JPS5717415A - Continuous manufacture of trichlorsilane - Google Patents
Continuous manufacture of trichlorsilaneInfo
- Publication number
- JPS5717415A JPS5717415A JP5449081A JP5449081A JPS5717415A JP S5717415 A JPS5717415 A JP S5717415A JP 5449081 A JP5449081 A JP 5449081A JP 5449081 A JP5449081 A JP 5449081A JP S5717415 A JPS5717415 A JP S5717415A
- Authority
- JP
- Japan
- Prior art keywords
- trichlorsilane
- continuous manufacture
- manufacture
- continuous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3024319A DE3024319C2 (de) | 1980-06-27 | 1980-06-27 | Kontinuierliches Verfahren zur Herstellung von Trichlorsilan |
DE3024319.7 | 1980-06-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5717415A true JPS5717415A (en) | 1982-01-29 |
JPS608969B2 JPS608969B2 (ja) | 1985-03-07 |
Family
ID=6105738
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56054490A Expired JPS608969B2 (ja) | 1980-06-27 | 1981-04-13 | トリクロルシランの連続製造法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS608969B2 (ja) |
DE (1) | DE3024319C2 (ja) |
IT (1) | IT1171331B (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03501586A (ja) * | 1987-07-08 | 1991-04-11 | プリムテツク | 同期しない射出時間を有する積層多分割成型システムの保持圧制御及びクランプ |
WO2008065838A1 (fr) * | 2006-11-30 | 2008-06-05 | Mitsubishi Materials Corporation | Procédé de production de trichlorosilane et dispositif de production de trichlorosilane |
JP2013500928A (ja) * | 2009-08-04 | 2013-01-10 | シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング | トリクロロシランを製造するための設備および方法 |
JP2013517207A (ja) * | 2010-01-18 | 2013-05-16 | エボニック デグサ ゲーエムベーハー | 四塩化ケイ素を反応させてトリクロロシランを得るための流通管反応器 |
JP2013540095A (ja) * | 2010-10-22 | 2013-10-31 | エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド | 実質的に閉ループの方法およびシステムにおける多結晶シリコンの製造 |
JP2013540689A (ja) * | 2010-10-27 | 2013-11-07 | ジーティーエイティー・コーポレーション | ハイドロクロリネーションのための加熱装置およびそれに関連する方法 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2530638A1 (fr) * | 1982-07-26 | 1984-01-27 | Rhone Poulenc Spec Chim | Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete |
US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
JPH0211570U (ja) * | 1988-06-29 | 1990-01-24 | ||
DE10062413A1 (de) * | 2000-12-14 | 2002-07-04 | Solarworld Ag | Verfahren zur Herstellung von Trichlorsilan |
DE102006009954A1 (de) | 2006-03-03 | 2007-09-06 | Wacker Chemie Ag | Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes |
DE102006009953A1 (de) | 2006-03-03 | 2007-09-06 | Wacker Chemie Ag | Verfahren zur Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes |
DE102006050329B3 (de) | 2006-10-25 | 2007-12-13 | Wacker Chemie Ag | Verfahren zur Herstellung von Trichlorsilan |
DE102010000981A1 (de) * | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Closed loop-Verfahren zur Herstellung von Trichlorsilan aus metallurgischem Silicium |
US9073951B2 (en) | 2010-01-26 | 2015-07-07 | Dow Corning Corporation | Method of preparing an organohalosilane |
DE102010007916B4 (de) | 2010-02-12 | 2013-11-28 | Centrotherm Sitec Gmbh | Verfahren zur Hydrierung von Chlorsilanen und Verwendung eines Konverters zur Durchführung des Verfahrens |
US8772525B2 (en) | 2010-05-28 | 2014-07-08 | Dow Corning Corporation | Method for preparing a diorganodihalosilane |
US8722915B2 (en) | 2010-05-28 | 2014-05-13 | Dow Corning Corporation | Preparation of organohalosilanes |
DE102010044755A1 (de) | 2010-09-08 | 2012-03-08 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Silicium hoher Reinheit |
