JPS5739430U - - Google Patents
Info
- Publication number
- JPS5739430U JPS5739430U JP1980114556U JP11455680U JPS5739430U JP S5739430 U JPS5739430 U JP S5739430U JP 1980114556 U JP1980114556 U JP 1980114556U JP 11455680 U JP11455680 U JP 11455680U JP S5739430 U JPS5739430 U JP S5739430U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/52—Devices for transferring articles or materials between conveyors i.e. discharging or feeding devices
- B65G47/53—Devices for transferring articles or materials between conveyors i.e. discharging or feeding devices between conveyors which cross one another
- B65G47/54—Devices for transferring articles or materials between conveyors i.e. discharging or feeding devices between conveyors which cross one another at least one of which is a roller-way
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/52—Devices for transferring articles or materials between conveyors i.e. discharging or feeding devices
- B65G47/64—Switching conveyors
- B65G47/641—Switching conveyors by a linear displacement of the switching conveyor
- B65G47/643—Switching conveyors by a linear displacement of the switching conveyor in a vertical plane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1980114556U JPS5739430U (ja) | 1980-08-14 | 1980-08-14 | |
US06/292,417 US4483651A (en) | 1980-08-14 | 1981-08-13 | Automatic apparatus for continuous treatment of leaf materials with gas plasma |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1980114556U JPS5739430U (ja) | 1980-08-14 | 1980-08-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5739430U true JPS5739430U (ja) | 1982-03-03 |
Family
ID=14640753
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1980114556U Pending JPS5739430U (ja) | 1980-08-14 | 1980-08-14 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4483651A (ja) |
JP (1) | JPS5739430U (ja) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6010625A (ja) * | 1983-06-29 | 1985-01-19 | Tokyo Denshi Kagaku Kabushiki | 多段プラズマ処理装置 |
JPH05144754A (ja) * | 1992-03-30 | 1993-06-11 | Semiconductor Energy Lab Co Ltd | 被膜作製装置 |
JPH0851139A (ja) * | 1990-03-30 | 1996-02-20 | Tokyo Electron Ltd | 処理装置 |
JPH08241917A (ja) * | 1995-12-14 | 1996-09-17 | Hitachi Ltd | 基板の真空処理方法及び基板真空処理装置 |
JPH08250573A (ja) * | 1995-12-14 | 1996-09-27 | Hitachi Ltd | 基板処理装置及び基板処理方法 |
JPH08255823A (ja) * | 1988-02-12 | 1996-10-01 | Tokyo Electron Ltd | 処理装置 |
JPH08298280A (ja) * | 1995-12-14 | 1996-11-12 | Hitachi Ltd | 真空処理装置 |
JPH08321537A (ja) * | 1996-05-20 | 1996-12-03 | Tokyo Electron Ltd | 処理装置及び処理方法 |
CN118387389A (zh) * | 2024-06-28 | 2024-07-26 | 新乡医学院 | 一种玻璃制品智能化转运设备及其操作工艺 |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06105742B2 (ja) * | 1983-11-28 | 1994-12-21 | 株式会社日立製作所 | 真空処理方法及び装置 |
DE8429732U1 (de) * | 1984-10-10 | 1985-02-28 | Rhein-Conti Kunststoff-Technik Gmbh, 6900 Heidelberg | Rotationsvorrichtung |
JPH0620922B2 (ja) * | 1984-10-19 | 1994-03-23 | 株式会社東芝 | 被検物の搬送装置 |
US4658947A (en) * | 1984-11-08 | 1987-04-21 | Raymond Production Systems | Transfer mechanism |
US4759681A (en) * | 1985-01-22 | 1988-07-26 | Nissin Electric Co. Ltd. | End station for an ion implantation apparatus |
