JPS58108737A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS58108737A
JPS58108737A JP57200959A JP20095982A JPS58108737A JP S58108737 A JPS58108737 A JP S58108737A JP 57200959 A JP57200959 A JP 57200959A JP 20095982 A JP20095982 A JP 20095982A JP S58108737 A JPS58108737 A JP S58108737A
Authority
JP
Japan
Prior art keywords
oxide film
silicon
film
junction
epitaxial layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57200959A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6229889B2 (en:Method
Inventor
Kunio Aomura
青村　国男
Fujiki Tokuyoshi
徳吉　藤樹
Masahiko Nakamae
正彦 中前
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57200959A priority Critical patent/JPS58108737A/ja
Publication of JPS58108737A publication Critical patent/JPS58108737A/ja
Publication of JPS6229889B2 publication Critical patent/JPS6229889B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/0121—
    • H10W10/13—

Landscapes

  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
JP57200959A 1982-11-15 1982-11-15 半導体装置の製造方法 Granted JPS58108737A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57200959A JPS58108737A (ja) 1982-11-15 1982-11-15 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57200959A JPS58108737A (ja) 1982-11-15 1982-11-15 半導体装置の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP51114052A Division JPS6035818B2 (ja) 1976-09-22 1976-09-22 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS58108737A true JPS58108737A (ja) 1983-06-28
JPS6229889B2 JPS6229889B2 (en:Method) 1987-06-29

Family

ID=16433150

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57200959A Granted JPS58108737A (ja) 1982-11-15 1982-11-15 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS58108737A (en:Method)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50154077A (en:Method) * 1974-05-22 1975-12-11
JPS5140773A (en) * 1974-07-25 1976-04-05 Siemens Ag Handotaidebaisuno seizohoho

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50154077A (en:Method) * 1974-05-22 1975-12-11
JPS5140773A (en) * 1974-07-25 1976-04-05 Siemens Ag Handotaidebaisuno seizohoho

Also Published As

Publication number Publication date
JPS6229889B2 (en:Method) 1987-06-29

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