JPS5240190A - X-ray analysis device - Google Patents

X-ray analysis device

Info

Publication number
JPS5240190A
JPS5240190A JP50114696A JP11469675A JPS5240190A JP S5240190 A JPS5240190 A JP S5240190A JP 50114696 A JP50114696 A JP 50114696A JP 11469675 A JP11469675 A JP 11469675A JP S5240190 A JPS5240190 A JP S5240190A
Authority
JP
Japan
Prior art keywords
analysis device
ray analysis
ratio
thin films
intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50114696A
Other languages
Japanese (ja)
Inventor
Ryoji Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50114696A priority Critical patent/JPS5240190A/en
Publication of JPS5240190A publication Critical patent/JPS5240190A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To slidably provide various thin films and letting the X-rays generated by radiation of electron beams to sample transmit through these thin films thereby improving the ratio between signal intensity and backbround intensity (L-B ratio).
JP50114696A 1975-09-25 1975-09-25 X-ray analysis device Pending JPS5240190A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50114696A JPS5240190A (en) 1975-09-25 1975-09-25 X-ray analysis device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50114696A JPS5240190A (en) 1975-09-25 1975-09-25 X-ray analysis device

Publications (1)

Publication Number Publication Date
JPS5240190A true JPS5240190A (en) 1977-03-28

Family

ID=14644330

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50114696A Pending JPS5240190A (en) 1975-09-25 1975-09-25 X-ray analysis device

Country Status (1)

Country Link
JP (1) JPS5240190A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013152798A (en) * 2012-01-24 2013-08-08 Jeol Ltd Electron beam apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013152798A (en) * 2012-01-24 2013-08-08 Jeol Ltd Electron beam apparatus

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