JPS5772377A - Wiring method for self-aligning gate - Google Patents
Wiring method for self-aligning gateInfo
- Publication number
- JPS5772377A JPS5772377A JP14862880A JP14862880A JPS5772377A JP S5772377 A JPS5772377 A JP S5772377A JP 14862880 A JP14862880 A JP 14862880A JP 14862880 A JP14862880 A JP 14862880A JP S5772377 A JPS5772377 A JP S5772377A
- Authority
- JP
- Japan
- Prior art keywords
- gate
- source regions
- section
- self
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
- 238000007493 shaping process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/0883—Combination of depletion and enhancement field effect transistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To improve the degree of integration by preventing the effect of a branched section of the self-aligning gate, which crosses on a source or a drain region of a transistor, on the characteristics of the transistor. CONSTITUTION:A high concentration impurity added DIF with the same conduction type as source regions S1, S2, which connects a section between the source regions S1, S2 divided by the branched section of the gate SG1 to a gate SG2, is formed previously through ion injection or diffusion or the like before shaping the gates SG1, SG2. Accordingly, since a depletion type MOSFETT3 is formed between the source regions S1 and S2, the section between the source regions S1 and S2 is conducted at all times, and the MOSFETT1 normally functions.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14862880A JPS5772377A (en) | 1980-10-23 | 1980-10-23 | Wiring method for self-aligning gate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14862880A JPS5772377A (en) | 1980-10-23 | 1980-10-23 | Wiring method for self-aligning gate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5772377A true JPS5772377A (en) | 1982-05-06 |
Family
ID=15457030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14862880A Pending JPS5772377A (en) | 1980-10-23 | 1980-10-23 | Wiring method for self-aligning gate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5772377A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4521294Y1 (en) * | 1965-12-03 | 1970-08-25 | ||
JPS5047576A (en) * | 1973-08-31 | 1975-04-28 |
-
1980
- 1980-10-23 JP JP14862880A patent/JPS5772377A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4521294Y1 (en) * | 1965-12-03 | 1970-08-25 | ||
JPS5047576A (en) * | 1973-08-31 | 1975-04-28 |
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