JPS5735319A - Heat treatment device - Google Patents

Heat treatment device

Info

Publication number
JPS5735319A
JPS5735319A JP11019880A JP11019880A JPS5735319A JP S5735319 A JPS5735319 A JP S5735319A JP 11019880 A JP11019880 A JP 11019880A JP 11019880 A JP11019880 A JP 11019880A JP S5735319 A JPS5735319 A JP S5735319A
Authority
JP
Japan
Prior art keywords
chamber
foreign matters
wafer
gas
conveying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11019880A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0313735B2 (enrdf_load_stackoverflow
Inventor
Haruo Amada
Hiroshi Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11019880A priority Critical patent/JPS5735319A/ja
Publication of JPS5735319A publication Critical patent/JPS5735319A/ja
Publication of JPH0313735B2 publication Critical patent/JPH0313735B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11019880A 1980-08-13 1980-08-13 Heat treatment device Granted JPS5735319A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11019880A JPS5735319A (en) 1980-08-13 1980-08-13 Heat treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11019880A JPS5735319A (en) 1980-08-13 1980-08-13 Heat treatment device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP12170488A Division JPS64738A (en) 1988-05-20 1988-05-20 Heat treatment of semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS5735319A true JPS5735319A (en) 1982-02-25
JPH0313735B2 JPH0313735B2 (enrdf_load_stackoverflow) 1991-02-25

Family

ID=14529528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11019880A Granted JPS5735319A (en) 1980-08-13 1980-08-13 Heat treatment device

Country Status (1)

Country Link
JP (1) JPS5735319A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120331A (ja) * 1984-07-09 1986-01-29 Nec Corp レジストベ−ク装置
JPS61164023U (enrdf_load_stackoverflow) * 1985-03-28 1986-10-11
JPS6453421A (en) * 1987-08-24 1989-03-01 Mitsubishi Electric Corp Resist coating device
JPH01225119A (ja) * 1988-03-03 1989-09-08 Nec Corp ホットプレート式ベーキング装置
JP2009099861A (ja) * 2007-10-18 2009-05-07 Fenwall Controls Of Japan Ltd 半導体処理ユニット及び半導体製造装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895638A (enrdf_load_stackoverflow) * 1972-03-21 1973-12-07
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS51132772A (en) * 1975-05-14 1976-11-18 Hitachi Ltd Baking apparatus
JPS5422377U (enrdf_load_stackoverflow) * 1977-07-18 1979-02-14
JPS54158445A (en) * 1978-06-05 1979-12-14 Mitsubishi Electric Corp Sintering of photosensitive resin
JPS5595332A (en) * 1979-01-12 1980-07-19 Toshiba Corp Dust removing system for conveyor

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895638A (enrdf_load_stackoverflow) * 1972-03-21 1973-12-07
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS51132772A (en) * 1975-05-14 1976-11-18 Hitachi Ltd Baking apparatus
JPS5422377U (enrdf_load_stackoverflow) * 1977-07-18 1979-02-14
JPS54158445A (en) * 1978-06-05 1979-12-14 Mitsubishi Electric Corp Sintering of photosensitive resin
JPS5595332A (en) * 1979-01-12 1980-07-19 Toshiba Corp Dust removing system for conveyor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120331A (ja) * 1984-07-09 1986-01-29 Nec Corp レジストベ−ク装置
JPS61164023U (enrdf_load_stackoverflow) * 1985-03-28 1986-10-11
JPS6453421A (en) * 1987-08-24 1989-03-01 Mitsubishi Electric Corp Resist coating device
JPH01225119A (ja) * 1988-03-03 1989-09-08 Nec Corp ホットプレート式ベーキング装置
JP2009099861A (ja) * 2007-10-18 2009-05-07 Fenwall Controls Of Japan Ltd 半導体処理ユニット及び半導体製造装置

Also Published As

Publication number Publication date
JPH0313735B2 (enrdf_load_stackoverflow) 1991-02-25

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