JPH0130293B2 - - Google Patents

Info

Publication number
JPH0130293B2
JPH0130293B2 JP60059655A JP5965585A JPH0130293B2 JP H0130293 B2 JPH0130293 B2 JP H0130293B2 JP 60059655 A JP60059655 A JP 60059655A JP 5965585 A JP5965585 A JP 5965585A JP H0130293 B2 JPH0130293 B2 JP H0130293B2
Authority
JP
Japan
Prior art keywords
target
rays
ray
ray tube
soft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60059655A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61220325A (ja
Inventor
Tomoya Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Corp
Original Assignee
Rigaku Industrial Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rigaku Industrial Corp filed Critical Rigaku Industrial Corp
Priority to JP60059655A priority Critical patent/JPS61220325A/ja
Publication of JPS61220325A publication Critical patent/JPS61220325A/ja
Publication of JPH0130293B2 publication Critical patent/JPH0130293B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60059655A 1985-03-26 1985-03-26 Ｘ線リゾグラフイの露光装置 Granted JPS61220325A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60059655A JPS61220325A (ja) 1985-03-26 1985-03-26 Ｘ線リゾグラフイの露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60059655A JPS61220325A (ja) 1985-03-26 1985-03-26 Ｘ線リゾグラフイの露光装置

Publications (2)

Publication Number Publication Date
JPS61220325A JPS61220325A (ja) 1986-09-30
JPH0130293B2 true JPH0130293B2 (enrdf_load_stackoverflow) 1989-06-19

Family

ID=13119434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60059655A Granted JPS61220325A (ja) 1985-03-26 1985-03-26 Ｘ線リゾグラフイの露光装置

Country Status (1)

Country Link
JP (1) JPS61220325A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS61220325A (ja) 1986-09-30

Similar Documents

Publication Publication Date Title
US5627871A (en) X-ray tube and microelectronics alignment process
US3743842A (en) Soft x-ray lithographic apparatus and process
US4748646A (en) X-ray lithography system
JPH0335774B2 (enrdf_load_stackoverflow)
JPH0130293B2 (enrdf_load_stackoverflow)
JP3432545B2 (ja) 高速原子線を用いる加工装置
EP0093970B1 (en) Soft x-ray generator
US3821579A (en) X ray source
US6885015B2 (en) Thermionic-cathode for pre-ionization of an extreme ultraviolet (EUV) source supply
JPH05312998A (ja) イオン発生装置
JPS6037616B2 (ja) Ｘ線リゾグラフイ装置
JPH01265443A (ja) Ｘ線露光装置
JPH0587013B2 (enrdf_load_stackoverflow)
JPH11126745A (ja) Ｘ線縮小露光リソグラフ用光源装置
JPS6175521A (ja) 露光装置
JP3176216B2 (ja) Ｘ線取り出し窓
JP3278706B2 (ja) シンクロトロン放射光利用装置
RU1805511C (ru) Импульсна рентгеновска трубка
Toubhans et al. X-ray lithography with laser-plasma sources
CA1131806A (en) X-ray lithography apparatus
JPH0125221B2 (enrdf_load_stackoverflow)
SU449395A1 (ru) Источник рентгеновского излучени
JPS6292436A (ja) 光電子像転写方法
JPS60225426A (ja) プラズマｘ線露光装置
Spiller et al. X-Ray Lithography with Synchrotron Radiation