JPS57196530A - Inspection of pattern - Google Patents
Inspection of patternInfo
- Publication number
- JPS57196530A JPS57196530A JP8160481A JP8160481A JPS57196530A JP S57196530 A JPS57196530 A JP S57196530A JP 8160481 A JP8160481 A JP 8160481A JP 8160481 A JP8160481 A JP 8160481A JP S57196530 A JPS57196530 A JP S57196530A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- inspection
- unit
- memory
- repetition pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8160481A JPS57196530A (en) | 1981-05-28 | 1981-05-28 | Inspection of pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8160481A JPS57196530A (en) | 1981-05-28 | 1981-05-28 | Inspection of pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57196530A true JPS57196530A (en) | 1982-12-02 |
JPS6239811B2 JPS6239811B2 (xx) | 1987-08-25 |
Family
ID=13750917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8160481A Granted JPS57196530A (en) | 1981-05-28 | 1981-05-28 | Inspection of pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57196530A (xx) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60138924A (ja) * | 1983-12-27 | 1985-07-23 | Fujitsu Ltd | パタ−ン検査方法及びその装置 |
JPS63266754A (ja) * | 1987-04-24 | 1988-11-02 | Hitachi Ltd | パターン検査方法およびその装置 |
JPS6425430A (en) * | 1987-07-21 | 1989-01-27 | Tokyo Electron Ltd | Probe device |
JPH09304040A (ja) * | 1996-05-13 | 1997-11-28 | Hitachi Ltd | 電子ビームによるパターン検査方法とその装置 |
US7260256B2 (en) | 1996-09-17 | 2007-08-21 | Renesas Technology Corporation | Method and system for inspecting a pattern |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013112212B4 (de) | 2013-11-06 | 2022-03-10 | Carl Zeiss Smt Gmbh | Optische Zoomeinrichtung, optische Abbildungseinrichtung, optisches Zoomverfahren und Abbildungsverfahren für die Mikroskopie |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50131469A (xx) * | 1974-04-03 | 1975-10-17 | ||
JPS53117978A (en) * | 1977-03-25 | 1978-10-14 | Hitachi Ltd | Automatic mask appearance inspection apparatus |
JPS5472975A (en) * | 1977-11-24 | 1979-06-11 | Hitachi Ltd | Mask inspecting method |
JPS5654038A (en) * | 1979-10-08 | 1981-05-13 | Toshiba Corp | Checking device for shape of photomask |
-
1981
- 1981-05-28 JP JP8160481A patent/JPS57196530A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50131469A (xx) * | 1974-04-03 | 1975-10-17 | ||
JPS53117978A (en) * | 1977-03-25 | 1978-10-14 | Hitachi Ltd | Automatic mask appearance inspection apparatus |
JPS5472975A (en) * | 1977-11-24 | 1979-06-11 | Hitachi Ltd | Mask inspecting method |
JPS5654038A (en) * | 1979-10-08 | 1981-05-13 | Toshiba Corp | Checking device for shape of photomask |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60138924A (ja) * | 1983-12-27 | 1985-07-23 | Fujitsu Ltd | パタ−ン検査方法及びその装置 |
JPS63266754A (ja) * | 1987-04-24 | 1988-11-02 | Hitachi Ltd | パターン検査方法およびその装置 |
JPS6425430A (en) * | 1987-07-21 | 1989-01-27 | Tokyo Electron Ltd | Probe device |
JPH09304040A (ja) * | 1996-05-13 | 1997-11-28 | Hitachi Ltd | 電子ビームによるパターン検査方法とその装置 |
US7260256B2 (en) | 1996-09-17 | 2007-08-21 | Renesas Technology Corporation | Method and system for inspecting a pattern |
Also Published As
Publication number | Publication date |
---|---|
JPS6239811B2 (xx) | 1987-08-25 |
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