JPS57186331A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS57186331A
JPS57186331A JP7123581A JP7123581A JPS57186331A JP S57186331 A JPS57186331 A JP S57186331A JP 7123581 A JP7123581 A JP 7123581A JP 7123581 A JP7123581 A JP 7123581A JP S57186331 A JPS57186331 A JP S57186331A
Authority
JP
Japan
Prior art keywords
electron beam
exposure
auxiliary memory
computer
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7123581A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0345527B2 (enrdf_load_stackoverflow
Inventor
Sakae Miyauchi
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP7123581A priority Critical patent/JPS57186331A/ja
Publication of JPS57186331A publication Critical patent/JPS57186331A/ja
Publication of JPH0345527B2 publication Critical patent/JPH0345527B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP7123581A 1981-05-12 1981-05-12 Manufacture of semiconductor device Granted JPS57186331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7123581A JPS57186331A (en) 1981-05-12 1981-05-12 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7123581A JPS57186331A (en) 1981-05-12 1981-05-12 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS57186331A true JPS57186331A (en) 1982-11-16
JPH0345527B2 JPH0345527B2 (enrdf_load_stackoverflow) 1991-07-11

Family

ID=13454826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7123581A Granted JPS57186331A (en) 1981-05-12 1981-05-12 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS57186331A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59178726A (ja) * 1983-03-29 1984-10-11 Toshiba Corp パタ−ン転写用マスクの製造方法
JPS6124231A (ja) * 1984-07-13 1986-02-01 Hitachi Ltd 電子線描画装置
JPS6258621A (ja) * 1985-09-09 1987-03-14 Toshiba Corp 微細パタ−ン形成方法
JPS6351635A (ja) * 1986-08-20 1988-03-04 Yokogawa Hewlett Packard Ltd リソグラフィ方法
US5908733A (en) * 1996-10-17 1999-06-01 Nec Corporation Method of electron beam exposure for superimposing second pattern over existing pattern

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534430A (en) * 1978-08-31 1980-03-11 Fujitsu Ltd Positioning method in electron beam exposure
JPS5640244A (en) * 1979-09-11 1981-04-16 Mitsubishi Electric Corp Beam scanning correction at electron beam exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534430A (en) * 1978-08-31 1980-03-11 Fujitsu Ltd Positioning method in electron beam exposure
JPS5640244A (en) * 1979-09-11 1981-04-16 Mitsubishi Electric Corp Beam scanning correction at electron beam exposure

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59178726A (ja) * 1983-03-29 1984-10-11 Toshiba Corp パタ−ン転写用マスクの製造方法
JPS6124231A (ja) * 1984-07-13 1986-02-01 Hitachi Ltd 電子線描画装置
JPS6258621A (ja) * 1985-09-09 1987-03-14 Toshiba Corp 微細パタ−ン形成方法
JPS6351635A (ja) * 1986-08-20 1988-03-04 Yokogawa Hewlett Packard Ltd リソグラフィ方法
US5908733A (en) * 1996-10-17 1999-06-01 Nec Corporation Method of electron beam exposure for superimposing second pattern over existing pattern
US5949079A (en) * 1996-10-17 1999-09-07 Nec Corporation Method of and an apparatus for electron beam exposure

Also Published As

Publication number Publication date
JPH0345527B2 (enrdf_load_stackoverflow) 1991-07-11

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