JPS5736827A - Film forming apparatus - Google Patents

Film forming apparatus

Info

Publication number
JPS5736827A
JPS5736827A JP11171280A JP11171280A JPS5736827A JP S5736827 A JPS5736827 A JP S5736827A JP 11171280 A JP11171280 A JP 11171280A JP 11171280 A JP11171280 A JP 11171280A JP S5736827 A JPS5736827 A JP S5736827A
Authority
JP
Japan
Prior art keywords
gas supply
center
nozzle
nozzles
main gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11171280A
Other languages
Japanese (ja)
Inventor
Hiroo Tochikubo
Akira Kanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11171280A priority Critical patent/JPS5736827A/en
Publication of JPS5736827A publication Critical patent/JPS5736827A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45508—Radial flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)

Abstract

PURPOSE:To form a uniform film by arranging a rotatable jig for mounting a film forming device around a main gas supply nozzle provided at the center of a reaction furnace and further providing sub gas supply nozzles at the outer peripheral edge of the furnace. CONSTITUTION:A main gas supply nozzle 10 is provided at the center of a reaction furnace 12, and many nozzles are arranged in a circumferential direction. A susceptor 15 placing silicon substrates 15 is horizontally disposed around the nozzle to be rotated around the nozzle 10. Sub gas supply nozzles 11 radially equidistantly distributed are arranged toward the center in the vicinity of the outer edge of a bell- jar 12. Reaction gas is injected from the main gas supply nozzle, and is also injected from the subgas supply nozzles toward the center to correct the reduced amount. In this manner, a uniform film can be formed on the substrates, and this apparatus is thus adapted for large area treatment.
JP11171280A 1980-08-15 1980-08-15 Film forming apparatus Pending JPS5736827A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11171280A JPS5736827A (en) 1980-08-15 1980-08-15 Film forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11171280A JPS5736827A (en) 1980-08-15 1980-08-15 Film forming apparatus

Publications (1)

Publication Number Publication Date
JPS5736827A true JPS5736827A (en) 1982-02-27

Family

ID=14568242

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11171280A Pending JPS5736827A (en) 1980-08-15 1980-08-15 Film forming apparatus

Country Status (1)

Country Link
JP (1) JPS5736827A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003048430A1 (en) * 2001-11-27 2003-06-12 Osram Opto Semiconductors Gmbh Device and method for producing, removing or treating layers on a substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003048430A1 (en) * 2001-11-27 2003-06-12 Osram Opto Semiconductors Gmbh Device and method for producing, removing or treating layers on a substrate

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