JPS5754343A - Hantenboshiryoikinokeiseihoho - Google Patents
HantenboshiryoikinokeiseihohoInfo
- Publication number
- JPS5754343A JPS5754343A JP13093280A JP13093280A JPS5754343A JP S5754343 A JPS5754343 A JP S5754343A JP 13093280 A JP13093280 A JP 13093280A JP 13093280 A JP13093280 A JP 13093280A JP S5754343 A JPS5754343 A JP S5754343A
- Authority
- JP
- Japan
- Prior art keywords
- coat
- region
- breadth
- inversion
- nitride film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
- H01L21/76213—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose
- H01L21/76216—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13093280A JPS5754343A (ja) | 1980-09-19 | 1980-09-19 | Hantenboshiryoikinokeiseihoho |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13093280A JPS5754343A (ja) | 1980-09-19 | 1980-09-19 | Hantenboshiryoikinokeiseihoho |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5754343A true JPS5754343A (ja) | 1982-03-31 |
Family
ID=15046073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13093280A Pending JPS5754343A (ja) | 1980-09-19 | 1980-09-19 | Hantenboshiryoikinokeiseihoho |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5754343A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61226942A (ja) * | 1985-04-01 | 1986-10-08 | Matsushita Electronics Corp | 半導体集積回路の素子間分離方法 |
JPH07183371A (ja) * | 1993-12-24 | 1995-07-21 | Nec Corp | 半導体装置の製造方法 |
JPH07297275A (ja) * | 1994-04-20 | 1995-11-10 | Nec Corp | 半導体装置の製造方法 |
-
1980
- 1980-09-19 JP JP13093280A patent/JPS5754343A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61226942A (ja) * | 1985-04-01 | 1986-10-08 | Matsushita Electronics Corp | 半導体集積回路の素子間分離方法 |
JPH07183371A (ja) * | 1993-12-24 | 1995-07-21 | Nec Corp | 半導体装置の製造方法 |
JPH07297275A (ja) * | 1994-04-20 | 1995-11-10 | Nec Corp | 半導体装置の製造方法 |
US5482889A (en) * | 1994-04-20 | 1996-01-09 | Nec Corporation | Method for producing of semiconductor device having of channel stopper under field insulating layer |
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