JPS57202630A - Electrostatic deflector - Google Patents
Electrostatic deflectorInfo
- Publication number
- JPS57202630A JPS57202630A JP8762781A JP8762781A JPS57202630A JP S57202630 A JPS57202630 A JP S57202630A JP 8762781 A JP8762781 A JP 8762781A JP 8762781 A JP8762781 A JP 8762781A JP S57202630 A JPS57202630 A JP S57202630A
- Authority
- JP
- Japan
- Prior art keywords
- deflection
- axis
- electrode
- stripe
- constitute
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/70—Arrangements for deflecting ray or beam
- H01J29/72—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
- H01J29/74—Deflecting by electric fields only
Landscapes
- Electron Tubes For Measurement (AREA)
Abstract
PURPOSE:To achieve the deflection having the low astigmatism in the wide range by splitting the hollow cylindrical electrode into the specific number to provide the X, Y direction deflector electrodes alternatively while arranging each electrode stripe chip in the positional relation symmetrical against the axis positioned at the particular angular position from x, y axis. CONSTITUTION:The hollow cylindrical electrode is splitted into 4+8m(m=1,2,3, 4.) in parallel with the central axis, where every other stripe will constitute the deflection electrode in X direction while the remaining stripe will constitute the deflection electrode in Y direction and said stripes constituting the X, Y direction deflection electrodes are arranged in such positional relation as symmetrical against the axis positioned at the angular position of 45 deg. from x, y axis. Consequently the charged particle beam can be deflected with high accuracy and high speed while the high order Fourier component can be removed resulting in the deflection having low astigmatism in the wide range.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8762781A JPS57202630A (en) | 1981-06-08 | 1981-06-08 | Electrostatic deflector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8762781A JPS57202630A (en) | 1981-06-08 | 1981-06-08 | Electrostatic deflector |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57202630A true JPS57202630A (en) | 1982-12-11 |
JPH0353736B2 JPH0353736B2 (en) | 1991-08-16 |
Family
ID=13920210
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8762781A Granted JPS57202630A (en) | 1981-06-08 | 1981-06-08 | Electrostatic deflector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57202630A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6067867A (en) * | 1983-09-22 | 1985-04-18 | Konishiroku Photo Ind Co Ltd | Electric field forming apparatus |
JP2005521215A (en) * | 2002-03-21 | 2005-07-14 | エルメス−マイクロビジョン・(タイワン)・インコーポレーテッド | Electro-optical focusing, deflection, signal acquisition system and method for swinging objective decelerating immersion lens |
US7473905B2 (en) | 2005-10-04 | 2009-01-06 | Jeol Ltd. | Electrostatic deflector |
EP4303907A1 (en) | 2022-07-06 | 2024-01-10 | Universität Hamburg | Electrostatic deflector for charged particle optics |
-
1981
- 1981-06-08 JP JP8762781A patent/JPS57202630A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6067867A (en) * | 1983-09-22 | 1985-04-18 | Konishiroku Photo Ind Co Ltd | Electric field forming apparatus |
JP2005521215A (en) * | 2002-03-21 | 2005-07-14 | エルメス−マイクロビジョン・(タイワン)・インコーポレーテッド | Electro-optical focusing, deflection, signal acquisition system and method for swinging objective decelerating immersion lens |
US7473905B2 (en) | 2005-10-04 | 2009-01-06 | Jeol Ltd. | Electrostatic deflector |
EP4303907A1 (en) | 2022-07-06 | 2024-01-10 | Universität Hamburg | Electrostatic deflector for charged particle optics |
Also Published As
Publication number | Publication date |
---|---|
JPH0353736B2 (en) | 1991-08-16 |
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