JPH0335774B2 - - Google Patents

Info

Publication number
JPH0335774B2
JPH0335774B2 JP55158728A JP15872880A JPH0335774B2 JP H0335774 B2 JPH0335774 B2 JP H0335774B2 JP 55158728 A JP55158728 A JP 55158728A JP 15872880 A JP15872880 A JP 15872880A JP H0335774 B2 JPH0335774 B2 JP H0335774B2
Authority
JP
Japan
Prior art keywords
beryllium
ray
window
silicon nitride
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55158728A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5782954A (en
Inventor
Katsumi Suzuki
Yasunao Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP55158728A priority Critical patent/JPS5782954A/ja
Publication of JPS5782954A publication Critical patent/JPS5782954A/ja
Publication of JPH0335774B2 publication Critical patent/JPH0335774B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/18—Windows, e.g. for X-ray transmission
    • H01J2235/183—Multi-layer structures

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55158728A 1980-11-11 1980-11-11 X-ray window Granted JPS5782954A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55158728A JPS5782954A (en) 1980-11-11 1980-11-11 X-ray window

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55158728A JPS5782954A (en) 1980-11-11 1980-11-11 X-ray window

Publications (2)

Publication Number Publication Date
JPS5782954A JPS5782954A (en) 1982-05-24
JPH0335774B2 true JPH0335774B2 (enrdf_load_stackoverflow) 1991-05-29

Family

ID=15678030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55158728A Granted JPS5782954A (en) 1980-11-11 1980-11-11 X-ray window

Country Status (1)

Country Link
JP (1) JPS5782954A (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61163547A (ja) * 1985-01-14 1986-07-24 Nippon Telegr & Teleph Corp <Ntt> Ｘ線取り出し窓
JPH0350606Y2 (enrdf_load_stackoverflow) * 1985-03-28 1991-10-29
JPS6391944A (ja) * 1986-10-03 1988-04-22 Nec Corp Ｘ線用ベリリウム窓
JP2814595B2 (ja) * 1989-08-18 1998-10-22 株式会社ニコン 多層膜反射鏡
DE19528329B4 (de) * 1995-08-02 2009-12-10 INSTITUT FüR MIKROTECHNIK MAINZ GMBH Maskenblank und Verfahren zu seiner Herstellung
US7035379B2 (en) 2002-09-13 2006-04-25 Moxtek, Inc. Radiation window and method of manufacture
US7456932B2 (en) * 2003-07-25 2008-11-25 Asml Netherlands B.V. Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
US7428298B2 (en) 2005-03-31 2008-09-23 Moxtek, Inc. Magnetic head for X-ray source
US7382862B2 (en) 2005-09-30 2008-06-03 Moxtek, Inc. X-ray tube cathode with reduced unintended electrical field emission
US8995621B2 (en) 2010-09-24 2015-03-31 Moxtek, Inc. Compact X-ray source
US9076628B2 (en) 2011-05-16 2015-07-07 Brigham Young University Variable radius taper x-ray window support structure
US20180061608A1 (en) 2017-09-28 2018-03-01 Oxford Instruments X-ray Technology Inc. Window member for an x-ray device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7704473A (nl) * 1977-04-25 1978-10-27 Philips Nv Roentgenbuis.

Also Published As

Publication number Publication date
JPS5782954A (en) 1982-05-24

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