JPS5753975A - - Google Patents

Info

Publication number
JPS5753975A
JPS5753975A JP56121767A JP12176781A JPS5753975A JP S5753975 A JPS5753975 A JP S5753975A JP 56121767 A JP56121767 A JP 56121767A JP 12176781 A JP12176781 A JP 12176781A JP S5753975 A JPS5753975 A JP S5753975A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56121767A
Inventor
Uerunaa Uorufugangu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS5753975A publication Critical patent/JPS5753975A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0821—Collector regions of bipolar transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H01L29/7302—Bipolar junction transistors structurally associated with other devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/808—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a PN junction gate, e.g. PN homojunction gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
JP56121767A 1980-08-04 1981-08-03 Pending JPS5753975A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803029553 DE3029553A1 (de) 1980-08-04 1980-08-04 Transistoranordnung mit hoher kollektor-emitter-durchbruchsspannung

Publications (1)

Publication Number Publication Date
JPS5753975A true JPS5753975A (ja) 1982-03-31

Family

ID=6108876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56121767A Pending JPS5753975A (ja) 1980-08-04 1981-08-03

Country Status (4)

Country Link
US (1) US4835596A (ja)
EP (1) EP0045447B1 (ja)
JP (1) JPS5753975A (ja)
DE (2) DE3029553A1 (ja)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3215652A1 (de) * 1982-04-27 1983-10-27 Siemens AG, 1000 Berlin und 8000 München Integrierbarer bipolarer transistor
US4729008A (en) * 1982-12-08 1988-03-01 Harris Corporation High voltage IC bipolar transistors operable to BVCBO and method of fabrication
US4639761A (en) * 1983-12-16 1987-01-27 North American Philips Corporation Combined bipolar-field effect transistor resurf devices
JPS61158175A (ja) * 1984-12-28 1986-07-17 Toshiba Corp プレ−ナ型トランジスタ装置
US4886762A (en) * 1985-08-06 1989-12-12 Motorola Inc. Monolithic temperature compensated voltage-reference diode and method for its manufacture
GB2186117B (en) * 1986-01-30 1989-11-01 Sgs Microelettronica Spa Monolithically integrated semiconductor device containing bipolar junction,cmosand dmos transistors and low leakage diodes and a method for its fabrication
JPS62210667A (ja) * 1986-03-11 1987-09-16 Fujitsu Ltd 半導体記憶装置
IT1204244B (it) * 1986-03-21 1989-03-01 Sgs Microelettronica Spa Struttura npn equivalente con tensione di rottura maggiorata rispetto alla tensione di rottura intrinseca dell'npn
US4808547A (en) * 1986-07-07 1989-02-28 Harris Corporation Method of fabrication of high voltage IC bopolar transistors operable to BVCBO
NL8702671A (nl) * 1987-11-09 1989-06-01 Philips Nv Laterale hoogspanningstransistor.
JP2728671B2 (ja) * 1988-02-03 1998-03-18 株式会社東芝 バイポーラトランジスタの製造方法
US5068756A (en) * 1989-02-16 1991-11-26 Texas Instruments Incorporated Integrated circuit composed of group III-V compound field effect and bipolar semiconductors
FR2672733B1 (fr) * 1991-02-13 1997-08-22 France Telecom Perfectionnement au collecteur d'un transistor bipolaire compatible avec la technologie mos.
FR2708144A1 (fr) * 1993-07-22 1995-01-27 Philips Composants Dispositif intégré associant un transistor bipolaire à un transistor à effet de champ.
US5428233A (en) * 1994-04-04 1995-06-27 Motorola Inc. Voltage controlled resistive device
SE513512C2 (sv) * 1994-10-31 2000-09-25 Ericsson Telefon Ab L M Halvledaranordning med ett flytande kollektorområde
JP3917211B2 (ja) * 1996-04-15 2007-05-23 三菱電機株式会社 半導体装置
DE19902749C2 (de) * 1999-01-25 2002-02-07 Infineon Technologies Ag Leistungstransistoranordnung mit hoher Spannungsfestigkeit
JP3768079B2 (ja) * 2000-07-25 2006-04-19 シャープ株式会社 トランジスタ
US6710424B2 (en) 2001-09-21 2004-03-23 Airip RF chipset architecture
US11217665B2 (en) 2020-02-04 2022-01-04 Texas Instruments Incorporated Bipolar junction transistor with constricted collector region having high gain and early voltage product

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244574A (en) * 1975-10-06 1977-04-07 Nec Corp Semiconductor device
JPS5489581A (en) * 1977-12-27 1979-07-16 Sony Corp Composite transistor circuit
JPS5642368A (en) * 1979-09-12 1981-04-20 Nec Corp Semiconductor device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1073551A (en) * 1964-07-02 1967-06-28 Westinghouse Electric Corp Integrated circuit comprising a diode and method of making the same
US3404295A (en) * 1964-11-30 1968-10-01 Motorola Inc High frequency and voltage transistor with added region for punch-through protection
US3564356A (en) * 1968-10-24 1971-02-16 Tektronix Inc High voltage integrated circuit transistor
US4003072A (en) * 1972-04-20 1977-01-11 Sony Corporation Semiconductor device with high voltage breakdown resistance
JPS5367368A (en) * 1976-11-29 1978-06-15 Sony Corp Semiconductor device
DE2710878A1 (de) * 1977-03-12 1978-09-14 Itt Ind Gmbh Deutsche Verfahren zum herstellen einer an der oberflaeche eines halbleiterkoerpers aus silicium liegenden zone einer monolithisch integrierten i hoch 2 l-schaltung
US4151540A (en) * 1977-12-08 1979-04-24 Fairchild Camera And Instrument Corporation High beta, high frequency transistor structure
CA1131801A (en) * 1978-01-18 1982-09-14 Johannes A. Appels Semiconductor device
US4337474A (en) * 1978-08-31 1982-06-29 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
DE4133765C1 (ja) * 1991-10-11 1992-10-22 Siemens Ag, 8000 Muenchen, De

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244574A (en) * 1975-10-06 1977-04-07 Nec Corp Semiconductor device
JPS5489581A (en) * 1977-12-27 1979-07-16 Sony Corp Composite transistor circuit
JPS5642368A (en) * 1979-09-12 1981-04-20 Nec Corp Semiconductor device

Also Published As

Publication number Publication date
EP0045447B1 (de) 1985-11-21
DE3029553A1 (de) 1982-03-11
DE3172979D1 (en) 1986-01-02
US4835596A (en) 1989-05-30
EP0045447A1 (de) 1982-02-10

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