JPS5738524B2 - - Google Patents
Info
- Publication number
- JPS5738524B2 JPS5738524B2 JP2305373A JP2305373A JPS5738524B2 JP S5738524 B2 JPS5738524 B2 JP S5738524B2 JP 2305373 A JP2305373 A JP 2305373A JP 2305373 A JP2305373 A JP 2305373A JP S5738524 B2 JPS5738524 B2 JP S5738524B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19722209267 DE2209267C3 (de) | 1972-02-26 | Verfahren zur Herstellung von Wasserstoff enthaltenden Chlorsilanen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4895396A JPS4895396A (US20080094685A1-20080424-C00004.png) | 1973-12-07 |
| JPS5738524B2 true JPS5738524B2 (US20080094685A1-20080424-C00004.png) | 1982-08-16 |
Family
ID=5837281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2305373A Expired JPS5738524B2 (US20080094685A1-20080424-C00004.png) | 1972-02-26 | 1973-02-26 |
Country Status (6)
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08203341A (ja) * | 1995-01-20 | 1996-08-09 | Acer Peripherals Inc | 信号伝送用のフラットケーブル |
| WO2008056550A1 (fr) * | 2006-11-07 | 2008-05-15 | Mitsubishi Materials Corporation | Procédé de fabrication de trichlorosilane et appareil de production de trichlorosilane |
| WO2008146741A1 (ja) | 2007-05-25 | 2008-12-04 | Mitsubishi Materials Corporation | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
| WO2010090203A1 (ja) * | 2009-02-04 | 2010-08-12 | 株式会社トクヤマ | 多結晶シリコンの製造法 |
| EP2233436A1 (en) | 2009-03-11 | 2010-09-29 | Mitsubishi Materials Corporation | Apparatus and method for producing trichlorosilane |
| WO2010116500A1 (ja) * | 2009-04-08 | 2010-10-14 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1048355B (it) * | 1974-10-30 | 1980-11-20 | Engelhard Min & Chem | Procedimento termodinamico per generare prodotti di combustione di e levata energia termica e produrre da essi energia meccanica in una turbina a gas e relativo impianto a turbina |
| US4390510A (en) * | 1982-02-16 | 1983-06-28 | General Electric Company | Process for treating spent silicon-containing reaction masses to produce halosilanes |
| JPS6081010A (ja) * | 1983-10-13 | 1985-05-09 | Denki Kagaku Kogyo Kk | トリクロルシランの製造法 |
| DE3809784C1 (US20080094685A1-20080424-C00004.png) * | 1988-03-23 | 1989-07-13 | Huels Ag, 4370 Marl, De | |
| US20020008723A1 (en) | 1998-07-21 | 2002-01-24 | Xin Wen | Printer and method of compensating for malperforming and inoperative ink nozzles in a print head |
| US6047816A (en) * | 1998-09-08 | 2000-04-11 | Eastman Kodak Company | Printhead container and method |
| US6273542B1 (en) | 1998-12-22 | 2001-08-14 | Eastman Kodak Company | Method of compensating for malperforming nozzles in an inkjet printer |
| US6354689B1 (en) | 1998-12-22 | 2002-03-12 | Eastman Kodak Company | Method of compensating for malperforming nozzles in a multitone inkjet printer |
| DE102005005044A1 (de) * | 2005-02-03 | 2006-08-10 | Consortium für elektrochemische Industrie GmbH | Verfahren zur Herstellung von Trichlorsilan mittels thermischer Hydrierung von Siliciumtetrachlorid |
| JP5488777B2 (ja) * | 2006-11-30 | 2014-05-14 | 三菱マテリアル株式会社 | トリクロロシランの製造方法およびトリクロロシランの製造装置 |
| KR101573933B1 (ko) * | 2008-02-29 | 2015-12-02 | 미쓰비시 마테리알 가부시키가이샤 | 트리클로로실란의 제조 방법 및 제조 장치 |
| TW201031591A (en) * | 2008-10-30 | 2010-09-01 | Mitsubishi Materials Corp | Process for production of trichlorosilane and method for use thereof |
| WO2010086996A1 (ja) * | 2009-01-30 | 2010-08-05 | 電気化学工業株式会社 | トリクロロシランの生産方法 |
| JP5374576B2 (ja) * | 2009-03-06 | 2013-12-25 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
| JP5618982B2 (ja) * | 2009-03-11 | 2014-11-05 | 電気化学工業株式会社 | トリクロロシラン製造装置 |
| WO2010103631A1 (ja) * | 2009-03-11 | 2010-09-16 | 電気化学工業株式会社 | トリクロロシラン製造装置 |
| WO2010103632A1 (ja) * | 2009-03-11 | 2010-09-16 | 電気化学工業株式会社 | トリクロロシラン製造装置 |
| DE102010007916B4 (de) * | 2010-02-12 | 2013-11-28 | Centrotherm Sitec Gmbh | Verfahren zur Hydrierung von Chlorsilanen und Verwendung eines Konverters zur Durchführung des Verfahrens |
| CN101791487B (zh) * | 2010-03-30 | 2012-01-25 | 中国天辰工程有限公司 | 回收多晶硅生产的尾气中氯化氢的方法 |
