JPS5724560A - Thyristor - Google Patents

Thyristor

Info

Publication number
JPS5724560A
JPS5724560A JP9953380A JP9953380A JPS5724560A JP S5724560 A JPS5724560 A JP S5724560A JP 9953380 A JP9953380 A JP 9953380A JP 9953380 A JP9953380 A JP 9953380A JP S5724560 A JPS5724560 A JP S5724560A
Authority
JP
Japan
Prior art keywords
layer
junction
polycrystalline layer
thyristor
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9953380A
Other languages
Japanese (ja)
Inventor
Hirosuke Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP9953380A priority Critical patent/JPS5724560A/en
Publication of JPS5724560A publication Critical patent/JPS5724560A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action
    • H01L29/7404Thyristor-type devices, e.g. having four-zone regenerative action structurally associated with at least one other device
    • H01L29/7408Thyristor-type devices, e.g. having four-zone regenerative action structurally associated with at least one other device the device being a capacitor or a resistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thyristors (AREA)

Abstract

PURPOSE:To obtain a thyristor for small current, having a trigger current designed freely, by a method wherein a semi-short-circuited condition is formed by covering the exposed surface of the P-N junction between a gate layer and a cathode layer of the thyristor with a polycrystalline layer including impurities. CONSTITUTION:Four semiconductor layers of P1-N1-P2-N2 are formed in a semicondutor piece 1. On the P2-N2 layer surfaces of the semiconductor piece 1, monosilane (SiH4) and a impurity source are introduced to deposit a polycrystalline layer including impurities at a temperature of less than 700 deg.C by using the CVD process. Only the P2-N2 junction surface of the polycrystalline layer is protected with wax or the like, and the remaining surface is dissolved and removed with a mixed acid including hydrofluoric acid and nitric acid to form another polycrystalline layer 2. Because the polycrystalline layer is formed at low-temperature, the impurities are not diffused, the intermediate connection between a diffused junction and a resistance junction is obtained, and the shunt component of the gate current is regulated by controlling the dimensions of the layer 2.
JP9953380A 1980-07-21 1980-07-21 Thyristor Pending JPS5724560A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9953380A JPS5724560A (en) 1980-07-21 1980-07-21 Thyristor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9953380A JPS5724560A (en) 1980-07-21 1980-07-21 Thyristor

Publications (1)

Publication Number Publication Date
JPS5724560A true JPS5724560A (en) 1982-02-09

Family

ID=14249845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9953380A Pending JPS5724560A (en) 1980-07-21 1980-07-21 Thyristor

Country Status (1)

Country Link
JP (1) JPS5724560A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS593970A (en) * 1982-06-29 1984-01-10 Nec Corp Semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS593970A (en) * 1982-06-29 1984-01-10 Nec Corp Semiconductor device
JPH0142506B2 (en) * 1982-06-29 1989-09-13 Nippon Electric Co

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