KR20130105618A (ko) | 2010-09-08 | 2013-09-25 | 다우 코닝 코포레이션 | 트라이할로실란의 제조 방법 |
US8449848B2 (en) | 2010-10-22 | 2013-05-28 | Memc Electronic Materials, Inc. | Production of polycrystalline silicon in substantially closed-loop systems |
US20120100061A1 (en) | 2010-10-22 | 2012-04-26 | Memc Electronic Materials, Inc. | Production of Polycrystalline Silicon in Substantially Closed-loop Processes |
RU2013122125A (ru) | 2010-12-17 | 2015-01-27 | Дау Корнинг Корпорейшн | Способ получения диорганодигалогенсилана |
JP5792828B2 (ja) | 2010-12-17 | 2015-10-14 | ダウ コーニング コーポレーションDow Corning Corporation | トリハロシランを作製する方法 |
CN103298821A (zh) | 2011-01-25 | 2013-09-11 | 道康宁公司 | 制备二有机二卤代硅烷的方法 |
US9222733B2 (en) | 2011-02-03 | 2015-12-29 | Memc Electronic Materials S.P.A. | Reactor apparatus and methods for reacting compounds |
EP2882762A1 (en) | 2012-08-13 | 2015-06-17 | Dow Corning Corporation | Method of preparing an organohalosilane by reacting hydrogen, halosilane and organohalide in a two step process on a copper catalyst |
WO2014062255A1 (en) | 2012-10-16 | 2014-04-24 | Dow Corning Corporation | Method of preparing halogenated silahydrocarbylenes |
DE102012223784A1 (de) | 2012-12-19 | 2014-06-26 | Wacker Chemie Ag | Verfahren zur Konvertierung von Siliciumtetrachlorid in Trichlorsilan |
JP6479794B2 (ja) | 2013-11-12 | 2019-03-06 | ダウ シリコーンズ コーポレーション | ハロシランを製造する方法 |
CN107207730B (zh) | 2014-12-18 | 2020-12-11 | 美国陶氏有机硅公司 | 用于制备芳基官能硅烷的方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1935895B2 (de) * | 1969-07-15 | 1971-06-03 | Deutsche Gold und Silber Scheide anstalt vormals Roessler, 6000 Frankfurt | Verfahren zur herstellung von silikochloroform |
-
1980
- 1980-06-27 DE DE3024319A patent/DE3024319C2/de not_active Expired
-
1981
- 1981-04-13 JP JP56054490A patent/JPS608969B2/ja not_active Expired
- 1981-06-25 IT IT48753/81A patent/IT1171331B/it active
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03501586A (ja) * | 1987-07-08 | 1991-04-11 | プリムテツク | 同期しない射出時間を有する積層多分割成型システムの保持圧制御及びクランプ |
WO2008065838A1 (fr) * | 2006-11-30 | 2008-06-05 | Mitsubishi Materials Corporation | Procédé de production de trichlorosilane et dispositif de production de trichlorosilane |
JP2008156209A (ja) * | 2006-11-30 | 2008-07-10 | Mitsubishi Materials Corp | トリクロロシランの製造方法およびトリクロロシランの製造装置 |
EP2088124A4 (en) * | 2006-11-30 | 2011-02-23 | Mitsubishi Materials Corp | PROCESS FOR THE PREPARATION OF TRICHLOROSILANE AND DEVICE FOR THE PRODUCTION OF TRICHLORSILANE |
KR101400481B1 (ko) * | 2006-11-30 | 2014-05-28 | 미쓰비시 마테리알 가부시키가이샤 | 트리클로로실란의 제조 방법 및 트리클로로실란의 제조 장치 |
JP2013500928A (ja) * | 2009-08-04 | 2013-01-10 | シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング | トリクロロシランを製造するための設備および方法 |
JP2013517207A (ja) * | 2010-01-18 | 2013-05-16 | エボニック デグサ ゲーエムベーハー | 四塩化ケイ素を反応させてトリクロロシランを得るための流通管反応器 |
JP2013540095A (ja) * | 2010-10-22 | 2013-10-31 | エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド | 実質的に閉ループの方法およびシステムにおける多結晶シリコンの製造 |
JP2013540689A (ja) * | 2010-10-27 | 2013-11-07 | ジーティーエイティー・コーポレーション | ハイドロクロリネーションのための加熱装置およびそれに関連する方法 |
Also Published As
Publication number | Publication date |
---|---|
IT1171331B (it) | 1987-06-10 |
DE3024319A1 (de) | 1982-01-28 |
JPS608969B2 (ja) | 1985-03-07 |
IT8148753A0 (it) | 1981-06-25 |
DE3024319C2 (de) | 1983-07-21 |
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