| MY163880A (en) * | 2010-09-27 | 2017-11-15 | Gtat Corp | Heater and related methods therefor |
| US20120107216A1 (en) * | 2010-10-27 | 2012-05-03 | Gt Solar Incorporated | Hydrochlorination heater and related methods therefor |
| TWI525040B (zh) | 2011-06-21 | 2016-03-11 | Ｇｔａｔ股份有限公司 | 用於將四氯化矽轉換成三氯矽烷之裝置及方法 |
| EP2768774B1 (en) * | 2011-10-20 | 2017-03-22 | REC Silicon Inc | Fouling reduction in hydrochlorosilane production |
| DE102012218941A1 (de) * | 2012-10-17 | 2014-04-17 | Wacker Chemie Ag | Reaktor und Verfahren zur endothermen Gasphasenreaktion in einem Reaktor |
| US20160008784A1 (en) * | 2013-03-13 | 2016-01-14 | Sitec Gmbh | Temperature management in chlorination processes and systems related thereto |
| US20220089449A1 (en) * | 2018-12-19 | 2022-03-24 | Wacker Chemie Ag | Method for producing chlorosilanes |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4840625A (US20080094685A1-20080424-C00004.png) * | 1971-09-24 | 1973-06-14 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA463307A (en) * | 1950-02-21 | T. Hurd Dallas | Hydrogenation of halogenosilanes | |
| US3147071A (en) * | 1964-09-01 | Process of manufacturing dichloro- | ||
| US2458703A (en) * | 1947-06-11 | 1949-01-11 | Libbey Owens Ford Glass Co | Reduction of compounds of silicon and halogen |
| US2875028A (en) * | 1950-04-12 | 1959-02-24 | Thiokol Chemical Corp | Process and apparatus for the fixation of products of irreversible thermochemical reactions |
| US2768061A (en) * | 1953-02-26 | 1956-10-23 | Gen Electric | Hydrogen reduction method and apparatus |
| US2999733A (en) * | 1957-01-16 | 1961-09-12 | British Titan Products | Chlorination processes |
| DE1129937B (de) * | 1959-09-28 | 1962-05-24 | Siemens Ag | Verfahren und Anordnung zur Rueckgewinnung der unverbrauchten Ausgangsstoffe bei derHerstellung von Reinstsilicium mittels Reduktion von Silanen durch Wasserstoff |
-
0
- BE BE795913D patent/BE795913A/xx not_active IP Right Cessation
-
1972
- 1972-12-06 IT IT70847/72A patent/IT975971B/it active
- 1972-12-15 FR FR7244898A patent/FR2172964B1/fr not_active Expired
-
1973
- 1973-01-31 US US05/328,362 patent/US4165363A/en not_active Expired - Lifetime
- 1973-02-26 GB GB929573A patent/GB1395863A/en not_active Expired
- 1973-02-26 JP JP2305373A patent/JPS5738524B2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4840625A (US20080094685A1-20080424-C00004.png) * | 1971-09-24 | 1973-06-14 |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08203341A (ja) * | 1995-01-20 | 1996-08-09 | Acer Peripherals Inc | 信号伝送用のフラットケーブル |
| WO2008056550A1 (fr) * | 2006-11-07 | 2008-05-15 | Mitsubishi Materials Corporation | Procédé de fabrication de trichlorosilane et appareil de production de trichlorosilane |
| WO2008146741A1 (ja) | 2007-05-25 | 2008-12-04 | Mitsubishi Materials Corporation | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
| US9994455B2 (en) | 2007-05-25 | 2018-06-12 | Mitsubishi Materials Corporation | Apparatus and method for manufacturing trichlorosilane and method for manufacturing polycrystalline silicon |
| WO2010090203A1 (ja) * | 2009-02-04 | 2010-08-12 | 株式会社トクヤマ | 多結晶シリコンの製造法 |
| JP5637866B2 (ja) * | 2009-02-04 | 2014-12-10 | 株式会社トクヤマ | 多結晶シリコンの製造法 |
| EP2233436A1 (en) | 2009-03-11 | 2010-09-29 | Mitsubishi Materials Corporation | Apparatus and method for producing trichlorosilane |
| WO2010116500A1 (ja) * | 2009-04-08 | 2010-10-14 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
| JPWO2010116500A1 (ja) * | 2009-04-08 | 2012-10-11 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2209267A1 (de) | 1973-08-30 |
| BE795913A (fr) | 1973-06-18 |
| IT975971B (it) | 1974-08-10 |
| US4165363A (en) | 1979-08-21 |
| JPS4895396A (US20080094685A1-20080424-C00004.png) | 1973-12-07 |
| DE2209267B2 (de) | 1977-03-10 |
| FR2172964A1 (US20080094685A1-20080424-C00004.png) | 1973-10-05 |
| FR2172964B1 (US20080094685A1-20080424-C00004.png) | 1976-04-30 |
| GB1395863A (en) | 1975-05-29 |
