JPS5715482A - Manufacture of thin zinc oxide piezoelectric film - Google Patents

Manufacture of thin zinc oxide piezoelectric film

Info

Publication number
JPS5715482A
JPS5715482A JP9087980A JP9087980A JPS5715482A JP S5715482 A JPS5715482 A JP S5715482A JP 9087980 A JP9087980 A JP 9087980A JP 9087980 A JP9087980 A JP 9087980A JP S5715482 A JPS5715482 A JP S5715482A
Authority
JP
Japan
Prior art keywords
substrate
target
plate
space
zinc oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9087980A
Other languages
English (en)
Japanese (ja)
Other versions
JPH021231B2 (enrdf_load_stackoverflow
Inventor
Tsuneo Mitsuyu
Kiyotaka Wasa
Osamu Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9087980A priority Critical patent/JPS5715482A/ja
Publication of JPS5715482A publication Critical patent/JPS5715482A/ja
Publication of JPH021231B2 publication Critical patent/JPH021231B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
JP9087980A 1980-07-02 1980-07-02 Manufacture of thin zinc oxide piezoelectric film Granted JPS5715482A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9087980A JPS5715482A (en) 1980-07-02 1980-07-02 Manufacture of thin zinc oxide piezoelectric film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9087980A JPS5715482A (en) 1980-07-02 1980-07-02 Manufacture of thin zinc oxide piezoelectric film

Publications (2)

Publication Number Publication Date
JPS5715482A true JPS5715482A (en) 1982-01-26
JPH021231B2 JPH021231B2 (enrdf_load_stackoverflow) 1990-01-10

Family

ID=14010740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9087980A Granted JPS5715482A (en) 1980-07-02 1980-07-02 Manufacture of thin zinc oxide piezoelectric film

Country Status (1)

Country Link
JP (1) JPS5715482A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62214167A (ja) * 1986-03-17 1987-09-19 Nec Corp 圧電薄膜の製造方法
WO2008069028A1 (ja) * 2006-11-27 2008-06-12 Omron Corporation 薄膜製造方法及び前記薄膜製造方法により製造された六方晶系圧電薄膜
JP2010190774A (ja) * 2009-02-19 2010-09-02 Toshiba Corp 慣性センサおよび慣性測定装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62214167A (ja) * 1986-03-17 1987-09-19 Nec Corp 圧電薄膜の製造方法
WO2008069028A1 (ja) * 2006-11-27 2008-06-12 Omron Corporation 薄膜製造方法及び前記薄膜製造方法により製造された六方晶系圧電薄膜
JP2008133145A (ja) * 2006-11-27 2008-06-12 Omron Corp 薄膜製造方法及び前記薄膜製造方法により製造された六方晶系圧電薄膜
JP2010190774A (ja) * 2009-02-19 2010-09-02 Toshiba Corp 慣性センサおよび慣性測定装置

Also Published As

Publication number Publication date
JPH021231B2 (enrdf_load_stackoverflow) 1990-01-10

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