JPS57188677A - Vapor depositing device for metallic thin film - Google Patents

Vapor depositing device for metallic thin film

Info

Publication number
JPS57188677A
JPS57188677A JP7305281A JP7305281A JPS57188677A JP S57188677 A JPS57188677 A JP S57188677A JP 7305281 A JP7305281 A JP 7305281A JP 7305281 A JP7305281 A JP 7305281A JP S57188677 A JPS57188677 A JP S57188677A
Authority
JP
Japan
Prior art keywords
substrates
thin film
metallic thin
depositing device
vapor depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7305281A
Other languages
English (en)
Other versions
JPS6352111B2 (ja
Inventor
Takayuki Fujita
Yoshitaka Kuroda
Kenichiro Hori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7305281A priority Critical patent/JPS57188677A/ja
Publication of JPS57188677A publication Critical patent/JPS57188677A/ja
Publication of JPS6352111B2 publication Critical patent/JPS6352111B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP7305281A 1981-05-14 1981-05-14 Vapor depositing device for metallic thin film Granted JPS57188677A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7305281A JPS57188677A (en) 1981-05-14 1981-05-14 Vapor depositing device for metallic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7305281A JPS57188677A (en) 1981-05-14 1981-05-14 Vapor depositing device for metallic thin film

Publications (2)

Publication Number Publication Date
JPS57188677A true JPS57188677A (en) 1982-11-19
JPS6352111B2 JPS6352111B2 (ja) 1988-10-18

Family

ID=13507202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7305281A Granted JPS57188677A (en) 1981-05-14 1981-05-14 Vapor depositing device for metallic thin film

Country Status (1)

Country Link
JP (1) JPS57188677A (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5005518A (en) * 1988-08-04 1991-04-09 Shiro Yamada Artificial hair for hair-implantation and preparation process and preparation apparatus thereof
US6872260B2 (en) * 2000-03-23 2005-03-29 Neomax Co., Ltd. Deposited-film forming apparatus
JP2006342384A (ja) * 2005-06-08 2006-12-21 Moritex Corp 全面フィルタ膜付き球レンズの製造方法，製造装置及び全面フィルタ膜付き球レンズ並びに光モジュール
JP2008045197A (ja) * 2006-08-21 2008-02-28 Sony Corp 複合粉体の製造方法、及び複合粉体の製造装置
WO2014010434A1 (ja) * 2012-07-13 2014-01-16 株式会社メイハン 球状体の被膜形成方法
EP3567128A1 (en) * 2018-05-08 2019-11-13 IHI Hauzer Techno Coating B.V. Deposition apparatus and method of coating spherical objects
CN115287601A (zh) * 2022-08-05 2022-11-04 温州鑫淼电镀有限公司 一种塑胶制品的真空镀膜工艺

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5059441A (ja) * 1973-09-27 1975-05-22
JPS51140156U (ja) * 1975-05-01 1976-11-11
JPS51140157U (ja) * 1975-05-01 1976-11-11

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5059441A (ja) * 1973-09-27 1975-05-22
JPS51140156U (ja) * 1975-05-01 1976-11-11
JPS51140157U (ja) * 1975-05-01 1976-11-11

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5005518A (en) * 1988-08-04 1991-04-09 Shiro Yamada Artificial hair for hair-implantation and preparation process and preparation apparatus thereof
US6872260B2 (en) * 2000-03-23 2005-03-29 Neomax Co., Ltd. Deposited-film forming apparatus
US6960368B2 (en) 2000-03-23 2005-11-01 Neomax Co., Ltd Deposited-film forming apparatus
JP2006342384A (ja) * 2005-06-08 2006-12-21 Moritex Corp 全面フィルタ膜付き球レンズの製造方法，製造装置及び全面フィルタ膜付き球レンズ並びに光モジュール
JP2008045197A (ja) * 2006-08-21 2008-02-28 Sony Corp 複合粉体の製造方法、及び複合粉体の製造装置
WO2014010434A1 (ja) * 2012-07-13 2014-01-16 株式会社メイハン 球状体の被膜形成方法
EP3567128A1 (en) * 2018-05-08 2019-11-13 IHI Hauzer Techno Coating B.V. Deposition apparatus and method of coating spherical objects
CN115287601A (zh) * 2022-08-05 2022-11-04 温州鑫淼电镀有限公司 一种塑胶制品的真空镀膜工艺
CN115287601B (zh) * 2022-08-05 2023-09-22 温州鑫淼电镀有限公司 一种塑胶制品的真空镀膜工艺

Also Published As

Publication number Publication date
JPS6352111B2 (ja) 1988-10-18

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