2
- 239000003990 capacitor Substances 0.000 abstract 2
- 230000001066 destructive effect Effects 0.000 abstract 2
- 230000008020 evaporation Effects 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 238000012544 monitoring process Methods 0.000 abstract 2
- 230000003287 optical effect Effects 0.000 abstract 2
- 239000002245 particle Substances 0.000 abstract 2
- 230000001681 protective effect Effects 0.000 abstract 2
- 238000010998 test method Methods 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K15/00—Electron-beam welding or cutting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
- H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
- H01C17/2404—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by charged particle impact, e.g. by electron or ion beam milling, sputtering, plasma etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3005—Observing the objects or the point of impact on the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
<PICT:1011173/C4-C5/1> <PICT:1011173/C4-C5/2> In a method of testing a thin film article, a light-emissive substrate carrying said article is bombarded with a non-destructive beam of charged particles to cause the substrate to emit light, and the thus illuminated article is examined for variations in opacity indicative of flaws therein. As shown, electrons from cathode 16, Fig. 1, are accelerated by anode 18 and focused into a beam by magnetic lenses 24, 26, 29 and diaphragms 28, 30, the beam current being controlled by grid cup 20. An optical viewing system includes light 38, mirrors 40, 42 and lens 50, the viewer being protected by a leaded glass window 52. Two substrates to be coated are secured by supports 68, 70 to a part-cylindrical member 60 which is rotatable by geas 62, 63. Initially the substrates are positioned as shown in Fig. 2, and a crucible 76, movable along track 74, is aligned with the electron beam, material therein being evaporated and condensing as an even film on the substrates. Photo-electric devices monitoring light through a transparent surface which is also exposed to the vapour may be used to automatically cut off the beam when the desired coating thickness is reached. The crucible and substrates are then moved to the position shown in Fig. 1, and the beam focus is adjusted for scribing, by local evaporation, discrete lines or patterns in the substrate coating to form thin film resistors, inductors or capacitors, the beam being moved for this purpose by deflecting coils 34. The beam may also be used to weld leads to contact pads provided on the thin film device. Finally, the coated substrate is irradiated with a moving reduced-intensity, defocused electron beam which causes suitable substrates, e.g. of aluminium, to fluoresce, and thereby reveals flaws or discontinuities in the coating film and scribed pattern as variations in the opacity of the film even when it is covered by protective SiO. This irradiation also yields information as to the surface condition of the substrate, as the colour of the fluorescence varies with the electron bombardment to which the alumina has been previously subjected.ALSO:<PICT:1011173/C6-C7/1> <PICT:1011173/C6-C7/2> In a method of testing a thin film article, a light-emissive substrate carrying said article is bombarded with a non-destructive beam of charged particles to cause the substrate to emit light, and the thus illuminated article is examined for variations in opacity indicative of flaws therein. As shown, electrons from cathode 16, Fig. 1, are accelerated by anode 18 and focused into a beam by magnetic lenses 24, 26, 29 and diaphragms 28, 30, the beam current being controlled by grid cup 20. An optical viewing system includes light 38, mirrors 40, 42 and lens 50, the viewer being protected by a leaded glass window 52. Two substrates to be coated are secured by supports 68, 70 to a part-cylindrical member 60 which is rotatable by gears 62, 63. Initially the substrates are positioned as shown in Fig. 2, and a crucible 76, movable along track 74, is aligned with the electron beam, material therein being evaporated and condensing as an even film on the substrates. Photoelectric devices monitoring light through a transparent surface which is also exposed to the vapour may be used to automatically cut off the beam when the desired coating thickness is reached. The crucible and substrates are then moved to the position shown in Fig. 1, and the beam focus is adjusted for scribing, by local evaporation, discrete lines or patterns in the substrate coating to form thin film resistors, inductors or capacitors, the beam being moved for this purpose by deflecting coils 34. The beam may also be used to weld leads to contact pads provided on the thin film device. Finally, the coated substrate is irradiated with a moving reduced-intensity, defocused electron beam which causes suitable substrates, e.g. of aluminium, to fluoresce, and thereby reveals flaws or discontinuities in the coating film and scribed pattern as variations in the opacity of the film even when it is covered by protective SiO. This irradiation also yields information as to the surface condition of the substrate, as the colour of the fluorescence varies with the electron bombardment to which the alumina has been previously subjected.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US220987A US3162767A (en) | 1962-09-04 | 1962-09-04 | Method for nondestructive testing by using a defocussed electron beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1011173A true GB1011173A (en) | 1965-11-24 |
Family
ID=22825863
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB34741/63D Expired GB1011173A (en) | 1962-09-04 | 1963-09-03 | Improvements in and relating to the making and testing of thin film articles |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3162767A (en) |
| GB (1) | GB1011173A (en) |
| NL (1) | NL297262A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2499245A1 (en) * | 1981-02-04 | 1982-08-06 | Seiko Instr & Electronics | X-RAY FLUORESCENCE DEVICE |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3330696A (en) * | 1967-07-11 | Method of fabricating thin film capacitors | ||
| US3251536A (en) * | 1963-10-08 | 1966-05-17 | Cons Vacuum Corp | Getter-ion pumps |
| US3404255A (en) * | 1965-06-23 | 1968-10-01 | Bendix Corp | Source of vaporizable material for bombardment thereof by an electron bombarding means |
| US3447366A (en) * | 1965-06-22 | 1969-06-03 | Humberto Fernandez Moran Villa | Process of determining dimensions and properties of cutting edges of molecular dimensions |
| US3420978A (en) * | 1965-06-30 | 1969-01-07 | Nasa | Pretreatment method for antiwettable materials |
| US3293587A (en) * | 1965-10-20 | 1966-12-20 | Sprague Electric Co | Electrical resistor and the like |
| CH427744A (en) * | 1965-11-26 | 1967-01-15 | Balzers Patent Beteilig Ag | Process for the thermal evaporation of mixtures of substances in a vacuum |
| DE1614635A1 (en) * | 1967-10-23 | 1970-03-26 | Siemens Ag | Process for the production of photoresist masks for semiconductor purposes |
| JPS5423473A (en) * | 1977-07-25 | 1979-02-22 | Cho Lsi Gijutsu Kenkyu Kumiai | Photomask and method of inspecting mask pattern using same |
| JPS59168652A (en) * | 1983-03-16 | 1984-09-22 | Hitachi Ltd | Method and apparatus for correcting element |
| JP5556825B2 (en) * | 2012-01-24 | 2014-07-23 | 株式会社安川電機 | Production system and article manufacturing method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1640567A (en) * | 1925-07-20 | 1927-08-30 | Univ Michigan | Machine for detecting flaws |
| US2259400A (en) * | 1938-08-17 | 1941-10-14 | Robert C Switzer | Flaw detection |
| CH311812A (en) * | 1951-11-05 | 1955-12-15 | Zeiss Carl Fa | Evaporation device. |
| US3049618A (en) * | 1959-05-13 | 1962-08-14 | Commissariat Energie Atomique | Methods and devices for performing spectrum analysis, in particular in the far ultraviolet region |
-
0
- NL NL297262D patent/NL297262A/xx unknown
-
1962
- 1962-09-04 US US220987A patent/US3162767A/en not_active Expired - Lifetime
-
1963
- 1963-09-03 GB GB34741/63D patent/GB1011173A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2499245A1 (en) * | 1981-02-04 | 1982-08-06 | Seiko Instr & Electronics | X-RAY FLUORESCENCE DEVICE |
Also Published As
| Publication number | Publication date |
|---|---|
| US3162767A (en) | 1964-12-22 |
| NL297262A (en) |
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