JPS57193081A - Visible light emitting semiconductor device - Google Patents
Visible light emitting semiconductor deviceInfo
- Publication number
- JPS57193081A JPS57193081A JP7775881A JP7775881A JPS57193081A JP S57193081 A JPS57193081 A JP S57193081A JP 7775881 A JP7775881 A JP 7775881A JP 7775881 A JP7775881 A JP 7775881A JP S57193081 A JPS57193081 A JP S57193081A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- light emitting
- semiconductor device
- visible light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/0008—Devices characterised by their operation having p-n or hi-lo junctions
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
PURPOSE:To enhance the light emitting efficiency and the reproducibility of a visible light emitting semiconductor device by reducing the carrier density of a p type layer lower than that of an n type layer when forming the device by alternately epitaxially growing an n type GaAlAs layer and a p type GaAlAs layer of Zn impurity on a crystalline substrate. CONSTITUTION:An n<+> type GaAlAs layer 12 doped with Te in high density is epitaxially grown on an n-type GaAlAs substrate 11, and a p<-> type GaAlAs layer 13 doped with Zn of low density is epitaxially grown on the layer 12 and is epitaxially grown. In this structure, the carrier desity of the layer 12 is set to 9X10<17>cm<-3>, and the carrier density of the layer 13 is set to 1-2X10<17>cm<-3>. In this manner, the difference between the p type carrier density and the n type carrier density is sufficiently increased in the vicinity of the p-n junction, thereby obtaining high light emitting efficiency.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7775881A JPS57193081A (en) | 1981-05-22 | 1981-05-22 | Visible light emitting semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7775881A JPS57193081A (en) | 1981-05-22 | 1981-05-22 | Visible light emitting semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57193081A true JPS57193081A (en) | 1982-11-27 |
Family
ID=13642821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7775881A Pending JPS57193081A (en) | 1981-05-22 | 1981-05-22 | Visible light emitting semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57193081A (en) |
-
1981
- 1981-05-22 JP JP7775881A patent/JPS57193081A/en active Pending
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