JPS57174449A - Production of photoconductive member - Google Patents
Production of photoconductive memberInfo
- Publication number
- JPS57174449A JPS57174449A JP56060154A JP6015481A JPS57174449A JP S57174449 A JPS57174449 A JP S57174449A JP 56060154 A JP56060154 A JP 56060154A JP 6015481 A JP6015481 A JP 6015481A JP S57174449 A JPS57174449 A JP S57174449A
- Authority
- JP
- Japan
- Prior art keywords
- compds
- formula
- carbon atoms
- raw material
- kinds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atom Chemical group C* 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 3
- 239000002994 raw material Substances 0.000 abstract 3
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract 1
- 239000005977 Ethylene Substances 0.000 abstract 1
- 229910007245 Si2Cl6 Inorganic materials 0.000 abstract 1
- 229910007260 Si2F6 Inorganic materials 0.000 abstract 1
- 229910003910 SiCl4 Inorganic materials 0.000 abstract 1
- 229910004014 SiF4 Inorganic materials 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 abstract 1
- 125000004429 atom Chemical group 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 abstract 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract 1
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 abstract 1
- SDNBGJALFMSQER-UHFFFAOYSA-N trifluoro(trifluorosilyl)silane Chemical compound F[Si](F)(F)[Si](F)(F)F SDNBGJALFMSQER-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56060154A JPS57174449A (en) | 1981-04-21 | 1981-04-21 | Production of photoconductive member |
US06/354,898 US4468443A (en) | 1981-03-12 | 1982-03-04 | Process for producing photoconductive member from gaseous silicon compounds |
DE19823209055 DE3209055A1 (de) | 1981-03-12 | 1982-03-12 | Verfahren zur herstellung eines fotoleitfaehigen elements |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56060154A JPS57174449A (en) | 1981-04-21 | 1981-04-21 | Production of photoconductive member |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57174449A true JPS57174449A (en) | 1982-10-27 |
JPS6331553B2 JPS6331553B2 (enrdf_load_stackoverflow) | 1988-06-24 |
Family
ID=13133944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56060154A Granted JPS57174449A (en) | 1981-03-12 | 1981-04-21 | Production of photoconductive member |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57174449A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6068050A (ja) * | 1983-08-19 | 1985-04-18 | エナージー・コンバーション・デバイセス・インコーポレーテッド | 化学種の検出方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7398966B2 (ja) | 2020-01-10 | 2023-12-15 | 信越化学工業株式会社 | Iii族窒化物基板の製造方法及びiii族窒化物基板 |
-
1981
- 1981-04-21 JP JP56060154A patent/JPS57174449A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6068050A (ja) * | 1983-08-19 | 1985-04-18 | エナージー・コンバーション・デバイセス・インコーポレーテッド | 化学種の検出方法 |
JPH06339627A (ja) * | 1983-08-19 | 1994-12-13 | Energy Conversion Devices Inc | 基板上に半導体材料を堆積する方法および薄膜製造法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6331553B2 (enrdf_load_stackoverflow) | 1988-06-24 |
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