JPS57157511A - Opposite target type sputtering device - Google Patents

Opposite target type sputtering device

Info

Publication number
JPS57157511A
JPS57157511A JP4169781A JP4169781A JPS57157511A JP S57157511 A JPS57157511 A JP S57157511A JP 4169781 A JP4169781 A JP 4169781A JP 4169781 A JP4169781 A JP 4169781A JP S57157511 A JPS57157511 A JP S57157511A
Authority
JP
Japan
Prior art keywords
substrate
targets
power supply
generated
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4169781A
Other languages
English (en)
Japanese (ja)
Other versions
JPH031810B2 (enrdf_load_stackoverflow
Inventor
Sadao Kadokura
Takashi Tomie
Masahiko Naoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP4169781A priority Critical patent/JPS57157511A/ja
Publication of JPS57157511A publication Critical patent/JPS57157511A/ja
Publication of JPH031810B2 publication Critical patent/JPH031810B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP4169781A 1981-03-24 1981-03-24 Opposite target type sputtering device Granted JPS57157511A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4169781A JPS57157511A (en) 1981-03-24 1981-03-24 Opposite target type sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4169781A JPS57157511A (en) 1981-03-24 1981-03-24 Opposite target type sputtering device

Publications (2)

Publication Number Publication Date
JPS57157511A true JPS57157511A (en) 1982-09-29
JPH031810B2 JPH031810B2 (enrdf_load_stackoverflow) 1991-01-11

Family

ID=12615606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4169781A Granted JPS57157511A (en) 1981-03-24 1981-03-24 Opposite target type sputtering device

Country Status (1)

Country Link
JP (1) JPS57157511A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956717A (ja) * 1982-09-27 1984-04-02 Hitachi Ltd 磁気ヘツド用パ−マロイ薄膜の製造方法
JPS59193528A (ja) * 1983-04-18 1984-11-02 Teijin Ltd 磁気記録媒体の製造法
JPS6025211A (ja) * 1983-07-20 1985-02-08 Konishiroku Photo Ind Co Ltd 窒化鉄膜の形成方法
JPS60113319A (ja) * 1983-11-25 1985-06-19 Teijin Ltd 垂直磁気記録媒体
JPH024964A (ja) * 1988-06-23 1990-01-09 Teijin Ltd 対向ターゲット式スパッタ装置
JPH02156082A (ja) * 1988-12-09 1990-06-15 Tokuda Seisakusho Ltd スパッタ装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5512732A (en) * 1978-07-14 1980-01-29 Anelva Corp Sputtering apparatus for making thin magnetic film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5512732A (en) * 1978-07-14 1980-01-29 Anelva Corp Sputtering apparatus for making thin magnetic film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956717A (ja) * 1982-09-27 1984-04-02 Hitachi Ltd 磁気ヘツド用パ−マロイ薄膜の製造方法
JPS59193528A (ja) * 1983-04-18 1984-11-02 Teijin Ltd 磁気記録媒体の製造法
JPS6025211A (ja) * 1983-07-20 1985-02-08 Konishiroku Photo Ind Co Ltd 窒化鉄膜の形成方法
JPS60113319A (ja) * 1983-11-25 1985-06-19 Teijin Ltd 垂直磁気記録媒体
JPH024964A (ja) * 1988-06-23 1990-01-09 Teijin Ltd 対向ターゲット式スパッタ装置
JPH02156082A (ja) * 1988-12-09 1990-06-15 Tokuda Seisakusho Ltd スパッタ装置

Also Published As

Publication number Publication date
JPH031810B2 (enrdf_load_stackoverflow) 1991-01-11

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