JPS5794574A - Etching vessel - Google Patents
Etching vesselInfo
- Publication number
- JPS5794574A JPS5794574A JP17011480A JP17011480A JPS5794574A JP S5794574 A JPS5794574 A JP S5794574A JP 17011480 A JP17011480 A JP 17011480A JP 17011480 A JP17011480 A JP 17011480A JP S5794574 A JPS5794574 A JP S5794574A
- Authority
- JP
- Japan
- Prior art keywords
- vessel
- soln
- etching
- mixed
- solns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Abstract
PURPOSE: To improve and stabilize the production of a silicon nitride film etching process by providing a heat exchange mechanism of an etching soln. withdrawn to the outside of an etching vessel and the mixed solns. prepd. by mixing this with pure water and returned to the vessel to said etching vessel.
CONSTITUTION: The phosphoric acid soln. 10 in a bath vessel 6 made of quartz glass with a quartz glass cover 7 cooled by the cooling water of a pipe 8 is in a high temp. state by means of an immersion heater 9. When a valve 11 is opened, part of the soln. 10 having an increased specific gravity is mixed with the pure water flowing in through a similarly opened valve 12, in a mixing mechanism 14. The soln. 10 withdarwn at this time causes heat exchanging with the mixed solns. in a heat exchange mechanism 13, and is thereby lowered of temp.; hence, there is no danger. The mixed solns. are conversely heated by the soln. 10 and are returned to the vessel 6. It is possible to maintain the soln. 10 in the vessel 16 in a constant state at all times by cooperating the valves 11, 12 with a hydrometer.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17011480A JPS5794574A (en) | 1980-12-02 | 1980-12-02 | Etching vessel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17011480A JPS5794574A (en) | 1980-12-02 | 1980-12-02 | Etching vessel |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5794574A true JPS5794574A (en) | 1982-06-12 |
Family
ID=15898892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17011480A Pending JPS5794574A (en) | 1980-12-02 | 1980-12-02 | Etching vessel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5794574A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63147537A (en) * | 1986-12-11 | 1988-06-20 | Shionogi & Co Ltd | Method and apparatus for cooling |
US5188701A (en) * | 1990-09-05 | 1993-02-23 | Fujitsu Limited | Method of fabricating semiconductor device |
US6001215A (en) * | 1996-04-03 | 1999-12-14 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor nitride film etching system |
-
1980
- 1980-12-02 JP JP17011480A patent/JPS5794574A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63147537A (en) * | 1986-12-11 | 1988-06-20 | Shionogi & Co Ltd | Method and apparatus for cooling |
US5188701A (en) * | 1990-09-05 | 1993-02-23 | Fujitsu Limited | Method of fabricating semiconductor device |
US6001215A (en) * | 1996-04-03 | 1999-12-14 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor nitride film etching system |
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