JPS57207382A - High-speed diode - Google Patents

High-speed diode

Info

Publication number
JPS57207382A
JPS57207382A JP9248781A JP9248781A JPS57207382A JP S57207382 A JPS57207382 A JP S57207382A JP 9248781 A JP9248781 A JP 9248781A JP 9248781 A JP9248781 A JP 9248781A JP S57207382 A JPS57207382 A JP S57207382A
Authority
JP
Japan
Prior art keywords
layer
type
substrate
small holes
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9248781A
Other languages
Japanese (ja)
Inventor
Kimihiro Muraoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Denki Seizo KK
Toyo Electric Manufacturing Ltd
Original Assignee
Toyo Denki Seizo KK
Toyo Electric Manufacturing Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Denki Seizo KK, Toyo Electric Manufacturing Ltd filed Critical Toyo Denki Seizo KK
Priority to JP9248781A priority Critical patent/JPS57207382A/en
Publication of JPS57207382A publication Critical patent/JPS57207382A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/868PIN diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To shorten inverse recovery time, and to obtain the diode having a soft-recovery characteristic by forming an N<+> type layer by using Au-Sb foil with a plurality of small holes and making the temperature of heat treatment at the time of alloying a temperature where an alloy is diffused sufficiently to an Ni-layer when a P<+>-Ni-N<+> junction is shaped by employing an N type Si. CONSTITUTION:A P<+> type Si substrate 4 is fixed onto a supporting electrode 7 consisting of W, etc. by using metallic solder 6, the principal ingredient thereof is Al, the Ni type layer 3 is grown onto the substrate, and the layer 3 and the substrate 4 are etched in mesa form. The Au-Sb foil 1, a diameter thereof is approximately the same as the layer 3, the ratio of Au to Sb therein is made 95:5 and to which a large number of the small holes 2 with approximately 1mm. diameters are formed, is placed onto the layer 3, the temperature where Au is diffused sufficiently into the layer 3 is selected, and shallow N<+> type regions 5 corresponding to the small holes 2 are shaped into the layer 3 through heat treatment. Accordingly, a snap-OFF characteristic is generated to an inverse recovery characteristic in an Au diffusing region and the soft-recovery characteristic in a region in which there is no Au diffusion, and the inverse recovery time is shortened.
JP9248781A 1981-06-16 1981-06-16 High-speed diode Pending JPS57207382A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9248781A JPS57207382A (en) 1981-06-16 1981-06-16 High-speed diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9248781A JPS57207382A (en) 1981-06-16 1981-06-16 High-speed diode

Publications (1)

Publication Number Publication Date
JPS57207382A true JPS57207382A (en) 1982-12-20

Family

ID=14055654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9248781A Pending JPS57207382A (en) 1981-06-16 1981-06-16 High-speed diode

Country Status (1)

Country Link
JP (1) JPS57207382A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3442644A1 (en) * 1983-11-29 1985-06-05 Mitsubishi Denki K.K., Tokio/Tokyo Semiconductor component

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3442644A1 (en) * 1983-11-29 1985-06-05 Mitsubishi Denki K.K., Tokio/Tokyo Semiconductor component

Similar Documents

Publication Publication Date Title
JPS5710992A (en) Semiconductor device and manufacture therefor
JPS57207382A (en) High-speed diode
JPS5593230A (en) Soldering method for semiconductor device
JPS5636171A (en) Zener diode and manufacture thereof
JPS56112761A (en) Manufacture of 3-5 group element semiconductor device
JPS5339081A (en) Semiconductor device
JPS57147285A (en) Zener diode
JPS564274A (en) Semiconductor device
JPS55115357A (en) Semiconductor device
JPS53131777A (en) Gold fiffusion method to reverse conductivity type thyristor
JPS56114367A (en) Semiconductor device
JPS5381093A (en) Multiinput-multioutput iil
JPS5296878A (en) Manufacture of semiconductor laser element
JPS52142487A (en) Thyristor and its production
JPS5780741A (en) Active matrix substrate
JPS54158188A (en) Manufacture of semiconductor device
JPS5552227A (en) Semiconductor electrode structure
JPS5432986A (en) Semiconductor device
JPS53110461A (en) Semiconductor device
JPS53109484A (en) Semiconductor device
JPS5390784A (en) Production of semiconductor device
JPS53127280A (en) Semiconductor device
JPS5524411A (en) Process of manufacturing semiconductor rectifying device
JPS5392673A (en) Manufacture of semiconductor
JPS54569A (en) Semiconductor device