JPH0125221B2 - - Google Patents
Info
- Publication number
- JPH0125221B2 JPH0125221B2 JP53150893A JP15089378A JPH0125221B2 JP H0125221 B2 JPH0125221 B2 JP H0125221B2 JP 53150893 A JP53150893 A JP 53150893A JP 15089378 A JP15089378 A JP 15089378A JP H0125221 B2 JPH0125221 B2 JP H0125221B2
- Authority
- JP
- Japan
- Prior art keywords
- soft
- metal foil
- sample
- target
- foil target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000011888 foil Substances 0.000 claims description 21
- 238000010894 electron beam technology Methods 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 19
- 230000007246 mechanism Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000001015 X-ray lithography Methods 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15089378A JPS5577143A (en) | 1978-12-05 | 1978-12-05 | Soft x-ray exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15089378A JPS5577143A (en) | 1978-12-05 | 1978-12-05 | Soft x-ray exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5577143A JPS5577143A (en) | 1980-06-10 |
| JPH0125221B2 true JPH0125221B2 (enrdf_load_stackoverflow) | 1989-05-16 |
Family
ID=15506673
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15089378A Granted JPS5577143A (en) | 1978-12-05 | 1978-12-05 | Soft x-ray exposure apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5577143A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003124099A (ja) * | 2001-10-16 | 2003-04-25 | Univ Waseda | パターン描画方法、マスクおよびマスク製造方法 |
-
1978
- 1978-12-05 JP JP15089378A patent/JPS5577143A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5577143A (en) | 1980-06-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3743842A (en) | Soft x-ray lithographic apparatus and process | |
| JP5154232B2 (ja) | 荷電粒子暴露装置 | |
| US4028547A (en) | X-ray photolithography | |
| JPH0834169B2 (ja) | リソグラフィプロセスを含むデバイス製作法 | |
| KR20080086486A (ko) | 방사선 시스템 및 리소그래피 장치 | |
| JP2851996B2 (ja) | デバイス製造方法 | |
| US8547525B2 (en) | EUV radiation generation apparatus | |
| JP4875753B2 (ja) | ＥＵＶ源におけるデブリ抑制用影つけ電極（ｓｈａｄｏｗｉｎｇｅｌｅｃｔｒｏｄｅ） | |
| JPH0324769B2 (enrdf_load_stackoverflow) | ||
| US10871647B2 (en) | Apparatus and method for prevention of contamination on collector of extreme ultraviolet light source | |
| US4608332A (en) | Electron lithography mask manufacture | |
| Kubiak et al. | Diffraction‐limited soft x‐ray projection lithography with a laser plasma source | |
| KR101331069B1 (ko) | 리소그래피 장치 및 디바이스 제조 방법 | |
| EP0182665B1 (en) | Method of projecting a photoelectron image | |
| JPH0125221B2 (enrdf_load_stackoverflow) | ||
| US20100282986A1 (en) | Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device | |
| JP2002533912A (ja) | Ｅｕｖ放射による基板へのマスクパターン撮像方法、その方法を実行する装置およびマスク | |
| JP4319642B2 (ja) | デバイス製造方法 | |
| JPH07254539A (ja) | 電子ビーム露光装置 | |
| Smith et al. | X-ray lithography | |
| JPS5915380B2 (ja) | 微細パタ−ンの転写装置 | |
| Bollanti et al. | Progress report on a 14.4-nm micro-exposure tool based on a laser-produced-plasma: Debris mitigation system results and other issues | |
| JPH0426207B2 (enrdf_load_stackoverflow) | ||
| JPH05136026A (ja) | パターン形成方法 | |
| JPH01289246A (ja) | 光電子転写装置 |