JPS5783042A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5783042A JPS5783042A JP55159003A JP15900380A JPS5783042A JP S5783042 A JPS5783042 A JP S5783042A JP 55159003 A JP55159003 A JP 55159003A JP 15900380 A JP15900380 A JP 15900380A JP S5783042 A JPS5783042 A JP S5783042A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- substrate
- oxide film
- island
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
- H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
- H10W10/019—Manufacture or treatment of isolation regions comprising dielectric materials using epitaxial passivated integrated circuit [EPIC] processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/10—Isolation regions comprising dielectric materials
Landscapes
- Element Separation (AREA)
- Weting (AREA)
- Local Oxidation Of Silicon (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55159003A JPS5783042A (en) | 1980-11-12 | 1980-11-12 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55159003A JPS5783042A (en) | 1980-11-12 | 1980-11-12 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5783042A true JPS5783042A (en) | 1982-05-24 |
| JPS6221269B2 JPS6221269B2 (enExample) | 1987-05-12 |
Family
ID=15684101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55159003A Granted JPS5783042A (en) | 1980-11-12 | 1980-11-12 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5783042A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7061375B2 (en) | 2003-03-12 | 2006-06-13 | Honda Motor Co., Ltd. | System for warning a failure to wear a seat belt |
| JP2007112158A (ja) * | 2005-10-17 | 2007-05-10 | Toyota Motor Corp | 車両の制御装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5247686A (en) * | 1975-10-15 | 1977-04-15 | Toshiba Corp | Semiconductor device and process for production of same |
| JPS5563840A (en) * | 1978-11-08 | 1980-05-14 | Hitachi Ltd | Semiconductor integrated device |
-
1980
- 1980-11-12 JP JP55159003A patent/JPS5783042A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5247686A (en) * | 1975-10-15 | 1977-04-15 | Toshiba Corp | Semiconductor device and process for production of same |
| JPS5563840A (en) * | 1978-11-08 | 1980-05-14 | Hitachi Ltd | Semiconductor integrated device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7061375B2 (en) | 2003-03-12 | 2006-06-13 | Honda Motor Co., Ltd. | System for warning a failure to wear a seat belt |
| JP2007112158A (ja) * | 2005-10-17 | 2007-05-10 | Toyota Motor Corp | 車両の制御装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6221269B2 (enExample) | 1987-05-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS57176772A (en) | Semiconductor device and manufacture thereof | |
| JPS5783042A (en) | Manufacture of semiconductor device | |
| JPS5678155A (en) | Semiconductor device and manufacture thereof | |
| JPS56146247A (en) | Manufacture of semiconductor device | |
| JPS5795633A (en) | Etching method | |
| JPS568842A (en) | Semiconductor integrated circuit device | |
| JPS6457641A (en) | Manufacture of semiconductor device | |
| JPS56157044A (en) | Insulating isolation of semiconductor element | |
| JPS6428962A (en) | Semiconductor device and manufacture thereof | |
| JPS5534488A (en) | Semiconductor device and its manufacturing method | |
| JPS6359531B2 (enExample) | ||
| JPS57211747A (en) | Manufacture of semiconductor device | |
| JPS57128942A (en) | Manufacture of insulation isolating substrate | |
| JPS54117690A (en) | Production of semiconductor device | |
| JPS5693370A (en) | Manufacture of mos-type semiconductor device | |
| JPS56167346A (en) | Manufacture of semiconductor device | |
| JPS55162270A (en) | Semiconductor device | |
| JPS6359532B2 (enExample) | ||
| JPS57173956A (en) | Manufacture of semiconductor device | |
| JPH0323648A (ja) | 誘電体分離基板の製造方法 | |
| JPS571243A (en) | Manufacture of semiconductor device | |
| JPS57199231A (en) | Manufacture of semiconductor device | |
| JPS5596652A (en) | Method of fabricating semiconductor device | |
| JPS57196544A (en) | Manufacture of integrated circuit isolated by oxide film | |
| JPS55153370A (en) | Manufacturing method of semiconductor device |