JPS57169280A - Compound semiconductor device - Google Patents
Compound semiconductor deviceInfo
- Publication number
- JPS57169280A JPS57169280A JP5403581A JP5403581A JPS57169280A JP S57169280 A JPS57169280 A JP S57169280A JP 5403581 A JP5403581 A JP 5403581A JP 5403581 A JP5403581 A JP 5403581A JP S57169280 A JPS57169280 A JP S57169280A
- Authority
- JP
- Japan
- Prior art keywords
- junction
- region
- type
- high density
- ohmic electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
Abstract
PURPOSE:To improve the difference in luminous intensity without varying the arrangement or pattern of an ohmic electrode, by improving the structure of a diffused region in a light emitting device. CONSTITUTION:A diffusion preventing layer 3 is formed on a compound semiconductor substrate with an N type GaAsP layer 2 vapor-grown on an N type GaP substrate 1, and P type impurity is selectively diffused to an arbitrary depth by thermal diffusion to obtain a P-N junction 4. Next, a P type high density region 7 is formed within a P side region of the P-N junction 4 by selective diffusion, and an ohmic electrode 5 is formed on the p side region or on the p side region and P type high density region 7 to obtain an ohmic contact 6. Thus, when electricity is conducted into the light emitting device in a forward direction, the current supplied from the ohmic electrode 5 flows first to the P type high density region 7 and further to the P-N junction. Therefore, the current flowing to the P-N junction becomes homogeneous with homogeneous luminous intensity.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5403581A JPS57169280A (en) | 1981-04-10 | 1981-04-10 | Compound semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5403581A JPS57169280A (en) | 1981-04-10 | 1981-04-10 | Compound semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57169280A true JPS57169280A (en) | 1982-10-18 |
Family
ID=12959325
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5403581A Pending JPS57169280A (en) | 1981-04-10 | 1981-04-10 | Compound semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57169280A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS608049U (en) * | 1983-06-27 | 1985-01-21 | 株式会社リコー | LED array light source |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50116190A (en) * | 1974-02-25 | 1975-09-11 | ||
JPS531197A (en) * | 1976-05-24 | 1978-01-07 | Hooker Chemicals Plastics Corp | Manufacturing method of chlorine dioxide |
-
1981
- 1981-04-10 JP JP5403581A patent/JPS57169280A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50116190A (en) * | 1974-02-25 | 1975-09-11 | ||
JPS531197A (en) * | 1976-05-24 | 1978-01-07 | Hooker Chemicals Plastics Corp | Manufacturing method of chlorine dioxide |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS608049U (en) * | 1983-06-27 | 1985-01-21 | 株式会社リコー | LED array light source |
JPH0318193Y2 (en) * | 1983-06-27 | 1991-04-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3580891D1 (en) | SEMICONDUCTOR ARRANGEMENT WITH SEVERAL TRANSITIONS. | |
JPS6445173A (en) | Conductive modulation type mosfet | |
JPS5312288A (en) | Light emitting semiconductor device | |
JPS57169280A (en) | Compound semiconductor device | |
JPS5473585A (en) | Gate turn-off thyristor | |
JPS566480A (en) | Semiconductor light emitting diode | |
JPS52114289A (en) | Semiconductor light emittiing element | |
JPS5687380A (en) | Semiconductor device for detection of radiant light | |
JPS6489569A (en) | Solar cell element | |
JPS5591892A (en) | Semiconductor laser light emission device | |
US3737985A (en) | Method of producing thin layers on a support | |
JPS5779685A (en) | Light emitting diode device | |
JPS57103374A (en) | High-brightness light emitting diode | |
JPS55108785A (en) | Galium phosphide green luminous element | |
JPS564275A (en) | Semiconductor device | |
JPS5418691A (en) | Manufacture of pn-junction type light emitting diode | |
JPS57147285A (en) | Zener diode | |
JPS5742180A (en) | Light emitting diode | |
JPS5425184A (en) | Light emitting element of semiconductor | |
JPS5465484A (en) | Semiconductor device | |
JPS5563888A (en) | Light-emitting diode | |
JPS52147088A (en) | Light emitting device | |
JPS56157077A (en) | Semiconductor light emitting device | |
JPS6482594A (en) | Semiconductor laser device and manufacture thereof | |
JPS54117692A (en) | Semiconductor light emitting diode |