JPS5787830A - Ion etching device - Google Patents
Ion etching deviceInfo
- Publication number
- JPS5787830A JPS5787830A JP16258280A JP16258280A JPS5787830A JP S5787830 A JPS5787830 A JP S5787830A JP 16258280 A JP16258280 A JP 16258280A JP 16258280 A JP16258280 A JP 16258280A JP S5787830 A JPS5787830 A JP S5787830A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- etching
- ion
- radiation
- rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To perform etching of desired depth accurately with good reproducibility by disposing a radiation generating source in the direction of one side of a sample of an ion etching device and a radiation detector on the other side.
CONSTITUTION: In a device of etching a sample 10 by irradiating ion beams of an inert gas such as argon from an ion source 6 in a vacuum vessel 1, a radiation generating source 16 radiating X-rays 17 is provided on one side of the sample 10 and an X-ray detector 20 detecting the X-rays 21 transmitting through the sample 10 is provided on the other side. When the radiation dose thereof attains a preset dose, a relay circuit 24 operates to stop the ion beam irradiation to the sample 10 surface. In this way, the etching of always desired depth is accomplished, although the ion beams are somewhat unstable.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16258280A JPS5787830A (en) | 1980-11-20 | 1980-11-20 | Ion etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16258280A JPS5787830A (en) | 1980-11-20 | 1980-11-20 | Ion etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5787830A true JPS5787830A (en) | 1982-06-01 |
Family
ID=15757324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16258280A Pending JPS5787830A (en) | 1980-11-20 | 1980-11-20 | Ion etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5787830A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008003374A1 (en) * | 2006-07-04 | 2008-01-10 | Eads Deutschland Gmbh | Method and device for machining workpieces |
-
1980
- 1980-11-20 JP JP16258280A patent/JPS5787830A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008003374A1 (en) * | 2006-07-04 | 2008-01-10 | Eads Deutschland Gmbh | Method and device for machining workpieces |
DE102006030874B4 (en) * | 2006-07-04 | 2013-03-14 | Pro-Beam Ag & Co. Kgaa | Method and device for machining workpieces |
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