JPS58115625A - 磁気ヘツドの製造方法 - Google Patents
磁気ヘツドの製造方法Info
- Publication number
- JPS58115625A JPS58115625A JP21254081A JP21254081A JPS58115625A JP S58115625 A JPS58115625 A JP S58115625A JP 21254081 A JP21254081 A JP 21254081A JP 21254081 A JP21254081 A JP 21254081A JP S58115625 A JPS58115625 A JP S58115625A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- pole
- cut
- manufacturing
- main
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 230000035699 permeability Effects 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 7
- 239000000696 magnetic material Substances 0.000 claims description 4
- 239000003292 glue Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 6
- 238000001259 photo etching Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21254081A JPS58115625A (ja) | 1981-12-28 | 1981-12-28 | 磁気ヘツドの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21254081A JPS58115625A (ja) | 1981-12-28 | 1981-12-28 | 磁気ヘツドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58115625A true JPS58115625A (ja) | 1983-07-09 |
| JPH0344365B2 JPH0344365B2 (enExample) | 1991-07-05 |
Family
ID=16624361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21254081A Granted JPS58115625A (ja) | 1981-12-28 | 1981-12-28 | 磁気ヘツドの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58115625A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6916669B2 (en) * | 2000-11-15 | 2005-07-12 | Freescale Semiconductor, Inc. | Self-aligned magnetic clad write line and its method of formation |
-
1981
- 1981-12-28 JP JP21254081A patent/JPS58115625A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6916669B2 (en) * | 2000-11-15 | 2005-07-12 | Freescale Semiconductor, Inc. | Self-aligned magnetic clad write line and its method of formation |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0344365B2 (enExample) | 1991-07-05 |
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