JPS5782954A - X-ray window - Google Patents
X-ray windowInfo
- Publication number
- JPS5782954A JPS5782954A JP55158728A JP15872880A JPS5782954A JP S5782954 A JPS5782954 A JP S5782954A JP 55158728 A JP55158728 A JP 55158728A JP 15872880 A JP15872880 A JP 15872880A JP S5782954 A JPS5782954 A JP S5782954A
- Authority
- JP
- Japan
- Prior art keywords
- ray window
- ray
- berylium
- foil
- window
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001296 polysiloxane Polymers 0.000 abstract 4
- 239000011888 foil Substances 0.000 abstract 3
- 150000004767 nitrides Chemical class 0.000 abstract 3
- 238000002441 X-ray diffraction Methods 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 abstract 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 230000035699 permeability Effects 0.000 abstract 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/16—Vessels; Containers; Shields associated therewith
- H01J35/18—Windows
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/18—Windows, e.g. for X-ray transmission
- H01J2235/183—Multi-layer structures
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55158728A JPS5782954A (en) | 1980-11-11 | 1980-11-11 | X-ray window |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55158728A JPS5782954A (en) | 1980-11-11 | 1980-11-11 | X-ray window |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5782954A true JPS5782954A (en) | 1982-05-24 |
| JPH0335774B2 JPH0335774B2 (enrdf_load_stackoverflow) | 1991-05-29 |
Family
ID=15678030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55158728A Granted JPS5782954A (en) | 1980-11-11 | 1980-11-11 | X-ray window |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5782954A (enrdf_load_stackoverflow) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61163547A (ja) * | 1985-01-14 | 1986-07-24 | Nippon Telegr & Teleph Corp <Ntt> | X線取り出し窓 |
| JPS61162000U (enrdf_load_stackoverflow) * | 1985-03-28 | 1986-10-07 | ||
| JPS6391944A (ja) * | 1986-10-03 | 1988-04-22 | Nec Corp | X線用ベリリウム窓 |
| JPH0375600A (ja) * | 1989-08-18 | 1991-03-29 | Nikon Corp | 多層膜反射鏡 |
| EP0757362A1 (de) * | 1995-08-02 | 1997-02-05 | INSTITUT FÜR MIKROTECHNIK MAINZ GmbH | Röntgenstrahlendurchlässiges Schichtmaterial, Verfahren zu seiner Herstellung sowie deren Verwendung |
| EP1547116A4 (en) * | 2002-09-13 | 2006-05-24 | Moxtek Inc | RADIATION WINDOW AND METHOD OF MANUFACTURING |
| JP2008124495A (ja) * | 2003-07-25 | 2008-05-29 | Asml Netherlands Bv | フィルタ・ウィンドウ、リソグラフ投影装置、フィルタ・ウィンドウの製造方法、デバイスの製造方法、及びそれらによって製造されたデバイス |
| US7382862B2 (en) | 2005-09-30 | 2008-06-03 | Moxtek, Inc. | X-ray tube cathode with reduced unintended electrical field emission |
| US7428298B2 (en) | 2005-03-31 | 2008-09-23 | Moxtek, Inc. | Magnetic head for X-ray source |
| US8995621B2 (en) | 2010-09-24 | 2015-03-31 | Moxtek, Inc. | Compact X-ray source |
| US9076628B2 (en) | 2011-05-16 | 2015-07-07 | Brigham Young University | Variable radius taper x-ray window support structure |
| WO2019073262A1 (en) * | 2017-10-13 | 2019-04-18 | Oxford Instruments X-ray Technology Inc. | WINDOW ELEMENT FOR X-RAY DEVICE |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53133386A (en) * | 1977-04-25 | 1978-11-21 | Philips Nv | Xxray tube |
-
1980
- 1980-11-11 JP JP55158728A patent/JPS5782954A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53133386A (en) * | 1977-04-25 | 1978-11-21 | Philips Nv | Xxray tube |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61163547A (ja) * | 1985-01-14 | 1986-07-24 | Nippon Telegr & Teleph Corp <Ntt> | X線取り出し窓 |
| JPS61162000U (enrdf_load_stackoverflow) * | 1985-03-28 | 1986-10-07 | ||
| JPS6391944A (ja) * | 1986-10-03 | 1988-04-22 | Nec Corp | X線用ベリリウム窓 |
| JPH0375600A (ja) * | 1989-08-18 | 1991-03-29 | Nikon Corp | 多層膜反射鏡 |
| DE19528329B4 (de) * | 1995-08-02 | 2009-12-10 | INSTITUT FüR MIKROTECHNIK MAINZ GMBH | Maskenblank und Verfahren zu seiner Herstellung |
| EP0757362A1 (de) * | 1995-08-02 | 1997-02-05 | INSTITUT FÜR MIKROTECHNIK MAINZ GmbH | Röntgenstrahlendurchlässiges Schichtmaterial, Verfahren zu seiner Herstellung sowie deren Verwendung |
| US5740228A (en) * | 1995-08-02 | 1998-04-14 | Institut Fur Mikrotechnik Mainz Gmbh | X-ray radiolucent material, method for its manufacture, and its use |
| EP1547116A4 (en) * | 2002-09-13 | 2006-05-24 | Moxtek Inc | RADIATION WINDOW AND METHOD OF MANUFACTURING |
| US7233647B2 (en) | 2002-09-13 | 2007-06-19 | Moxtek, Inc. | Radiation window and method of manufacture |
| JP2008124495A (ja) * | 2003-07-25 | 2008-05-29 | Asml Netherlands Bv | フィルタ・ウィンドウ、リソグラフ投影装置、フィルタ・ウィンドウの製造方法、デバイスの製造方法、及びそれらによって製造されたデバイス |
| US7428298B2 (en) | 2005-03-31 | 2008-09-23 | Moxtek, Inc. | Magnetic head for X-ray source |
| US7382862B2 (en) | 2005-09-30 | 2008-06-03 | Moxtek, Inc. | X-ray tube cathode with reduced unintended electrical field emission |
| US8995621B2 (en) | 2010-09-24 | 2015-03-31 | Moxtek, Inc. | Compact X-ray source |
| US9076628B2 (en) | 2011-05-16 | 2015-07-07 | Brigham Young University | Variable radius taper x-ray window support structure |
| WO2019073262A1 (en) * | 2017-10-13 | 2019-04-18 | Oxford Instruments X-ray Technology Inc. | WINDOW ELEMENT FOR X-RAY DEVICE |
| US11094494B2 (en) | 2017-10-13 | 2021-08-17 | Oxford Instruments X-ray Technology Inc. | Window member for an x-ray device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0335774B2 (enrdf_load_stackoverflow) | 1991-05-29 |
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