US4966519A (en) * | 1985-10-24 | 1990-10-30 | Texas Instruments Incorporated | Integrated circuit processing system |
US4842680A (en) * | 1985-10-24 | 1989-06-27 | Texas Instruments Incorporated | Advanced vacuum processor |
US4845843A (en) * | 1985-10-28 | 1989-07-11 | Cimm, Inc. | System for configuring, automating and controlling the test and repair of printed circuit boards |
US4850104A (en) * | 1985-10-28 | 1989-07-25 | Cimm, Inc. | System for configuring, automating and controlling operations performed on PCBS and other products |
US5308431A (en) * | 1986-04-18 | 1994-05-03 | General Signal Corporation | System providing multiple processing of substrates |
EP0246453A3 (en) * | 1986-04-18 | 1989-09-06 | General Signal Corporation | Novel multiple-processing and contamination-free plasma etching system |
US6103055A (en) * | 1986-04-18 | 2000-08-15 | Applied Materials, Inc. | System for processing substrates |
US4722298A (en) * | 1986-05-19 | 1988-02-02 | Machine Technology, Inc. | Modular processing apparatus for processing semiconductor wafers |
DE3735449A1 (de) * | 1987-10-20 | 1989-05-03 | Convac Gmbh | Fertigungssystem fuer halbleitersubstrate |
DE4010359A1 (de) * | 1990-03-31 | 1991-10-02 | Beltron Gmbh | Vorrichtung zum transport von empfindlichen gegenstaenden unterschiedlicher groesse |
US5193685A (en) * | 1991-06-20 | 1993-03-16 | Trevithick William J | Gemstone sorting apparatus and methods |
DE4125334C2 (de) * | 1991-07-31 | 1999-08-19 | Leybold Ag | Vorrichtung für den Transport von Substraten |
US6053687A (en) * | 1997-09-05 | 2000-04-25 | Applied Materials, Inc. | Cost effective modular-linear wafer processing |
JPH11121754A (ja) * | 1997-10-14 | 1999-04-30 | Sanyo Electric Co Ltd | 薄膜トランジスタの製造装置及び製造方法 |
US6228773B1 (en) | 1998-04-14 | 2001-05-08 | Matrix Integrated Systems, Inc. | Synchronous multiplexed near zero overhead architecture for vacuum processes |
TW442891B (en) * | 1998-11-17 | 2001-06-23 | Tokyo Electron Ltd | Vacuum processing system |
JP2002261147A (ja) * | 2001-03-02 | 2002-09-13 | Seiko Instruments Inc | 真空装置および搬送装置 |
US6841033B2 (en) * | 2001-03-21 | 2005-01-11 | Nordson Corporation | Material handling system and method for a multi-workpiece plasma treatment system |
JP2005534174A (ja) * | 2002-07-19 | 2005-11-10 | アクセリス テクノロジーズ, インコーポレイテッド | フォトレジスト・アッシング装置 |
US8545159B2 (en) * | 2003-10-01 | 2013-10-01 | Jusung Engineering Co., Ltd. | Apparatus having conveyor and method of transferring substrate using the same |
US7101138B2 (en) * | 2003-12-03 | 2006-09-05 | Brooks Automation, Inc. | Extractor/buffer |
KR100621775B1 (ko) * | 2005-04-15 | 2006-09-15 | 삼성전자주식회사 | 기판 세정장치 |
JP2008544485A (ja) * | 2005-06-10 | 2008-12-04 | アプライド マテリアルズ インコーポレイテッド | 直線真空堆積システム |
US7438175B2 (en) | 2005-06-10 | 2008-10-21 | Applied Materials, Inc. | Linear vacuum deposition system |
US7296673B2 (en) * | 2005-06-10 | 2007-11-20 | Applied Materials, Inc. | Substrate conveyor system |
US20070051314A1 (en) * | 2005-09-08 | 2007-03-08 | Jusung Engineering Co., Ltd. | Movable transfer chamber and substrate-treating apparatus including the same |
