JPS54113262A - Mask inspection unit - Google Patents

Mask inspection unit

Info

Publication number
JPS54113262A
JPS54113262A JP1982978A JP1982978A JPS54113262A JP S54113262 A JPS54113262 A JP S54113262A JP 1982978 A JP1982978 A JP 1982978A JP 1982978 A JP1982978 A JP 1982978A JP S54113262 A JPS54113262 A JP S54113262A
Authority
JP
Japan
Prior art keywords
signals
inspection
converted
circuit
outputs
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1982978A
Other languages
Japanese (ja)
Inventor
Kiyoshi Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1982978A priority Critical patent/JPS54113262A/en
Publication of JPS54113262A publication Critical patent/JPS54113262A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE: To shorten an inspection time and improve an inspection precision by giving a constitution where an appearance inspection and a dimension inspection are performed simultaneously in the inspection unit for produced masks.
CONSTITUTION: Produced mask 8 is put on XY stage 9, and photo diode array 14 is moved in the XY direction to scan mask 8. Electric signals VA obtained in this manner are branched to pathes I and II. Signals VA of path I for appearance inspection are converted to binary signals in 15 and are converted to bits in shift register 16. Meanwhile, data selection circuit 17 outputs reference pattern signals V3, and these signals are converted to a pattern in pattern generator circuit 18 and are converted to bits in shift register 19. Comparator 20 compares signals VC and VD with each other and outputs a signal deciding correctness or incorrectness. Signals VA of path II for dimension inspection are triggerred by trigger generator circuit 28, and these signals and output VE of laser length measurement equipment 12 are operated in operation circuit 25. Comparator 26 compares output VF of the operation circuit and signal VG from reference dimension memory circuit 24 with each other and outputs a signal deciding correctness or incorrectness.
COPYRIGHT: (C)1979,JPO&Japio
JP1982978A 1978-02-24 1978-02-24 Mask inspection unit Pending JPS54113262A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1982978A JPS54113262A (en) 1978-02-24 1978-02-24 Mask inspection unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1982978A JPS54113262A (en) 1978-02-24 1978-02-24 Mask inspection unit

Publications (1)

Publication Number Publication Date
JPS54113262A true JPS54113262A (en) 1979-09-04

Family

ID=12010173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1982978A Pending JPS54113262A (en) 1978-02-24 1978-02-24 Mask inspection unit

Country Status (1)

Country Link
JP (1) JPS54113262A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56118607A (en) * 1980-02-22 1981-09-17 Toppan Printing Co Ltd Inspection method for secondary negative
JPS57207335A (en) * 1981-06-15 1982-12-20 Fujitsu Ltd Pattern checking system
JPS58178520A (en) * 1982-04-13 1983-10-19 Toshiba Corp Inspecting and correcting device of photomask
JPS59208407A (en) * 1983-05-13 1984-11-26 Toshiba Corp Mask defect inspecting device
JPS61180432A (en) * 1985-02-06 1986-08-13 Hitachi Ltd Inspection of pattern

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051263A (en) * 1973-09-06 1975-05-08
JPS5192183A (en) * 1975-02-10 1976-08-12
JPS5249770A (en) * 1975-10-20 1977-04-21 Toshiba Corp Pattern inspection device
JPS5263755A (en) * 1975-11-22 1977-05-26 Nippon Chemical Ind Pattern line width measuring device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051263A (en) * 1973-09-06 1975-05-08
JPS5192183A (en) * 1975-02-10 1976-08-12
JPS5249770A (en) * 1975-10-20 1977-04-21 Toshiba Corp Pattern inspection device
JPS5263755A (en) * 1975-11-22 1977-05-26 Nippon Chemical Ind Pattern line width measuring device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56118607A (en) * 1980-02-22 1981-09-17 Toppan Printing Co Ltd Inspection method for secondary negative
JPS57207335A (en) * 1981-06-15 1982-12-20 Fujitsu Ltd Pattern checking system
JPS6239812B2 (en) * 1981-06-15 1987-08-25 Fujitsu Ltd
JPS58178520A (en) * 1982-04-13 1983-10-19 Toshiba Corp Inspecting and correcting device of photomask
JPS59208407A (en) * 1983-05-13 1984-11-26 Toshiba Corp Mask defect inspecting device
JPS61180432A (en) * 1985-02-06 1986-08-13 Hitachi Ltd Inspection of pattern

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