JPS57185436A - Production of x-ray exposure mask - Google Patents

Production of x-ray exposure mask

Info

Publication number
JPS57185436A
JPS57185436A JP7046081A JP7046081A JPS57185436A JP S57185436 A JPS57185436 A JP S57185436A JP 7046081 A JP7046081 A JP 7046081A JP 7046081 A JP7046081 A JP 7046081A JP S57185436 A JPS57185436 A JP S57185436A
Authority
JP
Japan
Prior art keywords
mask
layer
supporter
film
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7046081A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0416009B2 (enrdf_load_stackoverflow
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7046081A priority Critical patent/JPS57185436A/ja
Publication of JPS57185436A publication Critical patent/JPS57185436A/ja
Publication of JPH0416009B2 publication Critical patent/JPH0416009B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP7046081A 1981-05-11 1981-05-11 Production of x-ray exposure mask Granted JPS57185436A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7046081A JPS57185436A (en) 1981-05-11 1981-05-11 Production of x-ray exposure mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7046081A JPS57185436A (en) 1981-05-11 1981-05-11 Production of x-ray exposure mask

Publications (2)

Publication Number Publication Date
JPS57185436A true JPS57185436A (en) 1982-11-15
JPH0416009B2 JPH0416009B2 (enrdf_load_stackoverflow) 1992-03-19

Family

ID=13432145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7046081A Granted JPS57185436A (en) 1981-05-11 1981-05-11 Production of x-ray exposure mask

Country Status (1)

Country Link
JP (1) JPS57185436A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0212713A3 (en) * 1985-08-02 1988-10-26 Micronix Corporation Process for manufacturing a mask for use in x-ray photolithography using a monolithic support and resulting structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0212713A3 (en) * 1985-08-02 1988-10-26 Micronix Corporation Process for manufacturing a mask for use in x-ray photolithography using a monolithic support and resulting structure

Also Published As

Publication number Publication date
JPH0416009B2 (enrdf_load_stackoverflow) 1992-03-19

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