KR101287197B1 (ko) * | 2005-12-29 | 2013-07-16 | 엘지디스플레이 주식회사 | 평판표시소자 제조 공정용 식각 장비 및 이를 이용한 제조방법 |
JP4865352B2 (ja) * | 2006-02-17 | 2012-02-01 | 三菱重工業株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP5449089B2 (ja) * | 2010-08-19 | 2014-03-19 | 富士機械製造株式会社 | シャトルコンベヤおよび対回路基板作業機 |
EP2445003A1 (en) * | 2010-10-25 | 2012-04-25 | Applied Materials, Inc. | Apparatus for providing a rotation carrier magazine, and method of operating thereof |
JP2015061049A (ja) * | 2013-09-20 | 2015-03-30 | 日本電産リード株式会社 | 処理対象物搬送システム、及び基板検査システム |
EP3514825B1 (en) | 2018-01-22 | 2023-11-29 | Meyer Burger GmbH | Wafer sorting |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5582782A (en) * | 1978-12-18 | 1980-06-21 | Fujitsu Ltd | Dry etching method |
JPS5599739A (en) * | 1979-01-26 | 1980-07-30 | Hitachi Ltd | Wafer treating method and its equipment |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS503546B1 (ja) * | 1966-04-30 | 1975-02-06 | ||
US3812947A (en) * | 1969-07-29 | 1974-05-28 | Texas Instruments Inc | Automatic slice processing |
US3710917A (en) * | 1971-01-29 | 1973-01-16 | Dorr Oliver Inc | Conveying apparatus |
US3973665A (en) * | 1975-03-07 | 1976-08-10 | Gca Corporation | Article delivery and transport apparatus for evacuated processing equipment |
JPS5291650A (en) * | 1976-01-29 | 1977-08-02 | Toshiba Corp | Continuous gas plasma etching apparatus |
JPS5378170A (en) * | 1976-12-22 | 1978-07-11 | Toshiba Corp | Continuous processor for gas plasma etching |
JPS5421175A (en) * | 1977-07-18 | 1979-02-17 | Tokyo Ouka Kougiyou Kk | Improvement of plasma reaction processor |
US4208159A (en) * | 1977-07-18 | 1980-06-17 | Tokyo Ohka Kogyo Kabushiki Kaisha | Apparatus for the treatment of a wafer by plasma reaction |
JPS564244A (en) * | 1979-06-25 | 1981-01-17 | Hitachi Ltd | Continuous vacuum treatment device for wafer |
-
1980
- 1980-08-14 JP JP1980114556U patent/JPS5739430U/ja active Pending
-
1981
- 1981-08-13 US US06/292,417 patent/US4483651A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5582782A (en) * | 1978-12-18 | 1980-06-21 | Fujitsu Ltd | Dry etching method |
JPS5599739A (en) * | 1979-01-26 | 1980-07-30 | Hitachi Ltd | Wafer treating method and its equipment |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6010625A (ja) * | 1983-06-29 | 1985-01-19 | Tokyo Denshi Kagaku Kabushiki | 多段プラズマ処理装置 |
JPH08255823A (ja) * | 1988-02-12 | 1996-10-01 | Tokyo Electron Ltd | 処理装置 |
JPH0851139A (ja) * | 1990-03-30 | 1996-02-20 | Tokyo Electron Ltd | 処理装置 |
JPH05144754A (ja) * | 1992-03-30 | 1993-06-11 | Semiconductor Energy Lab Co Ltd | 被膜作製装置 |
JPH08241917A (ja) * | 1995-12-14 | 1996-09-17 | Hitachi Ltd | 基板の真空処理方法及び基板真空処理装置 |
JPH08250573A (ja) * | 1995-12-14 | 1996-09-27 | Hitachi Ltd | 基板処理装置及び基板処理方法 |
JPH08298280A (ja) * | 1995-12-14 | 1996-11-12 | Hitachi Ltd | 真空処理装置 |
JPH08321537A (ja) * | 1996-05-20 | 1996-12-03 | Tokyo Electron Ltd | 処理装置及び処理方法 |
CN118387389A (zh) * | 2024-06-28 | 2024-07-26 | 新乡医学院 | 一种玻璃制品智能化转运设备及其操作工艺 |
Also Published As
Publication number | Publication date |
---|---|
US4483651A (en) | 1984-11-20 |