JPS5740844A - Thermoelectron emission type electron gun - Google Patents
Thermoelectron emission type electron gunInfo
- Publication number
- JPS5740844A JPS5740844A JP11655580A JP11655580A JPS5740844A JP S5740844 A JPS5740844 A JP S5740844A JP 11655580 A JP11655580 A JP 11655580A JP 11655580 A JP11655580 A JP 11655580A JP S5740844 A JPS5740844 A JP S5740844A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- faucet
- equi
- corner
- electron gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE:To uniformalize the emission pattern of an electron beam by working the opening section of Wehnelt electrode depending upon the faucet surface and corner which occur in a cathode consisting of single crystal substances such as LaB6 and applying an equi-electric field to the cathode. CONSTITUTION:The opening section of Wehnelt electrode 3 is worked depending upon the faucet surface and corner which occur in a cathode 1 and an equi-magnetic field is applied to the lower end of the cathode 1. A faucet occurs at the lower part of the cathode 1 by the high temperature heating in vacuum. Since the opening section 3a of the Wehnelt electrode 3 is worked depending upon this faucet surface and corner as shown in (a) to (c), almost an equi-electric field is applied to the lower part of the cathode 1 when the faucet occurs. As a result, the emission pattern of an electron beam can almost circularly be uniformalized and a thermoelectron emission type electron gun be used stably for a long time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11655580A JPS5740844A (en) | 1980-08-25 | 1980-08-25 | Thermoelectron emission type electron gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11655580A JPS5740844A (en) | 1980-08-25 | 1980-08-25 | Thermoelectron emission type electron gun |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5740844A true JPS5740844A (en) | 1982-03-06 |
Family
ID=14690007
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11655580A Pending JPS5740844A (en) | 1980-08-25 | 1980-08-25 | Thermoelectron emission type electron gun |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5740844A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009283434A (en) * | 2008-05-20 | 2009-12-03 | Samsung Electronics Co Ltd | Electron beam focusing electrode, electron gun using the same, and method for reducing diffusion phenomenon of electron beam having square section |
-
1980
- 1980-08-25 JP JP11655580A patent/JPS5740844A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009283434A (en) * | 2008-05-20 | 2009-12-03 | Samsung Electronics Co Ltd | Electron beam focusing electrode, electron gun using the same, and method for reducing diffusion phenomenon of electron beam having square section |
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